IT1031627B - Procedimento per produrre monocristalli di silicio con conducibilita p orogati in modo uniforme - Google Patents

Procedimento per produrre monocristalli di silicio con conducibilita p orogati in modo uniforme

Info

Publication number
IT1031627B
IT1031627B IT20138/75A IT2013875A IT1031627B IT 1031627 B IT1031627 B IT 1031627B IT 20138/75 A IT20138/75 A IT 20138/75A IT 2013875 A IT2013875 A IT 2013875A IT 1031627 B IT1031627 B IT 1031627B
Authority
IT
Italy
Prior art keywords
oroged
conductivity
uniformly
procedure
producing silicon
Prior art date
Application number
IT20138/75A
Other languages
English (en)
Italian (it)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Application granted granted Critical
Publication of IT1031627B publication Critical patent/IT1031627B/it

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26Bombardment with radiation
    • H01L21/261Bombardment with radiation to produce a nuclear reaction transmuting chemical elements
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/20Doping by irradiation with electromagnetic waves or by particle radiation
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00Irradiation devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/04Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
    • H01L29/045Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes by their particular orientation of crystalline planes
IT20138/75A 1974-02-18 1975-02-11 Procedimento per produrre monocristalli di silicio con conducibilita p orogati in modo uniforme IT1031627B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2407697A DE2407697C3 (de) 1974-02-18 1974-02-18 Verfahren zum Herstellen eines homogen Ga-dotierten Siliciumeinkristalls

Publications (1)

Publication Number Publication Date
IT1031627B true IT1031627B (it) 1979-05-10

Family

ID=5907718

Family Applications (1)

Application Number Title Priority Date Filing Date
IT20138/75A IT1031627B (it) 1974-02-18 1975-02-11 Procedimento per produrre monocristalli di silicio con conducibilita p orogati in modo uniforme

Country Status (12)

Country Link
JP (1) JPS5329572B2 (es)
AT (1) AT339379B (es)
BE (1) BE816719A (es)
DE (1) DE2407697C3 (es)
DK (1) DK658274A (es)
FR (1) FR2261055B1 (es)
GB (1) GB1442930A (es)
IT (1) IT1031627B (es)
NL (1) NL7410745A (es)
PL (1) PL91842B1 (es)
SU (1) SU717999A3 (es)
ZA (1) ZA746269B (es)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9799736B1 (en) 2016-07-20 2017-10-24 International Business Machines Corporation High acceptor level doping in silicon germanium

Also Published As

Publication number Publication date
FR2261055B1 (es) 1979-01-05
DE2407697C3 (de) 1978-11-30
AT339379B (de) 1977-10-10
ZA746269B (en) 1975-10-29
GB1442930A (en) 1976-07-14
SU717999A3 (ru) 1980-02-25
PL91842B1 (es) 1977-03-31
JPS5329572B2 (es) 1978-08-22
JPS50120253A (es) 1975-09-20
DE2407697A1 (de) 1975-09-18
BE816719A (fr) 1974-10-16
ATA667874A (de) 1977-02-15
DE2407697B2 (de) 1978-04-06
FR2261055A1 (es) 1975-09-12
NL7410745A (nl) 1975-08-20
DK658274A (es) 1975-10-27

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