JPS50120253A - - Google Patents

Info

Publication number
JPS50120253A
JPS50120253A JP50017776A JP1777675A JPS50120253A JP S50120253 A JPS50120253 A JP S50120253A JP 50017776 A JP50017776 A JP 50017776A JP 1777675 A JP1777675 A JP 1777675A JP S50120253 A JPS50120253 A JP S50120253A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50017776A
Other languages
Japanese (ja)
Other versions
JPS5329572B2 (es
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS50120253A publication Critical patent/JPS50120253A/ja
Publication of JPS5329572B2 publication Critical patent/JPS5329572B2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26Bombardment with radiation
    • H01L21/261Bombardment with radiation to produce a nuclear reaction transmuting chemical elements
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/20Doping by irradiation with electromagnetic waves or by particle radiation
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00Irradiation devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/04Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
    • H01L29/045Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes by their particular orientation of crystalline planes
JP1777675A 1974-02-18 1975-02-12 Expired JPS5329572B2 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2407697A DE2407697C3 (de) 1974-02-18 1974-02-18 Verfahren zum Herstellen eines homogen Ga-dotierten Siliciumeinkristalls

Publications (2)

Publication Number Publication Date
JPS50120253A true JPS50120253A (es) 1975-09-20
JPS5329572B2 JPS5329572B2 (es) 1978-08-22

Family

ID=5907718

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1777675A Expired JPS5329572B2 (es) 1974-02-18 1975-02-12

Country Status (12)

Country Link
JP (1) JPS5329572B2 (es)
AT (1) AT339379B (es)
BE (1) BE816719A (es)
DE (1) DE2407697C3 (es)
DK (1) DK658274A (es)
FR (1) FR2261055B1 (es)
GB (1) GB1442930A (es)
IT (1) IT1031627B (es)
NL (1) NL7410745A (es)
PL (1) PL91842B1 (es)
SU (1) SU717999A3 (es)
ZA (1) ZA746269B (es)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9799736B1 (en) 2016-07-20 2017-10-24 International Business Machines Corporation High acceptor level doping in silicon germanium

Also Published As

Publication number Publication date
JPS5329572B2 (es) 1978-08-22
ZA746269B (en) 1975-10-29
FR2261055B1 (es) 1979-01-05
DE2407697C3 (de) 1978-11-30
FR2261055A1 (es) 1975-09-12
GB1442930A (en) 1976-07-14
DE2407697A1 (de) 1975-09-18
BE816719A (fr) 1974-10-16
NL7410745A (nl) 1975-08-20
PL91842B1 (es) 1977-03-31
AT339379B (de) 1977-10-10
DK658274A (es) 1975-10-27
IT1031627B (it) 1979-05-10
ATA667874A (de) 1977-02-15
DE2407697B2 (de) 1978-04-06
SU717999A3 (ru) 1980-02-25

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