HK34685A - Photopolymerizable composition - Google Patents
Photopolymerizable compositionInfo
- Publication number
- HK34685A HK34685A HK346/85A HK34685A HK34685A HK 34685 A HK34685 A HK 34685A HK 346/85 A HK346/85 A HK 346/85A HK 34685 A HK34685 A HK 34685A HK 34685 A HK34685 A HK 34685A
- Authority
- HK
- Hong Kong
- Prior art keywords
- photopolymerizable composition
- photopolymerizable
- composition
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
- C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
- C08G18/10—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/671—Unsaturated compounds having only one group containing active hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/81—Unsaturated isocyanates or isothiocyanates
- C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
- C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
- C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
- C08G18/8175—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with esters of acrylic or alkylacrylic acid having only one group containing active hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/83—Chemically modified polymers
- C08G18/831—Chemically modified polymers by oxygen-containing compounds inclusive of carbonic acid halogenides, carboxylic acid halogenides and epoxy halides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polyurethanes Or Polyureas (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US90148078A | 1978-05-01 | 1978-05-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK34685A true HK34685A (en) | 1985-05-10 |
Family
ID=25414263
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK346/85A HK34685A (en) | 1978-05-01 | 1985-05-02 | Photopolymerizable composition |
Country Status (11)
Country | Link |
---|---|
JP (1) | JPS54144497A (ja) |
AU (1) | AU524592B2 (ja) |
BR (1) | BR7902646A (ja) |
CA (1) | CA1122999A (ja) |
DE (1) | DE2917483A1 (ja) |
FR (1) | FR2425094B1 (ja) |
GB (2) | GB2020297B (ja) |
HK (1) | HK34685A (ja) |
IT (1) | IT1116471B (ja) |
SE (1) | SE444991B (ja) |
SG (1) | SG17385G (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2933871A1 (de) * | 1979-08-21 | 1981-03-12 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung. |
US4337303A (en) * | 1980-08-11 | 1982-06-29 | Minnesota Mining And Manufacturing Company | Transfer, encapsulating, and fixing of toner images |
CA1167408A (en) * | 1980-09-22 | 1984-05-15 | Hao-Jan Chang | Electron beam curing of magnetic media |
US4422914A (en) * | 1981-01-16 | 1983-12-27 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
ZA8244B (en) * | 1981-01-16 | 1982-11-24 | Grace W R & Co | Method and apparatus for making printed circuit boards |
US4506055A (en) * | 1983-06-23 | 1985-03-19 | Ici Americas Inc. | Carboxy modified vinyl ester urethane resins |
DE3567294D1 (en) * | 1984-12-06 | 1989-02-09 | Hoechst Celanese Corp | Light-sensitive composition |
DE3619129A1 (de) * | 1986-06-06 | 1987-12-10 | Basf Ag | Lichtempfindliches aufzeichnungselement |
DE4138309C2 (de) * | 1991-11-21 | 1995-02-09 | Eos Electro Optical Syst | Durch Einwirkung elektromagnetischer Strahlung vernetzbares Kunststoffmaterial |
US5998496A (en) * | 1995-10-31 | 1999-12-07 | Spectra Group Limited, Inc. | Photosensitive intramolecular electron transfer compounds |
JP3907144B2 (ja) * | 1998-04-09 | 2007-04-18 | 富士フイルム株式会社 | 平版印刷版の製造方法、レーザ走査露光用平版印刷版原版、および光重合性組成物 |
US6258918B1 (en) | 1998-04-22 | 2001-07-10 | 3M Innovative Properties Company | Flexible polyurethane material |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL287134A (ja) * | 1959-08-05 | |||
US3297745A (en) * | 1962-04-05 | 1967-01-10 | Robertson Co H H | Ethylenically unsaturated di-and tetra-urethane monomers |
JPS5034966B2 (ja) * | 1972-07-24 | 1975-11-12 | ||
