IT1147064B - Procedimento per produrre un dispositivo a semiconduttore in uno strato epitassiale simulato - Google Patents
Procedimento per produrre un dispositivo a semiconduttore in uno strato epitassiale simulatoInfo
- Publication number
- IT1147064B IT1147064B IT49502/80A IT4950280A IT1147064B IT 1147064 B IT1147064 B IT 1147064B IT 49502/80 A IT49502/80 A IT 49502/80A IT 4950280 A IT4950280 A IT 4950280A IT 1147064 B IT1147064 B IT 1147064B
- Authority
- IT
- Italy
- Prior art keywords
- procedure
- producing
- semiconductor device
- epitaxial layer
- simulated epitaxial
- Prior art date
Links
Classifications
-
- H10P32/1406—
-
- H10P30/204—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
-
- H10P30/212—
-
- H10P32/171—
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US6768679A | 1979-08-20 | 1979-08-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IT8049502A0 IT8049502A0 (it) | 1980-08-14 |
| IT1147064B true IT1147064B (it) | 1986-11-19 |
Family
ID=22077689
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT49502/80A IT1147064B (it) | 1979-08-20 | 1980-08-14 | Procedimento per produrre un dispositivo a semiconduttore in uno strato epitassiale simulato |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS5630766A (index.php) |
| CA (1) | CA1131797A (index.php) |
| DE (1) | DE3027197A1 (index.php) |
| FR (1) | FR2463825A1 (index.php) |
| GB (1) | GB2056765A (index.php) |
| IT (1) | IT1147064B (index.php) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2156383A (en) * | 1984-02-06 | 1985-10-09 | Plessey Co Plc | Infra-red material structures |
| JPH02109158U (index.php) * | 1989-02-10 | 1990-08-30 | ||
| JPH0338044A (ja) * | 1989-07-05 | 1991-02-19 | Toshiba Corp | 半導体装置の製造方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL302630A (index.php) * | 1963-01-18 | 1900-01-01 | ||
| US3810791A (en) * | 1970-08-03 | 1974-05-14 | Texas Instruments Inc | Process for the fabrication of semiconductor materials |
| US3876472A (en) * | 1974-04-15 | 1975-04-08 | Rca Corp | Method of achieving semiconductor substrates having similar surface resistivity |
| US3945856A (en) * | 1974-07-15 | 1976-03-23 | Ibm Corporation | Method of ion implantation through an electrically insulative material |
| JPS6051275B2 (ja) * | 1975-10-30 | 1985-11-13 | ソニー株式会社 | 半導体装置の製造方法 |
| US4055884A (en) * | 1976-12-13 | 1977-11-01 | International Business Machines Corporation | Fabrication of power field effect transistors and the resulting structures |
-
1980
- 1980-03-24 CA CA348,272A patent/CA1131797A/en not_active Expired
- 1980-04-22 GB GB8013170A patent/GB2056765A/en not_active Withdrawn
- 1980-06-23 FR FR8013899A patent/FR2463825A1/fr active Granted
- 1980-07-18 DE DE19803027197 patent/DE3027197A1/de not_active Withdrawn
- 1980-07-23 JP JP10001280A patent/JPS5630766A/ja active Pending
- 1980-08-14 IT IT49502/80A patent/IT1147064B/it active
Also Published As
| Publication number | Publication date |
|---|---|
| DE3027197A1 (de) | 1981-03-19 |
| FR2463825B1 (index.php) | 1982-12-10 |
| JPS5630766A (en) | 1981-03-27 |
| FR2463825A1 (fr) | 1981-02-27 |
| GB2056765A (en) | 1981-03-18 |
| CA1131797A (en) | 1982-09-14 |
| IT8049502A0 (it) | 1980-08-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19970827 |