SE7903709L - PHOTOPOLYMERIZABLE COMPOSITION - Google Patents
PHOTOPOLYMERIZABLE COMPOSITIONInfo
- Publication number
- SE7903709L SE7903709L SE7903709A SE7903709A SE7903709L SE 7903709 L SE7903709 L SE 7903709L SE 7903709 A SE7903709 A SE 7903709A SE 7903709 A SE7903709 A SE 7903709A SE 7903709 L SE7903709 L SE 7903709L
- Authority
- SE
- Sweden
- Prior art keywords
- weight
- polyol
- residue
- image
- ethylenically unsaturated
- Prior art date
Links
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 2
- 229920005862 polyol Polymers 0.000 abstract 2
- 150000003077 polyols Chemical class 0.000 abstract 2
- 150000003254 radicals Chemical class 0.000 abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 229920001228 polyisocyanate Polymers 0.000 abstract 1
- 239000005056 polyisocyanate Substances 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
- C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
- C08G18/10—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/671—Unsaturated compounds having only one group containing active hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/81—Unsaturated isocyanates or isothiocyanates
- C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
- C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
- C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
- C08G18/8175—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with esters of acrylic or alkylacrylic acid having only one group containing active hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/83—Chemically modified polymers
- C08G18/831—Chemically modified polymers by oxygen-containing compounds inclusive of carbonic acid halogenides, carboxylic acid halogenides and epoxy halides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polyurethanes Or Polyureas (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
Abstract
A photopolymerizable composition useful on printing plates comprises (1) 10% to 60% by weight of an organic film forming polymer, (2) 10% to 60% by weight of a free radical polymerizable monomer having at least one ethylenically unsaturated group, (3) 0.1% to 12% by weight of a photoinitiator system, and (4) 10% to 60% by weight of an oligomer of the formula <IMAGE> wherein E is an ethylenically unsaturated, free radical polymerizable group, D is the residue of a polyisocyanate having at least two of its isocyanate groups reacted to form <IMAGE> groups bonded to E and R, R is the residue of a polyol having at least a + b hydroxyl groups, formed by removal of hydrogen from the hydroxyl groups, said polyol having a number average molecular weight between 90 and 10,000, A is a carboxylic acid containing group, a is 2 to 20, and b is 0.3 to 10. The invention also relates to a polymerizable oligomer of the formula given in (4) above.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US90148078A | 1978-05-01 | 1978-05-01 |
Publications (2)
Publication Number | Publication Date |
---|---|
SE7903709L true SE7903709L (en) | 1979-11-02 |
SE444991B SE444991B (en) | 1986-05-20 |
Family
ID=25414263
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE7903709A SE444991B (en) | 1978-05-01 | 1979-04-27 | PHOTOPOLYMERIZABLE COMPOSITION AND SUBSTRATE COATED WITH THE COMPOSITION |
Country Status (11)
Country | Link |
---|---|
JP (1) | JPS54144497A (en) |
AU (1) | AU524592B2 (en) |
BR (1) | BR7902646A (en) |
CA (1) | CA1122999A (en) |
DE (1) | DE2917483A1 (en) |
FR (1) | FR2425094B1 (en) |
GB (2) | GB2020297B (en) |
HK (1) | HK34685A (en) |
IT (1) | IT1116471B (en) |
SE (1) | SE444991B (en) |
SG (1) | SG17385G (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2933871A1 (en) * | 1979-08-21 | 1981-03-12 | Siemens AG, 1000 Berlin und 8000 München | METHOD FOR PRODUCING HIGH-TEMPERATURE-RESISTANT RELIEF STRUCTURES AND THE USE THEREOF. |
US4337303A (en) * | 1980-08-11 | 1982-06-29 | Minnesota Mining And Manufacturing Company | Transfer, encapsulating, and fixing of toner images |
CA1167408A (en) * | 1980-09-22 | 1984-05-15 | Hao-Jan Chang | Electron beam curing of magnetic media |
