IT1196672B - Apparecchiatura e metodo di elettro placcatura - Google Patents

Apparecchiatura e metodo di elettro placcatura

Info

Publication number
IT1196672B
IT1196672B IT68174/82A IT6817482A IT1196672B IT 1196672 B IT1196672 B IT 1196672B IT 68174/82 A IT68174/82 A IT 68174/82A IT 6817482 A IT6817482 A IT 6817482A IT 1196672 B IT1196672 B IT 1196672B
Authority
IT
Italy
Prior art keywords
equipment
electro plating
plating
electro
Prior art date
Application number
IT68174/82A
Other languages
English (en)
Other versions
IT8268174A0 (it
Inventor
Joseph M Brady
Franz R Cordes
Daniel L Goffredo
Conrad D Shakley
Klaus H Gedrat
Walter Meyer
Original Assignee
Chemcut Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chemcut Corp filed Critical Chemcut Corp
Publication of IT8268174A0 publication Critical patent/IT8268174A0/it
Application granted granted Critical
Publication of IT1196672B publication Critical patent/IT1196672B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/02—Heating or cooling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/10—Agitating of electrolytes; Moving of racks
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • C25D7/0621—In horizontal cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • C25D7/0657—Conducting rolls
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • H05K3/241—Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Of Printed Wiring (AREA)
IT68174/82A 1981-10-07 1982-10-06 Apparecchiatura e metodo di elettro placcatura IT1196672B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/309,180 US4385967A (en) 1981-10-07 1981-10-07 Electroplating apparatus and method

Publications (2)

Publication Number Publication Date
IT8268174A0 IT8268174A0 (it) 1982-10-06
IT1196672B true IT1196672B (it) 1988-11-25

Family

ID=23197043

Family Applications (1)

Application Number Title Priority Date Filing Date
IT68174/82A IT1196672B (it) 1981-10-07 1982-10-06 Apparecchiatura e metodo di elettro placcatura

Country Status (13)

Country Link
US (1) US4385967A (it)
JP (1) JPS58136797A (it)
AT (1) AT378009B (it)
CA (1) CA1190888A (it)
CH (1) CH652758A5 (it)
DE (1) DE3236545C2 (it)
ES (1) ES516287A0 (it)
FR (1) FR2514037B1 (it)
GB (1) GB2107357B (it)
IE (1) IE54263B1 (it)
IT (1) IT1196672B (it)
NL (1) NL8203845A (it)
SE (1) SE8205713L (it)

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US4755271A (en) * 1986-07-28 1988-07-05 Siemens Aktiengesellschaft Electroplating apparatus for plate-shaped workpieces, particularly printed circuit boards
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DE3864526D1 (de) * 1987-01-26 1991-10-10 Siemens Ag Galvanisierungseinrichtung fuer plattenfoermige werkstuecke, insbesondere leiterplatten.
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DE58904413D1 (de) * 1988-09-01 1993-06-24 Siemens Nixdorf Inf Syst Galvanisiereinrichtung fuer plattenfoermige werkstuecke, insbesondere leiterplatten.
ATE89615T1 (de) * 1988-09-01 1993-06-15 Siemens Nixdorf Inf Syst Galvanisiereinrichtung fuer plattenfoermige werkstuecke, insbesondere leiterplatten.
US4871435A (en) * 1988-10-14 1989-10-03 Charles Denofrio Electroplating apparatus
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DE4212567A1 (de) * 1992-03-14 1993-09-16 Schmid Gmbh & Co Geb Einrichtung zur behandlung von gegenstaenden, insbesondere galvanisiereinrichtungen fuer leiterplatten
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NL2005480C2 (nl) 2010-10-07 2012-04-11 Meco Equip Eng Inrichting voor het eenzijdig elektrolytisch behandelen van een vlak substraat.
ES2688521T3 (es) 2010-10-20 2018-11-05 Fluidic, Inc. Procesos de reinicio de batería para electrodo de combustible en armazón
JP5908251B2 (ja) 2010-11-17 2016-04-26 フルイディック，インク．Ｆｌｕｉｄｉｃ，Ｉｎｃ． 階層型アノードのマルチモード充電
CN102121126B (zh) * 2011-01-19 2014-12-31 俊杰机械(深圳)有限公司 一种带导轮架的pcb电镀装置
EP2518187A1 (en) 2011-04-26 2012-10-31 Atotech Deutschland GmbH Aqueous acidic bath for electrolytic deposition of copper
DE102012221012B4 (de) 2012-11-16 2023-01-19 Atotech Deutschland Gmbh Vorrichtung und Verfahren zur Behandlung von flachem Behandlungsgut
CN103266334B (zh) * 2013-04-24 2015-12-02 东莞市鸿展机械设备有限公司 隔液传送装置
CN104862760A (zh) * 2015-06-11 2015-08-26 重庆德凯覆铜板有限公司 铝板表面阳极氧化生产线
JP2019521497A (ja) 2016-07-22 2019-07-25 ナントエナジー，インク． 電気化学セル内の水分及び二酸化炭素管理システム
JP7064115B2 (ja) 2016-08-15 2022-05-10 アトテック ドイチュラント ゲー・エム・ベー・ハー ウント コー． カー・ゲー 電解銅めっきのための酸性水性組成物
EP3470552B1 (en) 2017-10-13 2020-12-30 ATOTECH Deutschland GmbH An acidic aqueous composition for electrolytically depositing a copper deposit
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Also Published As

Publication number Publication date
NL8203845A (nl) 1983-05-02
SE8205713L (sv) 1983-04-08
IE822387L (en) 1983-04-07
CA1190888A (en) 1985-07-23
SE8205713D0 (sv) 1982-10-06
US4385967A (en) 1983-05-31
IT8268174A0 (it) 1982-10-06
GB2107357B (en) 1984-12-12
ES8402370A1 (es) 1984-01-16
DE3236545C2 (de) 1991-12-12
JPH0222159B2 (it) 1990-05-17
ES516287A0 (es) 1984-01-16
JPS58136797A (ja) 1983-08-13
IE54263B1 (en) 1989-08-02
DE3236545A1 (de) 1983-05-05
AT378009B (de) 1985-06-10
GB2107357A (en) 1983-04-27
CH652758A5 (it) 1985-11-29
FR2514037B1 (fr) 1986-12-26
ATA367882A (de) 1984-10-15
FR2514037A1 (fr) 1983-04-08

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