IL106681A - הכנת משטח והפקדה של טיטניום ניטרידעל חומרים קרבונציים - Google Patents

הכנת משטח והפקדה של טיטניום ניטרידעל חומרים קרבונציים

Info

Publication number
IL106681A
IL106681A IL10668193A IL10668193A IL106681A IL 106681 A IL106681 A IL 106681A IL 10668193 A IL10668193 A IL 10668193A IL 10668193 A IL10668193 A IL 10668193A IL 106681 A IL106681 A IL 106681A
Authority
IL
Israel
Prior art keywords
substrate
plasma
titanium nitride
ions
hydrogen
Prior art date
Application number
IL10668193A
Other languages
English (en)
Other versions
IL106681A0 (en
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of IL106681A0 publication Critical patent/IL106681A0/xx
Publication of IL106681A publication Critical patent/IL106681A/he

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
IL10668193A 1992-08-14 1993-08-12 הכנת משטח והפקדה של טיטניום ניטרידעל חומרים קרבונציים IL106681A (he)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US92997092A 1992-08-14 1992-08-14

Publications (2)

Publication Number Publication Date
IL106681A0 IL106681A0 (en) 1993-12-08
IL106681A true IL106681A (he) 1996-06-18

Family

ID=25458765

Family Applications (1)

Application Number Title Priority Date Filing Date
IL10668193A IL106681A (he) 1992-08-14 1993-08-12 הכנת משטח והפקדה של טיטניום ניטרידעל חומרים קרבונציים

Country Status (9)

Country Link
US (1) US5487922A (he)
EP (1) EP0608409B1 (he)
JP (1) JP2607055B2 (he)
KR (1) KR960015541B1 (he)
CA (1) CA2121266C (he)
DE (1) DE69310493T2 (he)
IL (1) IL106681A (he)
MX (1) MX9304930A (he)
WO (1) WO1994004716A1 (he)

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DE19500262C1 (de) * 1995-01-06 1995-09-28 Metaplas Oberflaechenveredelun Verfahren zur Plasmabehandlung von Werkstücken
KR0164149B1 (ko) * 1995-03-28 1999-02-01 김주용 타이타늄 카보 나이트라이드층의 개질 방법
CH690857A5 (de) * 1995-07-04 2001-02-15 Erich Bergmann Anlage zur plasmaunterstützten physikalischen Hochvakuumbedampfung von Werkstücken mit verschleissfesten Schichten und Verfahren zur Durchführung in dieser Anlage
US5956613A (en) * 1995-12-27 1999-09-21 Lsi Logic Corporation Method for improvement of TiN CVD film quality
US5989652A (en) * 1997-01-31 1999-11-23 Tokyo Electron Limited Method of low temperature plasma enhanced chemical vapor deposition of tin film over titanium for use in via level applications
US5906866A (en) * 1997-02-10 1999-05-25 Tokyo Electron Limited Process for chemical vapor deposition of tungsten onto a titanium nitride substrate surface
US6271121B1 (en) 1997-02-10 2001-08-07 Tokyo Electron Limited Process for chemical vapor deposition of tungsten onto a titanium nitride substrate surface
GB2323855B (en) * 1997-04-01 2002-06-05 Ion Coat Ltd Method and apparatus for depositing a coating on a conductive substrate
US6872429B1 (en) * 1997-06-30 2005-03-29 Applied Materials, Inc. Deposition of tungsten nitride using plasma pretreatment in a chemical vapor deposition chamber
US6635569B1 (en) 1998-04-20 2003-10-21 Tokyo Electron Limited Method of passivating and stabilizing a Ti-PECVD process chamber and combined Ti-PECVD/TiN-CVD processing method and apparatus
US6012830A (en) * 1998-06-23 2000-01-11 Valeo Sylvania L.L.C. Light shield for a vehicle headlamp
KR100484253B1 (ko) 1998-06-27 2005-07-07 주식회사 하이닉스반도체 반도체 장치의 타이타늄막 형성방법
US6821571B2 (en) * 1999-06-18 2004-11-23 Applied Materials Inc. Plasma treatment to enhance adhesion and to minimize oxidation of carbon-containing layers
US6478933B1 (en) 1999-12-17 2002-11-12 Caterpillar Inc. Method for creating surface oil reservoirs on coated iron
DE10103896A1 (de) * 2001-01-30 2002-08-08 Mahle Gmbh Verfahren zur Vorbehandlung eines Ringträgers vor dem Alfinieren
EP1485516B1 (en) * 2002-02-27 2011-08-24 Philippine Council For Advanced Sc. And Techn. Res. And Dev. Method for formation of titanium nitride films
SE529375C2 (sv) * 2005-07-22 2007-07-24 Sandvik Intellectual Property Anordning för förbättrad plasmaaktivitet i PVD-reaktorer
ES2378888T3 (es) * 2005-08-25 2012-04-18 Showa Co., Ltd. Procedimiento para producir una película de recubrimiento de óxido de titanio cristalino a través de anodización electrolítica
US20170173745A1 (en) * 2015-12-22 2017-06-22 International Business Machines Corporation No clean flux composition and methods for use thereof
EP3366805B1 (en) * 2017-02-24 2022-01-12 Satisloh AG Box coating apparatus for vacuum coating of substrates, in particular spectacle lenses, and heating device for it
CN109797371B (zh) * 2017-11-17 2021-10-15 北京北方华创微电子装备有限公司 基座偏压调节装置、半导体加工设备及薄膜制作方法
CA3093361A1 (en) * 2018-03-08 2019-09-12 The Scripps Research Institute Methods for promoting myelination and for treating demyelinating diseases
US11304492B2 (en) * 2018-03-08 2022-04-19 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
JP2021516291A (ja) * 2018-03-09 2021-07-01 ザ ガバメント オブ ザ ユナイテッド ステイツ オブ アメリカ，アズ リプレゼンテッド バイ ザ セクレタリー オブ ザ ネイビー 高温スパッタによる化学量論的窒化チタン薄膜
CN110193600B (zh) * 2019-05-09 2021-10-08 西安交通大学 一种碳化钛增强钛包覆石墨粉末的制备方法

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DE233278C (he) *
CH631743A5 (de) * 1977-06-01 1982-08-31 Balzers Hochvakuum Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage.
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US4842710A (en) * 1987-03-23 1989-06-27 Siemens Aktiengesellschaft Method of making mixed nitride films with at least two metals
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EP0349695A1 (en) * 1988-07-08 1990-01-10 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Method of depositing metal on a silicon substrate
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US5070228A (en) * 1990-06-18 1991-12-03 General Electric Company Method for plasma spray joining active metal substrates
DE4034842A1 (de) * 1990-11-02 1992-05-07 Thyssen Edelstahlwerke Ag Verfahren zur plasmachemischen reinigung fuer eine anschliessende pvd oder pecvd beschichtung
US5346600A (en) * 1992-08-14 1994-09-13 Hughes Aircraft Company Plasma-enhanced magnetron-sputtered deposition of materials

Also Published As

Publication number Publication date
KR960015541B1 (ko) 1996-11-18
CA2121266A1 (en) 1994-03-03
CA2121266C (en) 1998-06-09
EP0608409B1 (en) 1997-05-07
MX9304930A (es) 1994-08-31
WO1994004716A1 (en) 1994-03-03
EP0608409A1 (en) 1994-08-03
DE69310493D1 (de) 1997-06-12
IL106681A0 (en) 1993-12-08
DE69310493T2 (de) 1997-12-18
JP2607055B2 (ja) 1997-05-07
JPH06507210A (ja) 1994-08-11
US5487922A (en) 1996-01-30

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