IL187706A - Use of cmp for aluminum mirror and solar cell fabrication - Google Patents

Use of cmp for aluminum mirror and solar cell fabrication

Info

Publication number
IL187706A
IL187706A IL187706A IL18770607A IL187706A IL 187706 A IL187706 A IL 187706A IL 187706 A IL187706 A IL 187706A IL 18770607 A IL18770607 A IL 18770607A IL 187706 A IL187706 A IL 187706A
Authority
IL
Israel
Prior art keywords
polishing
substrate
aluminum
polishing composition
abrasive
Prior art date
Application number
IL187706A
Other languages
English (en)
Original Assignee
Cabot Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Microelectronics Corp filed Critical Cabot Microelectronics Corp
Publication of IL187706A publication Critical patent/IL187706A/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
    • B24B13/015—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor of television picture tube viewing panels, headlight reflectors or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/40—Optical elements or arrangements
    • H10F77/42—Optical elements or arrangements directly associated or integrated with photovoltaic cells, e.g. light-reflecting means or light-concentrating means

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
IL187706A 2005-06-30 2007-11-27 Use of cmp for aluminum mirror and solar cell fabrication IL187706A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/173,518 US8062096B2 (en) 2005-06-30 2005-06-30 Use of CMP for aluminum mirror and solar cell fabrication
PCT/US2006/024789 WO2007120163A2 (en) 2005-06-30 2006-06-22 Use of cmp for aluminum mirror and solar cell fabrication

Publications (1)

Publication Number Publication Date
IL187706A true IL187706A (en) 2012-07-31

Family

ID=37618822

Family Applications (1)

Application Number Title Priority Date Filing Date
IL187706A IL187706A (en) 2005-06-30 2007-11-27 Use of cmp for aluminum mirror and solar cell fabrication

Country Status (10)

Country Link
US (1) US8062096B2 (https=)
EP (1) EP1917122B1 (https=)
JP (1) JP5155858B2 (https=)
KR (2) KR20110112463A (https=)
CN (1) CN101208178A (https=)
IL (1) IL187706A (https=)
MY (1) MY146358A (https=)
SG (1) SG163546A1 (https=)
TW (1) TWI300735B (https=)
WO (1) WO2007120163A2 (https=)

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US20070068605A1 (en) * 2005-09-23 2007-03-29 U.I.T., Llc Method of metal performance improvement and protection against degradation and suppression thereof by ultrasonic impact
JP5599547B2 (ja) * 2006-12-01 2014-10-01 Ｍｉｐｏｘ株式会社 硬質結晶基板研磨方法及び油性研磨スラリー
JP2009035461A (ja) * 2007-08-03 2009-02-19 Asahi Glass Co Ltd 磁気ディスク用ガラス基板の製造方法
EP2228467A3 (en) * 2009-03-11 2015-08-26 Fujifilm Corporation Aluminum alloy substrate and solar cell substrate
JP2011025347A (ja) * 2009-07-24 2011-02-10 Disco Abrasive Syst Ltd 金属板の加工方法
KR101232813B1 (ko) * 2009-09-30 2013-02-13 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드 스택 장치의 제작을 위한 관통-베이스 웨이퍼 비아를 노출시키는 방법
US20140308155A1 (en) * 2011-11-25 2014-10-16 Fujimi Incorporated Method for polishing alloy material and method for producing alloy material
KR20150065757A (ko) * 2012-10-03 2015-06-15 가부시키가이샤 후지미인코퍼레이티드 연마 방법 및 합금 재료의 제조 방법
US8845394B2 (en) 2012-10-29 2014-09-30 Wayne O. Duescher Bellows driven air floatation abrading workholder
US9233452B2 (en) 2012-10-29 2016-01-12 Wayne O. Duescher Vacuum-grooved membrane abrasive polishing wafer workholder
US9011207B2 (en) 2012-10-29 2015-04-21 Wayne O. Duescher Flexible diaphragm combination floating and rigid abrading workholder
US8998678B2 (en) 2012-10-29 2015-04-07 Wayne O. Duescher Spider arm driven flexible chamber abrading workholder
US8998677B2 (en) 2012-10-29 2015-04-07 Wayne O. Duescher Bellows driven floatation-type abrading workholder
US9199354B2 (en) 2012-10-29 2015-12-01 Wayne O. Duescher Flexible diaphragm post-type floating and rigid abrading workholder
US9039488B2 (en) 2012-10-29 2015-05-26 Wayne O. Duescher Pin driven flexible chamber abrading workholder
US9604339B2 (en) 2012-10-29 2017-03-28 Wayne O. Duescher Vacuum-grooved membrane wafer polishing workholder
EP2915859A4 (en) 2012-10-31 2015-10-28 Fujimi Inc POLISHING COMPOSITION
CN102941528B (zh) * 2012-11-20 2014-12-17 中国人民解放军国防科学技术大学 具有高精度超光滑表面的铝合金材料及抛光盘、抛光液和抛光方法
JP6622963B2 (ja) * 2013-01-04 2019-12-18 株式会社フジミインコーポレーテッド 合金材料の研磨方法及び合金材料の製造方法
JP6438191B2 (ja) * 2013-12-10 2018-12-12 三菱瓦斯化学株式会社 ポリカーボネート樹脂フィルムおよびそれを用いた成形体
JP2015203080A (ja) * 2014-04-15 2015-11-16 株式会社フジミインコーポレーテッド 研磨用組成物
US20180297173A1 (en) * 2015-04-07 2018-10-18 Hewlett-Packard Development Company, L.P. Methods of Polishing
WO2018191485A1 (en) * 2017-04-14 2018-10-18 Cabot Microelectronics Corporation Chemical-mechanical processing slurry and methods for processing a nickel substrate surface
US10926378B2 (en) 2017-07-08 2021-02-23 Wayne O. Duescher Abrasive coated disk islands using magnetic font sheet
KR102777772B1 (ko) * 2018-11-27 2025-03-06 쓰리엠 이노베이티브 프로퍼티즈 컴파니 폴리싱 패드 및 시스템과 이의 제조 및 사용 방법
US11691241B1 (en) * 2019-08-05 2023-07-04 Keltech Engineering, Inc. Abrasive lapping head with floating and rigid workpiece carrier
KR102349153B1 (ko) * 2019-12-16 2022-01-10 주식회사 포스코 알루미늄 합금용 연마 용액, 그 제조방법 및 이를 이용한 연마 방법
CN116141214B (zh) * 2022-08-04 2024-08-27 华侨大学 一种可循环利用的混合磨料抛光膜的制备方法

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Also Published As

Publication number Publication date
JP5155858B2 (ja) 2013-03-06
US8062096B2 (en) 2011-11-22
KR101178338B1 (ko) 2012-08-29
WO2007120163A2 (en) 2007-10-25
MY146358A (en) 2012-08-15
TWI300735B (en) 2008-09-11
SG163546A1 (en) 2010-08-30
JP2008544868A (ja) 2008-12-11
CN101208178A (zh) 2008-06-25
TW200714406A (en) 2007-04-16
US20070010098A1 (en) 2007-01-11
EP1917122A2 (en) 2008-05-07
WO2007120163A3 (en) 2008-02-28
KR20110112463A (ko) 2011-10-12
KR20080015471A (ko) 2008-02-19
EP1917122B1 (en) 2018-05-16

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