US3827956A (en) * | 1973-01-12 | 1974-08-06 | Scm Corp | Photopolymerizable pigmented vehicles containing chlorosulfonated or alpha-haloalkylated benzanthrone initiators |
US4017649A (en) * | 1973-02-05 | 1977-04-12 | Ppg Industries, Inc. | Radiation-sensitive compounds and methods of using same |
DE2443665A1 (de) * | 1974-09-12 | 1976-03-25 | Basf Ag | Photovernetzbare formmasse fuer die herstellung von waessrig-alkalisch entwickelbaren druckformen |
DE2443786C2 (de) * | 1974-09-13 | 1984-01-19 | Basf Ag, 6700 Ludwigshafen | Flüssige, photovernetzbare Formmasse zur Herstellung von Reliefdruckplatten |
US4057431A (en) * | 1975-09-29 | 1977-11-08 | The Goodyear Tire & Rubber Company | Ethylenically polyurethane unsaturated composition |
JPS5290304A (en) * | 1976-01-24 | 1977-07-29 | Asahi Chemical Ind | Photoosensitive resin composition for making flexo graphic printing plate |
JPS52155694A (en) * | 1976-06-22 | 1977-12-24 | Toyobo Co Ltd | Urethane-modified acrylate resin |
GB1590412A (en) * | 1976-08-02 | 1981-06-03 | Lord Corp | Radiation curable compositions |
US4065627A (en) * | 1976-09-27 | 1977-12-27 | General Mills Chemicals, Inc. | High molecular weight radiation curable resins |
-
1979
- 1979-04-27 SE SE7903709A patent/SE444991B/sv not_active IP Right Cessation
- 1979-04-27 FR FR7910908A patent/FR2425094B1/fr not_active Expired
- 1979-04-27 CA CA326,501A patent/CA1122999A/en not_active Expired
- 1979-04-30 BR BR7902646A patent/BR7902646A/pt unknown
- 1979-04-30 AU AU46503/79A patent/AU524592B2/en not_active Expired
- 1979-04-30 GB GB7914903A patent/GB2020297B/en not_active Expired
- 1979-04-30 DE DE19792917483 patent/DE2917483A1/de active Granted
- 1979-04-30 IT IT48892/79A patent/IT1116471B/it active
- 1979-05-01 JP JP5399379A patent/JPS54144497A/ja active Pending
-
1982
- 1982-07-22 GB GB08221270A patent/GB2104086B/en not_active Expired
-
1985
- 1985-03-13 SG SG173/85A patent/SG17385G/en unknown
- 1985-05-02 HK HK346/85A patent/HK34685A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
GB2104086B (en) | 1983-07-06 |
SE7903709L (sv) | 1979-11-02 |
FR2425094A1 (fr) | 1979-11-30 |
GB2104086A (en) | 1983-03-02 |
GB2020297B (en) | 1983-04-27 |
SE444991B (sv) | 1986-05-20 |
GB2020297A (en) | 1979-11-14 |
AU524592B2 (en) | 1982-09-23 |
BR7902646A (pt) | 1979-11-27 |
FR2425094B1 (fr) | 1985-07-19 |
DE2917483C2 (ja) | 1991-01-24 |
IT1116471B (it) | 1986-02-10 |
JPS54144497A (en) | 1979-11-10 |
IT7948892A0 (it) | 1979-04-30 |
AU4650379A (en) | 1979-11-08 |
SG17385G (en) | 1986-11-21 |
DE2917483A1 (de) | 1979-11-15 |
CA1122999A (en) | 1982-05-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS54155292A (en) | Photoopolymerizable composition | |
JPS5571734A (en) | Composition | |
JPS5523187A (en) | Photoohardening composition | |
JPS54158452A (en) | Composition | |
JPS54116096A (en) | Polymerizable composition | |
JPS5580451A (en) | Composition | |
JPS54139654A (en) | Composition | |
JPS5523186A (en) | Photoohardening composition | |
JPS54123186A (en) | Photopolymerizable mixture | |
GB2031442B (en) | Positive acting photoresist composition | |
SG17385G (en) | Photopolymerizable composition | |
JPS54152038A (en) | Flameeproof*lowwsmoke hottmelt composition | |
JPS54107993A (en) | Alphaacyanoacrylate composition | |
JPS54147931A (en) | Antiiulcer composition | |
JPS54125024A (en) | Photosensitive composition | |
JPS54116218A (en) | Photosensitive composition | |
KE3426A (en) | Etomidate-containing compositions | |
DE2964020D1 (en) | Photosensitive composition | |
GR64830B (en) | Disinfectaut composition | |
PT69935A (en) | Insecticidals compositions | |
JPS54147934A (en) | Antiiangina composition | |
PT69225A (en) | Compositions | |
ZA793302B (en) | Fasciolicidal compositions | |
PT70100A (en) | Farmaceutical compositions | |
GB2026532B (en) | Dtergent composition |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PE | Patent expired |