GB2020297A - Photopolymerization composition - Google Patents

Photopolymerization composition

Info

Publication number
GB2020297A
GB2020297A GB7914903A GB7914903A GB2020297A GB 2020297 A GB2020297 A GB 2020297A GB 7914903 A GB7914903 A GB 7914903A GB 7914903 A GB7914903 A GB 7914903A GB 2020297 A GB2020297 A GB 2020297A
Authority
GB
United Kingdom
Prior art keywords
weight
polyol
residue
image
ethylenically unsaturated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB7914903A
Other versions
GB2020297B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of GB2020297A publication Critical patent/GB2020297A/en
Application granted granted Critical
Publication of GB2020297B publication Critical patent/GB2020297B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/08—Processes
    • C08G18/10—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
    • C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
    • C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
    • C08G18/8175—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with esters of acrylic or alkylacrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/83—Chemically modified polymers
    • C08G18/831—Chemically modified polymers by oxygen-containing compounds inclusive of carbonic acid halogenides, carboxylic acid halogenides and epoxy halides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)

Abstract

A photopolymerizable composition useful on printing plates comprises (1) 10% to 60% by weight of an organic film forming polymer, (2) 10% to 60% by weight of a free radical polymerizable monomer having at least one ethylenically unsaturated group, (3) 0.1% to 12% by weight of a photoinitiator system, and (4) 10% to 60% by weight of an oligomer of the formula <IMAGE> wherein E is an ethylenically unsaturated, free radical polymerizable group, D is the residue of a polyisocyanate having at least two of its isocyanate groups reacted to form <IMAGE> groups bonded to E and R, R is the residue of a polyol having at least a + b hydroxyl groups, formed by removal of hydrogen from the hydroxyl groups, said polyol having a number average molecular weight between 90 and 10,000, A is a carboxylic acid containing group, a is 2 to 20, and b is 0.3 to 10. The invention also relates to a polymerizable oligomer of the formula given in (4) above.
GB7914903A 1978-05-01 1979-04-30 Photopolymerization composition Expired GB2020297B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US90148078A 1978-05-01 1978-05-01

Publications (2)

Publication Number Publication Date
GB2020297A true GB2020297A (en) 1979-11-14
GB2020297B GB2020297B (en) 1983-04-27

Family

ID=25414263

Family Applications (2)

Application Number Title Priority Date Filing Date
GB7914903A Expired GB2020297B (en) 1978-05-01 1979-04-30 Photopolymerization composition
GB08221270A Expired GB2104086B (en) 1978-05-01 1982-07-22 Polymerizable unsaturated polyurethanes

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB08221270A Expired GB2104086B (en) 1978-05-01 1982-07-22 Polymerizable unsaturated polyurethanes

Country Status (11)

Country Link
JP (1) JPS54144497A (en)
AU (1) AU524592B2 (en)
BR (1) BR7902646A (en)
CA (1) CA1122999A (en)
DE (1) DE2917483A1 (en)
FR (1) FR2425094B1 (en)
GB (2) GB2020297B (en)
HK (1) HK34685A (en)
IT (1) IT1116471B (en)
SE (1) SE444991B (en)
SG (1) SG17385G (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4337303A (en) * 1980-08-11 1982-06-29 Minnesota Mining And Manufacturing Company Transfer, encapsulating, and fixing of toner images
FR2499998A1 (en) * 1981-01-16 1982-08-20 Grace W R Ltd POLYMERIC COMPOSITION HAVING TERMINAL ALKENE AND CARBOXYL GROUPS, PROCESS FOR PREPARATION AND PRODUCTION OF "PHOTORESIST"
EP0132295A1 (en) * 1983-06-23 1985-01-30 Dsm Resins B.V. Carboxy modified vinyl ester urethane resins, their application and use
EP0949540A1 (en) * 1998-04-09 1999-10-13 Fuji Photo Film Co., Ltd Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition
US5998496A (en) * 1995-10-31 1999-12-07 Spectra Group Limited, Inc. Photosensitive intramolecular electron transfer compounds

