AU524592B2 - Photopolymerizable composition - Google Patents

Photopolymerizable composition

Info

Publication number
AU524592B2
AU524592B2 AU46503/79A AU4650379A AU524592B2 AU 524592 B2 AU524592 B2 AU 524592B2 AU 46503/79 A AU46503/79 A AU 46503/79A AU 4650379 A AU4650379 A AU 4650379A AU 524592 B2 AU524592 B2 AU 524592B2
Authority
AU
Australia
Prior art keywords
photopolymerizable composition
photopolymerizable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU46503/79A
Other versions
AU4650379A (en
Inventor
Alan David Rousseau
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of AU4650379A publication Critical patent/AU4650379A/en
Application granted granted Critical
Publication of AU524592B2 publication Critical patent/AU524592B2/en
Anticipated expiration legal-status Critical
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/08—Processes
    • C08G18/10—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
    • C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
    • C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
    • C08G18/8175—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with esters of acrylic or alkylacrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/83—Chemically modified polymers
    • C08G18/831—Chemically modified polymers by oxygen-containing compounds inclusive of carbonic acid halogenides, carboxylic acid halogenides and epoxy halides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
AU46503/79A 1978-05-01 1979-04-30 Photopolymerizable composition Expired AU524592B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US90148078A 1978-05-01 1978-05-01
US901480 1978-05-01

Publications (2)

Publication Number Publication Date
AU4650379A AU4650379A (en) 1979-11-08
AU524592B2 true AU524592B2 (en) 1982-09-23

Family

ID=25414263

Family Applications (1)

Application Number Title Priority Date Filing Date
AU46503/79A Expired AU524592B2 (en) 1978-05-01 1979-04-30 Photopolymerizable composition

Country Status (11)

Country Link
JP (1) JPS54144497A (en)
AU (1) AU524592B2 (en)
BR (1) BR7902646A (en)
CA (1) CA1122999A (en)
DE (1) DE2917483A1 (en)
FR (1) FR2425094B1 (en)
GB (2) GB2020297B (en)
HK (1) HK34685A (en)
IT (1) IT1116471B (en)
SE (1) SE444991B (en)
SG (1) SG17385G (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2933871A1 (en) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München METHOD FOR PRODUCING HIGH-TEMPERATURE-RESISTANT RELIEF STRUCTURES AND THE USE THEREOF.
US4337303A (en) * 1980-08-11 1982-06-29 Minnesota Mining And Manufacturing Company Transfer, encapsulating, and fixing of toner images
CA1167408A (en) * 1980-09-22 1984-05-15 Hao-Jan Chang Electron beam curing of magnetic media
US4422914A (en) * 1981-01-16 1983-12-27 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
ZA8244B (en) * 1981-01-16 1982-11-24 Grace W R & Co Method and apparatus for making printed circuit boards
US4506055A (en) * 1983-06-23 1985-03-19 Ici Americas Inc. Carboxy modified vinyl ester urethane resins
DE3567294D1 (en) * 1984-12-06 1989-02-09 Hoechst Celanese Corp Light-sensitive composition
DE3619129A1 (en) * 1986-06-06 1987-12-10 Basf Ag LIGHT SENSITIVE RECORDING ELEMENT
DE4138309C2 (en) * 1991-11-21 1995-02-09 Eos Electro Optical Syst By the action of electromagnetic radiation crosslinkable plastic material
US5998496A (en) * 1995-10-31 1999-12-07 Spectra Group Limited, Inc. Photosensitive intramolecular electron transfer compounds
JP3907144B2 (en) * 1998-04-09 2007-04-18 富士フイルム株式会社 Method for producing lithographic printing plate, lithographic printing plate precursor for laser scanning exposure, and photopolymerizable composition
US6258918B1 (en) 1998-04-22 2001-07-10 3M Innovative Properties Company Flexible polyurethane material

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE626525A (en) * 1959-08-05
US3297745A (en) * 1962-04-05 1967-01-10 Robertson Co H H Ethylenically unsaturated di-and tetra-urethane monomers
JPS5034966B2 (en) * 1972-07-24 1975-11-12
US3827956A (en) * 1973-01-12 1974-08-06 Scm Corp Photopolymerizable pigmented vehicles containing chlorosulfonated or alpha-haloalkylated benzanthrone initiators
US4017649A (en) * 1973-02-05 1977-04-12 Ppg Industries, Inc. Radiation-sensitive compounds and methods of using same
DE2443665A1 (en) * 1974-09-12 1976-03-25 Basf Ag PHOTO-NETWORKABLE MOLDING COMPOUNDS FOR THE MANUFACTURE OF AQUATIC-ALKALINE DEVELOPMENT FORMS
DE2443786C2 (en) * 1974-09-13 1984-01-19 Basf Ag, 6700 Ludwigshafen Liquid, photo-crosslinkable molding compound for the production of relief printing plates
US4057431A (en) * 1975-09-29 1977-11-08 The Goodyear Tire & Rubber Company Ethylenically polyurethane unsaturated composition
JPS5290304A (en) * 1976-01-24 1977-07-29 Asahi Chemical Ind Photoosensitive resin composition for making flexo graphic printing plate
JPS52155694A (en) * 1976-06-22 1977-12-24 Toyobo Co Ltd Urethane-modified acrylate resin
GB1590412A (en) * 1976-08-02 1981-06-03 Lord Corp Radiation curable compositions
US4065627A (en) * 1976-09-27 1977-12-27 General Mills Chemicals, Inc. High molecular weight radiation curable resins

Also Published As

Publication number Publication date
FR2425094B1 (en) 1985-07-19
JPS54144497A (en) 1979-11-10
HK34685A (en) 1985-05-10
GB2104086A (en) 1983-03-02
DE2917483A1 (en) 1979-11-15
IT1116471B (en) 1986-02-10
BR7902646A (en) 1979-11-27
GB2020297A (en) 1979-11-14
SE7903709L (en) 1979-11-02
FR2425094A1 (en) 1979-11-30
SG17385G (en) 1986-11-21
IT7948892A0 (en) 1979-04-30
AU4650379A (en) 1979-11-08
CA1122999A (en) 1982-05-04
GB2104086B (en) 1983-07-06
DE2917483C2 (en) 1991-01-24
SE444991B (en) 1986-05-20
GB2020297B (en) 1983-04-27

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