IL133147A - תכשיר מתכתי רב שכבתי על גבי מוצר פולימרי דק ותהליך להכנתו - Google Patents
תכשיר מתכתי רב שכבתי על גבי מוצר פולימרי דק ותהליך להכנתוInfo
- Publication number
- IL133147A IL133147A IL13314799A IL13314799A IL133147A IL 133147 A IL133147 A IL 133147A IL 13314799 A IL13314799 A IL 13314799A IL 13314799 A IL13314799 A IL 13314799A IL 133147 A IL133147 A IL 133147A
- Authority
- IL
- Israel
- Prior art keywords
- nitride
- composite
- metal
- layer
- copper
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/12—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a coating with specific electrical properties
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/388—Improvement of the adhesion between the insulating substrate and the metal by the use of a metallic or inorganic thin film adhesion layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24521—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness with component conforming to contour of nonplanar surface
- Y10T428/24545—Containing metal or metal compound
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31721—Of polyimide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31786—Of polyester [e.g., alkyd, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Laminated Bodies (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Woven Fabrics (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/053,859 US6042929A (en) | 1998-03-26 | 1998-03-26 | Multilayer metalized composite on polymer film product and process |
PCT/US1999/002961 WO1999048620A1 (en) | 1998-03-26 | 1999-02-08 | Multilayer metalized composite on polymer film product and process |
Publications (2)
Publication Number | Publication Date |
---|---|
IL133147A0 IL133147A0 (en) | 2001-03-19 |
IL133147A true IL133147A (he) | 2004-02-08 |
Family
ID=21987036
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL13314799A IL133147A (he) | 1998-03-26 | 1999-02-08 | תכשיר מתכתי רב שכבתי על גבי מוצר פולימרי דק ותהליך להכנתו |
Country Status (11)
Country | Link |
---|---|
US (1) | US6042929A (he) |
EP (1) | EP0989914B1 (he) |
JP (1) | JP2002511809A (he) |
KR (1) | KR20010013051A (he) |
CN (1) | CN1198692C (he) |
AT (1) | ATE401766T1 (he) |
BR (1) | BR9904886A (he) |
CA (1) | CA2306786C (he) |
DE (1) | DE69939087D1 (he) |
IL (1) | IL133147A (he) |
WO (1) | WO1999048620A1 (he) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6083628A (en) * | 1994-11-04 | 2000-07-04 | Sigma Laboratories Of Arizona, Inc. | Hybrid polymer film |
JP3606095B2 (ja) * | 1998-10-06 | 2005-01-05 | セイコーエプソン株式会社 | 半導体装置の製造方法 |
JP2000294922A (ja) * | 1999-04-01 | 2000-10-20 | Victor Co Of Japan Ltd | 多層プリント配線板用の絶縁樹脂組成物 |
US6734455B2 (en) * | 2001-03-15 | 2004-05-11 | Micron Technology, Inc. | Agglomeration elimination for metal sputter deposition of chalcogenides |
JP2004534390A (ja) * | 2001-05-04 | 2004-11-11 | マイクロメタル テクノロジーズ インコーポレイテッド | Easタグ用金属化誘電体基板 |
JP3578116B2 (ja) * | 2001-06-25 | 2004-10-20 | Tdk株式会社 | スピンバルブ巨大磁気抵抗効果センサの製造方法及び薄膜磁気ヘッドの製造方法 |
CN1264391C (zh) * | 2001-06-27 | 2006-07-12 | 日本特殊陶业株式会社 | 布线基板的制造方法 |
