ITMI20031543A1 - Elettrodo per processi elettrochimici e metodo per il suo ottenimento - Google Patents

Elettrodo per processi elettrochimici e metodo per il suo ottenimento

Info

Publication number
ITMI20031543A1
ITMI20031543A1 IT001543A ITMI20031543A ITMI20031543A1 IT MI20031543 A1 ITMI20031543 A1 IT MI20031543A1 IT 001543 A IT001543 A IT 001543A IT MI20031543 A ITMI20031543 A IT MI20031543A IT MI20031543 A1 ITMI20031543 A1 IT MI20031543A1
Authority
IT
Italy
Prior art keywords
electrode
achievement
electrochemical processes
tin
precursor
Prior art date
Application number
IT001543A
Other languages
English (en)
Inventor
Battisti Achille De
Sergio Ferro
Gian Nicola Martelli
Alexander Morozov
Original Assignee
De Nora Elettrodi Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by De Nora Elettrodi Spa filed Critical De Nora Elettrodi Spa
Priority to IT001543A priority Critical patent/ITMI20031543A1/it
Priority to MYPI20042854A priority patent/MY144312A/en
Priority to CL200401839A priority patent/CL2004001839A1/es
Priority to TW093121988A priority patent/TWI251035B/zh
Priority to PE2004000723A priority patent/PE20050640A1/es
Priority to US10/563,852 priority patent/US7695755B2/en
Priority to CN2004800216922A priority patent/CN1829827B/zh
Priority to KR1020067002058A priority patent/KR101110091B1/ko
Priority to RU2006106187/15A priority patent/RU2355823C2/ru
Priority to EP04763531A priority patent/EP1656471B1/en
Priority to DE602004024410T priority patent/DE602004024410D1/de
Priority to PCT/EP2004/008397 priority patent/WO2005014885A1/en
Priority to AU2004262666A priority patent/AU2004262666B2/en
Priority to BRPI0412350-6B1A priority patent/BRPI0412350B1/pt
Priority to JP2006521506A priority patent/JP4533378B2/ja
Priority to MXPA06001023A priority patent/MXPA06001023A/es
Priority to AT04763531T priority patent/ATE450636T1/de
Publication of ITMI20031543A1 publication Critical patent/ITMI20031543A1/it
Priority to IL172813A priority patent/IL172813A/en
Priority to US12/655,424 priority patent/US8182600B2/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/052—Electrodes comprising one or more electrocatalytic coatings on a substrate
    • C25B11/053—Electrodes comprising one or more electrocatalytic coatings on a substrate characterised by multilayer electrocatalytic coatings
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G19/00—Compounds of tin
    • C01G19/04—Halides
    • C01G19/08—Stannic chloride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1225—Deposition of multilayers of inorganic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1229—Composition of the substrate
    • C23C18/1241—Metallic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1283—Control of temperature, e.g. gradual temperature increase, modulation of temperature
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/40—Electric properties

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Electrochemistry (AREA)
  • Ceramic Engineering (AREA)
  • Catalysts (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Chemically Coating (AREA)
  • Inert Electrodes (AREA)
  • Primary Cells (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
IT001543A 2003-07-28 2003-07-28 Elettrodo per processi elettrochimici e metodo per il suo ottenimento ITMI20031543A1 (it)

Priority Applications (19)

