IL136037A0 - Exposure apparatus, apparatus for manufacturing devices, and method of manufacturing exposure apparatuses - Google Patents

Exposure apparatus, apparatus for manufacturing devices, and method of manufacturing exposure apparatuses

Info

Publication number
IL136037A0
IL136037A0 IL13603798A IL13603798A IL136037A0 IL 136037 A0 IL136037 A0 IL 136037A0 IL 13603798 A IL13603798 A IL 13603798A IL 13603798 A IL13603798 A IL 13603798A IL 136037 A0 IL136037 A0 IL 136037A0
Authority
IL
Israel
Prior art keywords
manufacturing
exposure
devices
apparatuses
exposure apparatuses
Prior art date
Application number
IL13603798A
Other languages
English (en)
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP31043997A external-priority patent/JP2001093796A/ja
Priority claimed from JP35668097A external-priority patent/JP2001093797A/ja
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of IL136037A0 publication Critical patent/IL136037A0/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
IL13603798A 1997-11-12 1998-11-11 Exposure apparatus, apparatus for manufacturing devices, and method of manufacturing exposure apparatuses IL136037A0 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP31043997A JP2001093796A (ja) 1997-11-12 1997-11-12 投影露光装置
JP32636397 1997-11-27
JP35668097A JP2001093797A (ja) 1997-12-25 1997-12-25 露光装置
PCT/JP1998/005073 WO1999025010A1 (fr) 1997-11-12 1998-11-11 Appareil d'exposition, appareil de fabrication de composants, et procede de fabrication d'appareils d'exposition

Publications (1)

Publication Number Publication Date
IL136037A0 true IL136037A0 (en) 2001-05-20

Family

ID=27339104

Family Applications (1)

Application Number Title Priority Date Filing Date
IL13603798A IL136037A0 (en) 1997-11-12 1998-11-11 Exposure apparatus, apparatus for manufacturing devices, and method of manufacturing exposure apparatuses

Country Status (7)

Country Link
US (1) US20020145711A1 (xx)
EP (1) EP1030351A1 (xx)
KR (1) KR20010031972A (xx)
AU (1) AU1051899A (xx)
IL (1) IL136037A0 (xx)
TW (1) TW444270B (xx)
WO (1) WO1999025010A1 (xx)