US9376750B2 (en) * | 2001-07-18 | 2016-06-28 | Regents Of The University Of Colorado, A Body Corporate | Method of depositing an inorganic film on an organic polymer |
US6872652B2 (en) * | 2001-08-28 | 2005-03-29 | Infineon Technologies Ag | Method of cleaning an inter-level dielectric interconnect |
JP2003221456A (ja) * | 2002-01-29 | 2003-08-05 | Japan Gore Tex Inc | 高接着性液晶ポリマーフィルム |
US7113131B2 (en) * | 2002-05-02 | 2006-09-26 | Micrometal Technologies, Inc. | Metalized dielectric substrates for EAS tags |
JP4517564B2 (ja) * | 2002-05-23 | 2010-08-04 | 住友金属鉱山株式会社 | 2層銅ポリイミド基板 |
MXPA05007915A (es) | 2003-01-30 | 2005-09-30 | Europlasma | Metodo para proporcionar un revestimiento sobre las superficies de un producto con una estructura de celda abierta a lo largo de su estructura y uso de tal metodo. |
EP1778416A1 (en) * | 2004-06-16 | 2007-05-02 | PPG Industries Ohio, Inc. | Methods for removal of polymeric coating layers from coated substrates |
KR100807796B1 (ko) * | 2005-05-19 | 2008-03-06 | 한덕수 | 미세 패턴용 연성다층인쇄회로기판 |
KR20070049278A (ko) * | 2005-11-08 | 2007-05-11 | 삼성전자주식회사 | 배선, 이를 포함하는 박막 트랜지스터 기판과 그 제조 방법 |
KR100850212B1 (ko) * | 2007-04-20 | 2008-08-04 | 삼성전자주식회사 | 균일한 무전해 도금 두께를 얻을 수 있는 반도체 소자의제조방법 |
US20100098960A1 (en) * | 2007-06-18 | 2010-04-22 | Dominguez Juan E | Magnetic insulator nanolaminate device for integrated silicon voltage regulators |
JP5461988B2 (ja) * | 2007-07-02 | 2014-04-02 | 株式会社Jcu | 金属積層ポリイミド基盤及びその製造方法 |
KR100906308B1 (ko) | 2007-10-24 | 2009-07-07 | 성균관대학교산학협력단 | 미세 배선이 형성된 연성 전도성 폴리이미드 기판 및 이의제조방법 |
KR20110026016A (ko) * | 2008-07-22 | 2011-03-14 | 고쿠리츠 다이가쿠 호진 도호쿠 다이가쿠 | 배선 기판 및 그 제조 방법 |
CN102782531B (zh) * | 2009-12-15 | 2014-12-17 | 卡尔蔡司Smt有限责任公司 | 用于极紫外光刻的反射光学元件 |
JP5781428B2 (ja) * | 2011-12-20 | 2015-09-24 | 日東電工株式会社 | 導電性フィルムおよび導電性フィルムロール |
CN102978570B (zh) * | 2012-11-26 | 2014-10-08 | 蔡莳铨 | 金属蒸镀薄膜及其制作中间体和相关制作方法 |
US9614045B2 (en) * | 2014-09-17 | 2017-04-04 | Infineon Technologies Ag | Method of processing a semiconductor device and chip package |
CN104451955B (zh) * | 2014-11-25 | 2017-02-22 | 中国科学院电子学研究所 | 一种具有分级结构的金属或金属氧化物及其制备方法 |
US10879177B2 (en) * | 2015-06-19 | 2020-12-29 | Applied Materials, Inc. | PVD deposition and anneal of multi-layer metal-dielectric film |
CN106413266B (zh) | 2015-07-29 | 2018-11-23 | 苏州卫鹏机电科技有限公司 | 一种聚酰亚胺无胶柔性印刷线路板的制备方法 |
DE102016215709A1 (de) * | 2015-08-28 | 2017-03-02 | Tsubakimoto Chain Co. | Kettenkomponente und Kette |
CN107371338B (zh) * | 2016-05-13 | 2019-08-20 | 苏州卫鹏机电科技有限公司 | 一种超薄金属层的印刷线路板的制备方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4226932A (en) * | 1979-07-05 | 1980-10-07 | Gte Automatic Electric Laboratories Incorporated | Titanium nitride as one layer of a multi-layered coating intended to be etched |
DE3039821A1 (de) * | 1980-10-22 | 1982-06-03 | Robert Bosch Gmbh, 7000 Stuttgart | Mehrschichtsystem fuer waermeschutzanwendung |
US4382101A (en) * | 1981-01-23 | 1983-05-03 | Uop Inc. | Method for increasing the peel strength of metal-clad polymers |