Application Number Priority Date Filing Date Title
IT001543A ITMI20031543A1 (it) 2003-07-28 2003-07-28 Elettrodo per processi elettrochimici e metodo per il suo ottenimento
MYPI20042854A MY144312A (en) 2003-07-28 2004-07-16 Electrode for electrochemical processes and method for producing the same
CL200401839A CL2004001839A1 (es) 2003-07-28 2004-07-22 Metodo para la preparacion de un electrodo con revestimiento catalitico; anodo provisto de un revestimiento electrocatalitico; solucion de un precursor para la formacion pirolitica de un revestimiento que contiene estano; y metodo para la preparacion
TW093121988A TWI251035B (en) 2003-07-28 2004-07-23 Electrode for electrochemical processes and method for producing the same
PE2004000723A PE20050640A1 (es) 2003-07-28 2004-07-26 Una solucion de un precursor para la formacion pirolitica de un revestimiento que contiene estano, y metodo de preparacion de dicha solucion
EP04763531A EP1656471B1 (en) 2003-07-28 2004-07-27 Electrode for electrochemical processes and method for producing the same
AU2004262666A AU2004262666B2 (en) 2003-07-28 2004-07-27 Electrode for electrochemical processes and method for producing the same
KR1020067002058A KR101110091B1 (ko) 2003-07-28 2004-07-27 전기화학 공정용 전극 및 이의 제조방법
RU2006106187/15A RU2355823C2 (ru) 2003-07-28 2004-07-27 Электрод для электрохимических процессов и способ его получения
US10/563,852 US7695755B2 (en) 2003-07-28 2004-07-27 Electrode for electrochemical processes and method for producing the same
DE602004024410T DE602004024410D1 (de) 2003-07-28 2004-07-27 Elektrode für elektrochemische verfahren und zugehöriges herstellungsverfahren
PCT/EP2004/008397 WO2005014885A1 (en) 2003-07-28 2004-07-27 Electrode for electrochemical processes and method for producing the same
CN2004800216922A CN1829827B (zh) 2003-07-28 2004-07-27 用于电化学方法的电极及生产该电极的方法
BRPI0412350-6B1A BRPI0412350B1 (pt) 2003-07-28 2004-07-27 Método para a fabricação de um eletrodo, Anodo, Solução de um precursor e Método para a fabricação de uma solução de um precursor
JP2006521506A JP4533378B2 (ja) 2003-07-28 2004-07-27 電気化学的プロセスのための電極及びその製造方法
MXPA06001023A MXPA06001023A (es) 2003-07-28 2004-07-27 Electrodo para procesos electroquimicos y metodo para su fabricacion.
AT04763531T ATE450636T1 (de) 2003-07-28 2004-07-27 Elektrode für elektrochemische verfahren und zugehöriges herstellungsverfahren
IL172813A IL172813A (en) 2003-07-28 2005-12-26 Electrode for electrochemical processes and method for producing the same
US12/655,424 US8182600B2 (en) 2003-07-28 2009-12-30 Electrode for electrochemical processes and method for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT001543A ITMI20031543A1 (it) 2003-07-28 2003-07-28 Elettrodo per processi elettrochimici e metodo per il suo ottenimento

Publications (1)

Publication Number Publication Date
ITMI20031543A1 true ITMI20031543A1 (it) 2005-01-29

Family

ID=34131202

Family Applications (1)

Application Number Title Priority Date Filing Date
IT001543A ITMI20031543A1 (it) 2003-07-28 2003-07-28 Elettrodo per processi elettrochimici e metodo per il suo ottenimento

Country Status (18)

Country Link
US (2) US7695755B2 (it)
EP (1) EP1656471B1 (it)
JP (1) JP4533378B2 (it)
KR (1) KR101110091B1 (it)
CN (1) CN1829827B (it)
AT (1) ATE450636T1 (it)
AU (1) AU2004262666B2 (it)
BR (1) BRPI0412350B1 (it)
CL (1) CL2004001839A1 (it)
DE (1) DE602004024410D1 (it)
IL (1) IL172813A (it)
IT (1) ITMI20031543A1 (it)
MX (1) MXPA06001023A (it)
MY (1) MY144312A (it)
PE (1) PE20050640A1 (it)
RU (1) RU2355823C2 (it)
TW (1) TWI251035B (it)
WO (1) WO2005014885A1 (it)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1391767B1 (it) * 2008-11-12 2012-01-27 Industrie De Nora Spa Elettrodo per cella elettrolitica
IT1403585B1 (it) 2010-11-26 2013-10-31 Industrie De Nora Spa Anodo per evoluzione elettrolitica di cloro
ITMI20111132A1 (it) 2011-06-22 2012-12-23 Industrie De Nora Spa Anodo per evoluzione di ossigeno
CN103091435B (zh) * 2012-10-31 2015-06-03 轻工业环境保护研究所 一种有机肥料中药物残留的检测方法
ITMI20122035A1 (it) 2012-11-29 2014-05-30 Industrie De Nora Spa Elettrodo per evoluzione di ossigeno in processi elettrochimici industriali
TWI730967B (zh) * 2015-06-23 2021-06-21 義商第諾拉工業公司 電解過程中適於釋氧用之電極，以及從水溶液陰極電沉積金屬之製法
CN108339556A (zh) * 2018-02-01 2018-07-31 河南师范大学 一种碱式氯化亚锡非晶光催化材料的制备方法
IT201800010760A1 (it) * 2018-12-03 2020-06-03 Industrie De Nora Spa Elettrodo per evoluzione elettrolitica di gas
EP4036059A4 (en) 2019-09-26 2022-12-07 Lg Chem, Ltd. COMPOSITION FOR THE PRODUCTION OF TIN OXIDE
JP2022020222A (ja) 2020-07-20 2022-02-01 デノラ・ペルメレック株式会社 酸素発生用電極
JP7168729B1 (ja) 2021-07-12 2022-11-09 デノラ・ペルメレック株式会社 工業用電解プロセス用電極
WO2024008895A2 (en) 2022-07-08 2024-01-11 Industrie De Nora S.P.A. Electrode for electrolytic evolution of gas
EP4353866A1 (en) * 2022-10-13 2024-04-17 Titanium Technology S.L. Mixed metal oxide coatings for titanium alloys

