IT8719656A0 - Cella di memoria eprom a due semicelle simmetriche con gate flottante separata. - Google Patents
Cella di memoria eprom a due semicelle simmetriche con gate flottante separata.Info
- Publication number
- IT8719656A0 IT8719656A0 IT8719656A IT1965687A IT8719656A0 IT 8719656 A0 IT8719656 A0 IT 8719656A0 IT 8719656 A IT8719656 A IT 8719656A IT 1965687 A IT1965687 A IT 1965687A IT 8719656 A0 IT8719656 A0 IT 8719656A0
- Authority
- IT
- Italy
- Prior art keywords
- cells
- memory cell
- floating gate
- eprom memory
- separate floating
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
- G11C16/0408—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
- G11C16/0441—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing multiple floating gate devices, e.g. separate read-and-write FAMOS transistors with connected floating gates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/788—Field effect transistors with field effect produced by an insulated gate with floating gate
- H01L29/7881—Programmable transistors with only two possible levels of programmation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Non-Volatile Memory (AREA)
- Read Only Memory (AREA)
- Semiconductor Memories (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT8719656A IT1215380B (it) | 1987-03-12 | 1987-03-12 | Cella di memoria eprom a due semicelle simmetriche con gate flottante separata. |
DE88200420T DE3886571T2 (de) | 1987-03-12 | 1988-03-04 | EPROM-Speicherzelle mit zwei symmetrischen Halbzellen und mit getrennten schwebenden Gittern. |
EP88200420A EP0282137B1 (en) | 1987-03-12 | 1988-03-04 | EPROM memory cell with two symmetrical half-cells and separate floating gates |
JP5650188A JP2673529B2 (ja) | 1987-03-12 | 1988-03-11 | Epromメモリセルマトリックス |
US07/167,986 US4896295A (en) | 1987-03-12 | 1988-03-14 | Eprom memory cell with two symmetrical half-cells and separate floating gates |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT8719656A IT1215380B (it) | 1987-03-12 | 1987-03-12 | Cella di memoria eprom a due semicelle simmetriche con gate flottante separata. |
Publications (2)
Publication Number | Publication Date |
---|---|
IT8719656A0 true IT8719656A0 (it) | 1987-03-12 |
IT1215380B IT1215380B (it) | 1990-02-08 |
Family
ID=11160124
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT8719656A IT1215380B (it) | 1987-03-12 | 1987-03-12 | Cella di memoria eprom a due semicelle simmetriche con gate flottante separata. |
Country Status (5)
Country | Link |
---|---|
US (1) | US4896295A (it) |
EP (1) | EP0282137B1 (it) |
JP (1) | JP2673529B2 (it) |
DE (1) | DE3886571T2 (it) |
IT (1) | IT1215380B (it) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1217403B (it) * | 1988-04-12 | 1990-03-22 | Sgs Thomson Microelectronics | Matrice di memoria a tovaglia con celle eprom sfalsate |
US5238855A (en) * | 1988-11-10 | 1993-08-24 | Texas Instruments Incorporated | Cross-point contact-free array with a high-density floating-gate structure |
US5051796A (en) * | 1988-11-10 | 1991-09-24 | Texas Instruments Incorporated | Cross-point contact-free array with a high-density floating-gate structure |
IT1229131B (it) * | 1989-03-09 | 1991-07-22 | Sgs Thomson Microelectronics | Matrice di memoria eprom con struttura a tovaglia e procedimento per la sua fabbricazione. |
FR2663147A1 (fr) * | 1990-06-12 | 1991-12-13 | Sgs Thomson Microelectronics | Memoire programmable a double transistor a grille flottante. |
JP2685966B2 (ja) * | 1990-06-22 | 1997-12-08 | 株式会社東芝 | 不揮発性半導体記憶装置 |
US5291045A (en) * | 1991-03-29 | 1994-03-01 | Kabushiki Kaisha Toshiba | Non-volatile semiconductor memory device using a differential cell in a memory cell |