US4337279A (en) * | 1981-01-23 | 1982-06-29 | Uop Inc. | Method for increasing the peel strength of metal-clad polymers |
US4597828A (en) * | 1985-03-25 | 1986-07-01 | Firan Corporation | Method of manufacturing printed circuit boards |
US4868071A (en) * | 1987-02-24 | 1989-09-19 | Polyonics Corporation | Thermally stable dual metal coated laminate products made from textured polyimide film |
US4806395A (en) * | 1987-02-24 | 1989-02-21 | Polyonics Corporation | Textured polyimide film |
US4725504A (en) * | 1987-02-24 | 1988-02-16 | Polyonics Corporation | Metal coated laminate products made from textured polyimide film |
JP2788779B2 (ja) * | 1990-03-09 | 1998-08-20 | 古河電気工業株式会社 | 回路基板用素材板 |
US5137791A (en) * | 1990-09-13 | 1992-08-11 | Sheldahl Inc. | Metal-film laminate resistant to delamination |
US5413687A (en) * | 1991-11-27 | 1995-05-09 | Rogers Corporation | Method for metallizing fluoropolymer substrates |
US5372848A (en) * | 1992-12-24 | 1994-12-13 | International Business Machines Corporation | Process for creating organic polymeric substrate with copper |
US5589280A (en) * | 1993-02-05 | 1996-12-31 | Southwall Technologies Inc. | Metal on plastic films with adhesion-promoting layer |
US5675310A (en) * | 1994-12-05 | 1997-10-07 | General Electric Company | Thin film resistors on organic surfaces |
JPH0971859A (ja) * | 1995-09-06 | 1997-03-18 | Nissin Electric Co Ltd | 貴金属膜被覆高分子基体及びその製造方法 |
US5874770A (en) * | 1996-10-10 | 1999-02-23 | General Electric Company | Flexible interconnect film including resistor and capacitor layers |
-
1998
- 1998-03-26 US US09/053,859 patent/US6042929A/en not_active Expired - Lifetime
-
1999
- 1999-02-08 JP JP54826299A patent/JP2002511809A/ja not_active Ceased
- 1999-02-08 EP EP99906923A patent/EP0989914B1/en not_active Expired - Lifetime
- 1999-02-08 AT AT99906923T patent/ATE401766T1/de not_active IP Right Cessation
- 1999-02-08 CA CA002306786A patent/CA2306786C/en not_active Expired - Fee Related
- 1999-02-08 BR BR9904886-8A patent/BR9904886A/pt not_active IP Right Cessation
- 1999-02-08 DE DE69939087T patent/DE69939087D1/de not_active Expired - Fee Related
- 1999-02-08 CN CNB998007781A patent/CN1198692C/zh not_active Expired - Fee Related
- 1999-02-08 WO PCT/US1999/002961 patent/WO1999048620A1/en active IP Right Grant
- 1999-02-08 IL IL13314799A patent/IL133147A/he active IP Right Grant
- 1999-02-08 KR KR1019997011027A patent/KR20010013051A/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
EP0989914A4 (en) | 2005-05-25 |
DE69939087D1 (de) | 2008-08-28 |
CA2306786A1 (en) | 1999-09-30 |
CN1272072A (zh) | 2000-11-01 |
JP2002511809A (ja) | 2002-04-16 |
EP0989914A1 (en) | 2000-04-05 |
CN1198692C (zh) | 2005-04-27 |
IL133147A0 (en) | 2001-03-19 |
ATE401766T1 (de) | 2008-08-15 |
EP0989914B1 (en) | 2008-07-16 |
CA2306786C (en) | 2005-01-11 |
US6042929A (en) | 2000-03-28 |
KR20010013051A (ko) | 2001-02-26 |
WO1999048620A1 (en) | 1999-09-30 |
BR9904886A (pt) | 2002-01-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FF | Patent granted | ||
KB | Patent renewed | ||
KB | Patent renewed |