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US487352A (en) * 1892-12-06 Island
SU541849A1 (ru) 1975-10-28 1977-01-05 Предприятие П/Я А-3481 Оксалоолов нна кислота в качестве промежуточного продукта дл получени двуокиси олова и способ ее получени
US4873352A (en) * 1986-02-08 1989-10-10 Japan Exlan Company Limited Transparent aqueous tin compound solution
JPS62267476A (ja) * 1986-05-13 1987-11-20 Mitsubishi Metal Corp 透明導電性被膜形成組成物
JPS62274087A (ja) 1986-05-22 1987-11-28 Permelec Electrode Ltd 耐久性を有する電解用電極及びその製造方法
KR900003954B1 (ko) 1987-08-05 1990-06-05 니혼 엑스란 고오교오 가부시끼가이샤 주석산 무수물
GB8830296D0 (en) * 1988-12-28 1989-02-22 Unilever Plc Bleaching composition
JPH0339497A (ja) * 1989-07-06 1991-02-20 Japan Carlit Co Ltd:The スズメッキ方法
JPH0774470B2 (ja) * 1990-03-20 1995-08-09 ダイソー株式会社 酸素発生用陽極の製法
GB9018953D0 (en) * 1990-08-31 1990-10-17 Ici Plc Electrode
DE4124136A1 (de) * 1991-07-20 1993-01-21 Goldschmidt Ag Th Verfahren zum vergueten von hohlglaskoerpern
JP3457349B2 (ja) * 1993-02-10 2003-10-14 日本酸素株式会社 化学気相析出法による成膜用組成物
GB9316926D0 (en) 1993-08-13 1993-09-29 Ici Plc Electrode
US5736497A (en) * 1995-05-05 1998-04-07 Degussa Corporation Phosphorus free stabilized alkaline peroxygen solutions
JP2795824B2 (ja) * 1995-05-12 1998-09-10 オオタ株式会社 チタン系インプラントの表面処理方法及び生体親和性チタン系インプラント
JP2002146536A (ja) * 2000-11-08 2002-05-22 Japan Science & Technology Corp 酸化スズ薄膜の低温形成方法
US7381797B2 (en) * 2001-05-09 2008-06-03 Surmodics, Inc. Stabilization of H2O2 under alkaline conditions for use in luminescence, fluorescence and colorimetric assays for enhanced detection of peroxidase type assays

Also Published As

Publication number Publication date
PE20050640A1 (es) 2005-08-25
JP4533378B2 (ja) 2010-09-01
ATE450636T1 (de) 2009-12-15
AU2004262666A1 (en) 2005-02-17
TWI251035B (en) 2006-03-11
BRPI0412350A (pt) 2006-09-05
KR101110091B1 (ko) 2012-02-15
CL2004001839A1 (es) 2005-05-13
AU2004262666B2 (en) 2009-07-16
JP2007500287A (ja) 2007-01-11
US7695755B2 (en) 2010-04-13
DE602004024410D1 (de) 2010-01-14
RU2006106187A (ru) 2006-08-10
US20100126851A1 (en) 2010-05-27
WO2005014885A1 (en) 2005-02-17
EP1656471A1 (en) 2006-05-17
US20060153982A1 (en) 2006-07-13
US8182600B2 (en) 2012-05-22
KR20060052940A (ko) 2006-05-19
RU2355823C2 (ru) 2009-05-20
IL172813A0 (en) 2006-06-11
BRPI0412350B1 (pt) 2014-01-28
MXPA06001023A (es) 2006-04-27
TW200506100A (en) 2005-02-16
EP1656471B1 (en) 2009-12-02
CN1829827A (zh) 2006-09-06
IL172813A (en) 2010-12-30
MY144312A (en) 2011-08-29
CN1829827B (zh) 2010-06-09

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