US4422914A (en) * | 1981-01-16 | 1983-12-27 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
ZA8244B (en) * | 1981-01-16 | 1982-11-24 | Grace W R & Co | Method and apparatus for making printed circuit boards |
US4506055A (en) * | 1983-06-23 | 1985-03-19 | Ici Americas Inc. | Carboxy modified vinyl ester urethane resins |
DE3567294D1 (en) * | 1984-12-06 | 1989-02-09 | Hoechst Celanese Corp | Light-sensitive composition |
DE3619129A1 (en) * | 1986-06-06 | 1987-12-10 | Basf Ag | LIGHT SENSITIVE RECORDING ELEMENT |
DE4138309C2 (en) * | 1991-11-21 | 1995-02-09 | Eos Electro Optical Syst | By the action of electromagnetic radiation crosslinkable plastic material |
US5998496A (en) * | 1995-10-31 | 1999-12-07 | Spectra Group Limited, Inc. | Photosensitive intramolecular electron transfer compounds |
JP3907144B2 (en) * | 1998-04-09 | 2007-04-18 | 富士フイルム株式会社 | Method for producing lithographic printing plate, lithographic printing plate precursor for laser scanning exposure, and photopolymerizable composition |
US6258918B1 (en) | 1998-04-22 | 2001-07-10 | 3M Innovative Properties Company | Flexible polyurethane material |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL287134A (en) * | 1959-08-05 | |||
US3297745A (en) * | 1962-04-05 | 1967-01-10 | Robertson Co H H | Ethylenically unsaturated di-and tetra-urethane monomers |
JPS5034966B2 (en) * | 1972-07-24 | 1975-11-12 | ||
US3827956A (en) * | 1973-01-12 | 1974-08-06 | Scm Corp | Photopolymerizable pigmented vehicles containing chlorosulfonated or alpha-haloalkylated benzanthrone initiators |
US4017649A (en) * | 1973-02-05 | 1977-04-12 | Ppg Industries, Inc. | Radiation-sensitive compounds and methods of using same |
DE2443665A1 (en) * | 1974-09-12 | 1976-03-25 | Basf Ag | PHOTO-NETWORKABLE MOLDING COMPOUNDS FOR THE MANUFACTURE OF AQUATIC-ALKALINE DEVELOPMENT FORMS |
DE2443786C2 (en) * | 1974-09-13 | 1984-01-19 | Basf Ag, 6700 Ludwigshafen | Liquid, photo-crosslinkable molding compound for the production of relief printing plates |
US4057431A (en) * | 1975-09-29 | 1977-11-08 | The Goodyear Tire & Rubber Company | Ethylenically polyurethane unsaturated composition |
JPS5290304A (en) * | 1976-01-24 | 1977-07-29 | Asahi Chemical Ind | Photoosensitive resin composition for making flexo graphic printing plate |
JPS52155694A (en) * | 1976-06-22 | 1977-12-24 | Toyobo Co Ltd | Urethane-modified acrylate resin |
GB1590412A (en) * | 1976-08-02 | 1981-06-03 | Lord Corp | Radiation curable compositions |
US4065627A (en) * | 1976-09-27 | 1977-12-27 | General Mills Chemicals, Inc. | High molecular weight radiation curable resins |
-
1979
- 1979-04-27 SE SE7903709A patent/SE444991B/en not_active IP Right Cessation
- 1979-04-27 FR FR7910908A patent/FR2425094B1/en not_active Expired
- 1979-04-27 CA CA326,501A patent/CA1122999A/en not_active Expired
- 1979-04-30 BR BR7902646A patent/BR7902646A/en unknown
- 1979-04-30 AU AU46503/79A patent/AU524592B2/en not_active Expired
- 1979-04-30 GB GB7914903A patent/GB2020297B/en not_active Expired
- 1979-04-30 DE DE19792917483 patent/DE2917483A1/en active Granted
- 1979-04-30 IT IT48892/79A patent/IT1116471B/en active
- 1979-05-01 JP JP5399379A patent/JPS54144497A/en active Pending
-
1982
- 1982-07-22 GB GB08221270A patent/GB2104086B/en not_active Expired
-
1985
- 1985-03-13 SG SG173/85A patent/SG17385G/en unknown
- 1985-05-02 HK HK346/85A patent/HK34685A/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
GB2104086B (en) | 1983-07-06 |
FR2425094A1 (en) | 1979-11-30 |
GB2104086A (en) | 1983-03-02 |
GB2020297B (en) | 1983-04-27 |
SE444991B (en) | 1986-05-20 |
GB2020297A (en) | 1979-11-14 |
HK34685A (en) | 1985-05-10 |
AU524592B2 (en) | 1982-09-23 |
BR7902646A (en) | 1979-11-27 |
FR2425094B1 (en) | 1985-07-19 |
DE2917483C2 (en) | 1991-01-24 |
IT1116471B (en) | 1986-02-10 |
JPS54144497A (en) | 1979-11-10 |
IT7948892A0 (en) | 1979-04-30 |
AU4650379A (en) | 1979-11-08 |
SG17385G (en) | 1986-11-21 |
DE2917483A1 (en) | 1979-11-15 |
CA1122999A (en) | 1982-05-04 |
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