JP2848211B2 (ja) * | 1993-10-08 | 1999-01-20 | 日本電気株式会社 | 不揮発性半導体記憶装置 |
US6329245B1 (en) * | 1999-12-20 | 2001-12-11 | Chartered Semiconductor Manufacturing Ltd. | Flash memory array structure with reduced bit-line pitch |
US7973557B2 (en) * | 2008-05-02 | 2011-07-05 | Texas Instruments Incorporated | IC having programmable digital logic cells |
JP5522296B2 (ja) * | 2013-06-03 | 2014-06-18 | 凸版印刷株式会社 | 不揮発性半導体記憶装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4377818A (en) * | 1978-11-02 | 1983-03-22 | Texas Instruments Incorporated | High density electrically programmable ROM |
JPS5728364A (en) * | 1980-07-28 | 1982-02-16 | Fujitsu Ltd | Semiconductor memory device |
JPS5961189A (ja) * | 1982-09-15 | 1984-04-07 | ナシヨナル・セミコンダクタ−・コ−ポレ−シヨン | 高密度型epromメモリ−・アレ− |
US4546454A (en) * | 1982-11-05 | 1985-10-08 | Seeq Technology, Inc. | Non-volatile memory cell fuse element |
US4639893A (en) * | 1984-05-15 | 1987-01-27 | Wafer Scale Integration, Inc. | Self-aligned split gate EPROM |
IT1213241B (it) * | 1984-11-07 | 1989-12-14 | Ates Componenti Elettron | Matrice di memoria eprom con celle elementari simmetriche mos e suo metodo di scrittura. |
US4597060A (en) * | 1985-05-01 | 1986-06-24 | Texas Instruments Incorporated | EPROM array and method for fabricating |
US4774202A (en) * | 1985-11-07 | 1988-09-27 | Sprague Electric Company | Memory device with interconnected polysilicon layers and method for making |
-
1987
- 1987-03-12 IT IT8719656A patent/IT1215380B/it active
-
1988
- 1988-03-04 EP EP88200420A patent/EP0282137B1/en not_active Expired - Lifetime
- 1988-03-04 DE DE88200420T patent/DE3886571T2/de not_active Expired - Fee Related
- 1988-03-11 JP JP5650188A patent/JP2673529B2/ja not_active Expired - Fee Related
- 1988-03-14 US US07/167,986 patent/US4896295A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US4896295A (en) | 1990-01-23 |
DE3886571D1 (de) | 1994-02-10 |
DE3886571T2 (de) | 1994-04-28 |
JPS63249376A (ja) | 1988-10-17 |
JP2673529B2 (ja) | 1997-11-05 |
EP0282137A2 (en) | 1988-09-14 |
EP0282137A3 (en) | 1990-03-14 |
EP0282137B1 (en) | 1993-12-29 |
IT1215380B (it) | 1990-02-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE68917807D1 (de) | Speicheranordnung mit schwebendem Gate. | |
DE3885408T2 (de) | Nichtflüchtige Speicherzelle. | |
IT1209227B (it) | Cella di memoria non volatile a 'gate' flottante elettricamente alterabile. | |
IT8520924A0 (it) | Cella elettrochimica. | |
DE3788645T2 (de) | Sonnenzelle mit verbesserter stirnflächenmetallisierung. | |
DE3686626T2 (de) | Speicherzelle. | |
AU4171085A (en) | Semiconductor floating gate memory cell | |
IT1238539B (it) | Cella elettrochimica. | |
DE3675531D1 (de) | Elektrochemische brennstoffzellen. | |
DE3863095D1 (de) | Korrosionsbestaendige brennstoffzellenstruktur. | |
DE3674738D1 (de) | Brennstoffzellenplatten. | |
IT8622373A0 (it) | Cella di memoria eeprom a singolo livello di polisilicio con zona di ossido di tunnel. | |
DE3767729D1 (de) | Assoziativspeicherzelle. | |
IT8719656A0 (it) | Cella di memoria eprom a due semicelle simmetriche con gate flottante separata. | |
DE3576613D1 (de) | Brennstoffzellenvorrichtungen. | |
DE68909732D1 (de) | Photoleitende zelle. | |
DE3850567D1 (de) | DRAM-Zelle mit verstärkter Ladung. | |
DE3677810D1 (de) | Brennstoffzelle. | |
DE3766511D1 (de) | Brennstoffzelle. | |
FI891201A0 (fi) | Elektrokemisk cell. | |
FI850441L (fi) | Elektrolytisk cell. | |
DE3854005D1 (de) | Speicherzelle. | |
DE3685717T2 (de) | Speicherzellenanordnung. | |
GB2236881B (en) | Improved synapse cell employing dual gate transistor structure | |
DE3850048T2 (de) | Speicherzellenzugriff. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19970329 |