Families Citing this family (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000048237A1 (fr) 1999-02-12 2000-08-17 Nikon Corporation Procede et appareil d'exposition
WO2001006548A1 (fr) 1999-07-16 2001-01-25 Nikon Corporation Procede et systeme d'exposition
US6654095B1 (en) 1999-10-18 2003-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP2001118783A (ja) 1999-10-21 2001-04-27 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
TW563002B (en) * 1999-11-05 2003-11-21 Asml Netherlands Bv Lithographic projection apparatus, method of manufacturing a device using a lithographic projection apparatus, and device manufactured by the method
US6690450B2 (en) * 2000-01-31 2004-02-10 Nikon Corporation Exposure method, exposure apparatus, method for producing exposure apparatus, and method for producing device
US7301605B2 (en) 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP2001345263A (ja) 2000-03-31 2001-12-14 Nikon Corp 露光装置及び露光方法、並びにデバイス製造方法
AU4461901A (en) * 2000-03-31 2001-11-07 Nikon Corporation Method and apparatus for measurement, and method and apparatus for exposure
WO2001075501A1 (fr) 2000-03-31 2001-10-11 Nikon Corporation Procede et dispositif de soutien d'un element optique, dispositif optique, appareil d'exposition, et procede de fabrication d'un dispositif
JP2002057089A (ja) * 2000-08-09 2002-02-22 Canon Inc 露光装置
JPWO2002037545A1 (ja) * 2000-10-31 2004-03-11 株式会社ニコン 露光方法及び装置
JP2002151400A (ja) 2000-11-15 2002-05-24 Canon Inc 露光装置、その保守方法並びに同装置を用いた半導体デバイス製造方法及び半導体製造工場
JP2002289515A (ja) 2000-12-28 2002-10-04 Nikon Corp 製品の製造方法、露光装置の製造方法、露光装置、及びデバイス製造方法
EP1256844A1 (en) * 2001-05-09 2002-11-13 ASML Netherlands B.V. Lithographic apparatus
JP2003115451A (ja) * 2001-07-30 2003-04-18 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
US7105048B2 (en) * 2001-11-30 2006-09-12 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation apparatus
US7133737B2 (en) * 2001-11-30 2006-11-07 Semiconductor Energy Laboratory Co., Ltd. Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer
AU2003235124A1 (en) * 2002-04-24 2003-11-10 Nikon Corporation Exposure system and device manufacturing method
US7050149B2 (en) * 2002-06-11 2006-05-23 Nikon Corporation Exposure apparatus and exposure method
WO2003105203A1 (ja) * 2002-06-11 2003-12-18 株式会社ニコン 露光装置及び露光方法
US6984573B2 (en) * 2002-06-14 2006-01-10 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation method and apparatus
JP4004895B2 (ja) * 2002-08-29 2007-11-07 株式会社フジクラ 光学装置
US6829035B2 (en) * 2002-11-12 2004-12-07 Applied Materials Israel, Ltd. Advanced mask cleaning and handling
DE10253162B4 (de) * 2002-11-14 2005-11-03 Infineon Technologies Ag Verfahren zum Spülen einer optischen Linse
JP2004317566A (ja) * 2003-04-11 2004-11-11 Orc Mfg Co Ltd レーザ装置及びレーザ波長変換装置
US6867844B2 (en) 2003-06-19 2005-03-15 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
KR101613384B1 (ko) * 2003-08-21 2016-04-18 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
KR101477850B1 (ko) * 2003-08-29 2014-12-30 가부시키가이샤 니콘 액체회수장치, 노광장치, 노광방법 및 디바이스 제조방법
JP2005142185A (ja) * 2003-11-04 2005-06-02 Canon Inc 露光装置及びその環境制御方法
JP2005142382A (ja) * 2003-11-07 2005-06-02 Canon Inc 露光装置
CN1965389B (zh) * 2004-06-09 2011-08-10 尼康股份有限公司 基板保持装置、具备其之曝光装置及方法、元件制造方法
KR101143005B1 (ko) * 2004-12-14 2012-05-08 삼성전자주식회사 마스크 및 이를 이용한 반도체 소자의 제조 방법 및 박막트랜지스터 표시판의 제조 방법
US7502095B2 (en) * 2005-03-29 2009-03-10 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US20070085984A1 (en) * 2005-10-18 2007-04-19 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method and device manufactured thereby
TWI330762B (en) * 2005-03-29 2010-09-21 Asml Netherlands Bv Seal of a lithographic apparatus, lithographic apparatus, device manufacturing method and data storage medium
TWI552797B (zh) * 2005-06-22 2016-10-11 恩特葛瑞斯股份有限公司 整合式氣體混合用之裝置及方法
EP1933992B1 (en) 2005-08-30 2014-09-24 Advanced Technology Materials, Inc. Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation
KR100870791B1 (ko) 2006-02-15 2008-11-27 캐논 가부시끼가이샤 노광장치, 노광방법 및 노광시스템
DE102006017904B4 (de) * 2006-04-13 2008-07-03 Xtreme Technologies Gmbh Anordnung zur Erzeugung von extrem ultravioletter Strahlung aus einem energiestrahlerzeugten Plasma mit hoher Konversionseffizienz und minimaler Kontamination
US20080073596A1 (en) * 2006-08-24 2008-03-27 Asml Netherlands B.V. Lithographic apparatus and method
DE102007034652A1 (de) * 2007-07-25 2009-01-29 Carl Zeiss Smt Ag Vorrichtung zur Temperatureinstellung eines optischen Elements
US8964166B2 (en) * 2007-12-17 2015-02-24 Nikon Corporation Stage device, exposure apparatus and method of producing device
JP2011512015A (ja) 2008-02-11 2011-04-14 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド 半導体処理システムにおけるイオン源の洗浄
NL1036957A1 (nl) * 2008-06-13 2009-12-15 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP4966922B2 (ja) * 2008-07-07 2012-07-04 東京エレクトロン株式会社 レジスト処理装置、レジスト塗布現像装置、およびレジスト処理方法
KR101032268B1 (ko) * 2009-01-09 2011-05-06 이지윤 가정용 소형 용기압착기
US20110021011A1 (en) 2009-07-23 2011-01-27 Advanced Technology Materials, Inc. Carbon materials for carbon implantation
US8598022B2 (en) 2009-10-27 2013-12-03 Advanced Technology Materials, Inc. Isotopically-enriched boron-containing compounds, and methods of making and using same
NL2005655A (en) 2009-12-09 2011-06-14 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
KR102141138B1 (ko) * 2012-03-14 2020-08-05 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치
NL2010916A (en) 2012-07-06 2014-01-07 Asml Netherlands Bv A lithographic apparatus.
TWI512374B (zh) 2013-11-05 2015-12-11 Au Optronics Corp 光配向設備與光配向方法
US9488924B2 (en) * 2014-01-07 2016-11-08 Applied Materials Israel Ltd. Cleaning an object within a non-vacuumed environment
CN107111249A (zh) * 2014-12-31 2017-08-29 Asml控股股份有限公司 具有图案化装置环境的光刻设备
KR102434111B1 (ko) * 2015-03-27 2022-08-19 도쿄엘렉트론가부시키가이샤 미립자 계측 장치
US20190056637A1 (en) * 2017-08-21 2019-02-21 Kla-Tencor Corporation In-Situ Passivation for Nonlinear Optical Crystals
JP6976884B2 (ja) * 2018-02-28 2021-12-08 キヤノン株式会社 露光装置、および物品の製造方法
JP7213761B2 (ja) * 2019-06-18 2023-01-27 キヤノン株式会社 露光装置、および物品製造方法
KR20210012917A (ko) * 2019-07-25 2021-02-03 캐논 가부시끼가이샤 광학장치, 노광 장치 및 물품의 제조 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4616908A (en) * 1984-07-19 1986-10-14 Gca Corporation Microlithographic system
JPS62199714U (xx) * 1986-06-06 1987-12-19
JP3038285B2 (ja) * 1993-10-27 2000-05-08 キヤノン株式会社 減圧処理装置
JPH08327895A (ja) * 1995-05-26 1996-12-13 Nikon Corp 投影光学装置
JP4011643B2 (ja) * 1996-01-05 2007-11-21 キヤノン株式会社 半導体製造装置
JPH09283419A (ja) * 1996-04-09 1997-10-31 Canon Inc 減圧チャンバおよびこれを用いた露光装置
JPH09306825A (ja) * 1996-05-10 1997-11-28 Canon Inc 半導体製造装置

Also Published As

Publication number Publication date
EP1030351A1 (en) 2000-08-23
AU1051899A (en) 1999-05-31
US20020145711A1 (en) 2002-10-10
WO1999025010A1 (fr) 1999-05-20
KR20010031972A (ko) 2001-04-16
TW444270B (en) 2001-07-01

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