MX9304930A - Metodo de preparacion de superficie y deposicion para nitruro de titanio sobre materiales carbonaceos. - Google Patents

Metodo de preparacion de superficie y deposicion para nitruro de titanio sobre materiales carbonaceos.

Info

Publication number
MX9304930A
MX9304930A MX9304930A MX9304930A MX9304930A MX 9304930 A MX9304930 A MX 9304930A MX 9304930 A MX9304930 A MX 9304930A MX 9304930 A MX9304930 A MX 9304930A MX 9304930 A MX9304930 A MX 9304930A
Authority
MX
Mexico
Prior art keywords
titanium nitride
wear
cast iron
graphite
ion bombardment
Prior art date
Application number
MX9304930A
Other languages
English (en)
Inventor
Simon K Nieh
Jesse N Matossian
Frans G Krajenbrink
Original Assignee
Hughes Aurcraft Company
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aurcraft Company filed Critical Hughes Aurcraft Company
Publication of MX9304930A publication Critical patent/MX9304930A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Los revestimientos de nitruro de titanio resistentes al desgaste sobre hierro colado y otros materiales que contienen carbón (18) se mejoran mediante un proceso de preparación superficial y disposición, novedoso. La limpieza superficial para la predisposición convencional mediante el bombardeo de ión Ar+. Se reemplaza por un proceso de bombardeo de ión de hidrógeno que limpia la superficie del substrato (16) mediante reacción química con una pulverización mínima y simultáneamente retira el grafito presente sobre la superficie del hierro colado. El retiro del grafito mejora considerablemente la resistencia al desgaste del nitruro de titanio, ya que la presencia de grafito ocasiona la iniciación del desgaste en esos sitios. El bombardeo con iones de hidrógeno o el bombardeo electrónico puede utilizarse para calentar el substrato a una temperatura seleccionada. Finalmente, el nitruro de titanio se deposita por pulverización reactiva con bombardeo simultáneo de iones de flujo elevado Ar+ a partir de un plasma denso generado independientemente (10). El revestimiento de nitruro de titanio resultante sobre el hierro colado hace evidente las propiedades de desgaste superiores y la adhesión superior en comparación con las técnicas de deposición de evaporación reactiva convencionales de titanio.
MX9304930A 1992-08-14 1993-08-13 Metodo de preparacion de superficie y deposicion para nitruro de titanio sobre materiales carbonaceos. MX9304930A (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US92997092A 1992-08-14 1992-08-14

Publications (1)

Publication Number Publication Date
MX9304930A true MX9304930A (es) 1994-08-31

Family

ID=25458765

Family Applications (1)

Application Number Title Priority Date Filing Date
MX9304930A MX9304930A (es) 1992-08-14 1993-08-13 Metodo de preparacion de superficie y deposicion para nitruro de titanio sobre materiales carbonaceos.

Country Status (9)

Country Link
US (1) US5487922A (es)
EP (1) EP0608409B1 (es)
JP (1) JP2607055B2 (es)
KR (1) KR960015541B1 (es)
CA (1) CA2121266C (es)
DE (1) DE69310493T2 (es)
IL (1) IL106681A (es)
MX (1) MX9304930A (es)
WO (1) WO1994004716A1 (es)

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US5989652A (en) * 1997-01-31 1999-11-23 Tokyo Electron Limited Method of low temperature plasma enhanced chemical vapor deposition of tin film over titanium for use in via level applications
US5906866A (en) * 1997-02-10 1999-05-25 Tokyo Electron Limited Process for chemical vapor deposition of tungsten onto a titanium nitride substrate surface
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US6872429B1 (en) * 1997-06-30 2005-03-29 Applied Materials, Inc. Deposition of tungsten nitride using plasma pretreatment in a chemical vapor deposition chamber
US6635569B1 (en) 1998-04-20 2003-10-21 Tokyo Electron Limited Method of passivating and stabilizing a Ti-PECVD process chamber and combined Ti-PECVD/TiN-CVD processing method and apparatus
US6012830A (en) * 1998-06-23 2000-01-11 Valeo Sylvania L.L.C. Light shield for a vehicle headlamp
KR100484253B1 (ko) 1998-06-27 2005-07-07 주식회사 하이닉스반도체 반도체 장치의 타이타늄막 형성방법
US6821571B2 (en) * 1999-06-18 2004-11-23 Applied Materials Inc. Plasma treatment to enhance adhesion and to minimize oxidation of carbon-containing layers
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US7438955B2 (en) * 2002-02-27 2008-10-21 Philippine Council For Advanced Science And Technology Research And Development Titanium nitride thin film formation on metal substrate by chemical vapor deposition in a magnetized sheet plasma source
SE529375C2 (sv) * 2005-07-22 2007-07-24 Sandvik Intellectual Property Anordning för förbättrad plasmaaktivitet i PVD-reaktorer
ATE541072T1 (de) * 2005-08-25 2012-01-15 Showa Co Ltd Verfahren zur herstellung eines beschichtungsfilms aus kristallinem titanoxid durch elektrolytisches anodisieren
US20170173745A1 (en) 2015-12-22 2017-06-22 International Business Machines Corporation No clean flux composition and methods for use thereof
EP3366805B1 (en) * 2017-02-24 2022-01-12 Satisloh AG Box coating apparatus for vacuum coating of substrates, in particular spectacle lenses, and heating device for it
CN109797371B (zh) * 2017-11-17 2021-10-15 北京北方华创微电子装备有限公司 基座偏压调节装置、半导体加工设备及薄膜制作方法
AU2018411573A1 (en) * 2018-03-08 2020-10-01 The Scripps Research Institute Methods for promoting myelination and for treating demyelinating diseases
US11304492B2 (en) * 2018-03-08 2022-04-19 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
US11072848B2 (en) 2018-03-09 2021-07-27 The Government Of The United States Of America, As Represented By The Secretary Of The Navy High temperature sputtered stoichiometric titanium nitride thin films
CN110193600B (zh) * 2019-05-09 2021-10-08 西安交通大学 一种碳化钛增强钛包覆石墨粉末的制备方法

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Also Published As

Publication number Publication date
CA2121266A1 (en) 1994-03-03
JPH06507210A (ja) 1994-08-11
DE69310493T2 (de) 1997-12-18
JP2607055B2 (ja) 1997-05-07
IL106681A (en) 1996-06-18
IL106681A0 (en) 1993-12-08
KR960015541B1 (ko) 1996-11-18
DE69310493D1 (de) 1997-06-12
US5487922A (en) 1996-01-30
EP0608409A1 (en) 1994-08-03
CA2121266C (en) 1998-06-09
EP0608409B1 (en) 1997-05-07
WO1994004716A1 (en) 1994-03-03

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