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2933871A1 (en) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München METHOD FOR PRODUCING HIGH-TEMPERATURE-RESISTANT RELIEF STRUCTURES AND THE USE THEREOF.
CA1167408A (en) * 1980-09-22 1984-05-15 Hao-Jan Chang Electron beam curing of magnetic media
ZA8244B (en) * 1981-01-16 1982-11-24 Grace W R & Co Method and apparatus for making printed circuit boards
EP0184725B1 (en) * 1984-12-06 1989-01-04 Hoechst Celanese Corporation Light-sensitive composition
DE3619129A1 (en) * 1986-06-06 1987-12-10 Basf Ag LIGHT SENSITIVE RECORDING ELEMENT
DE4138309C2 (en) * 1991-11-21 1995-02-09 Eos Electro Optical Syst By the action of electromagnetic radiation crosslinkable plastic material
US6258918B1 (en) 1998-04-22 2001-07-10 3M Innovative Properties Company Flexible polyurethane material

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL287134A (en) * 1959-08-05
US3297745A (en) * 1962-04-05 1967-01-10 Robertson Co H H Ethylenically unsaturated di-and tetra-urethane monomers
JPS5034966B2 (en) * 1972-07-24 1975-11-12
US3827956A (en) * 1973-01-12 1974-08-06 Scm Corp Photopolymerizable pigmented vehicles containing chlorosulfonated or alpha-haloalkylated benzanthrone initiators
US4017649A (en) * 1973-02-05 1977-04-12 Ppg Industries, Inc. Radiation-sensitive compounds and methods of using same
DE2443665A1 (en) * 1974-09-12 1976-03-25 Basf Ag PHOTO-NETWORKABLE MOLDING COMPOUNDS FOR THE MANUFACTURE OF AQUATIC-ALKALINE DEVELOPMENT FORMS
DE2443786C2 (en) * 1974-09-13 1984-01-19 Basf Ag, 6700 Ludwigshafen Liquid, photo-crosslinkable molding compound for the production of relief printing plates
US4057431A (en) * 1975-09-29 1977-11-08 The Goodyear Tire & Rubber Company Ethylenically polyurethane unsaturated composition
JPS5290304A (en) * 1976-01-24 1977-07-29 Asahi Chemical Ind Photoosensitive resin composition for making flexo graphic printing plate
JPS52155694A (en) * 1976-06-22 1977-12-24 Toyobo Co Ltd Urethane-modified acrylate resin
GB1590412A (en) * 1976-08-02 1981-06-03 Lord Corp Radiation curable compositions
US4065627A (en) * 1976-09-27 1977-12-27 General Mills Chemicals, Inc. High molecular weight radiation curable resins

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4337303A (en) * 1980-08-11 1982-06-29 Minnesota Mining And Manufacturing Company Transfer, encapsulating, and fixing of toner images
FR2499998A1 (en) * 1981-01-16 1982-08-20 Grace W R Ltd POLYMERIC COMPOSITION HAVING TERMINAL ALKENE AND CARBOXYL GROUPS, PROCESS FOR PREPARATION AND PRODUCTION OF "PHOTORESIST"
EP0132295A1 (en) * 1983-06-23 1985-01-30 Dsm Resins B.V. Carboxy modified vinyl ester urethane resins, their application and use
US5998496A (en) * 1995-10-31 1999-12-07 Spectra Group Limited, Inc. Photosensitive intramolecular electron transfer compounds
EP0949540A1 (en) * 1998-04-09 1999-10-13 Fuji Photo Film Co., Ltd Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition
US6727044B1 (en) 1998-04-09 2004-04-27 Fuji Photo Film Co., Ltd. Method for producing lithographic printing plate, lithographic printing original plate for laser scan exposure, and photopolymerizable composition

Also Published As

Publication number Publication date
DE2917483A1 (en) 1979-11-15
SE444991B (en) 1986-05-20
BR7902646A (en) 1979-11-27
AU524592B2 (en) 1982-09-23
SE7903709L (en) 1979-11-02
FR2425094B1 (en) 1985-07-19
FR2425094A1 (en) 1979-11-30
GB2020297B (en) 1983-04-27
SG17385G (en) 1986-11-21
JPS54144497A (en) 1979-11-10
IT1116471B (en) 1986-02-10
GB2104086B (en) 1983-07-06
CA1122999A (en) 1982-05-04
DE2917483C2 (en) 1991-01-24
GB2104086A (en) 1983-03-02
HK34685A (en) 1985-05-10
AU4650379A (en) 1979-11-08
IT7948892A0 (en) 1979-04-30

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Legal Events

Date Code Title Description
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
PE20 Patent expired after termination of 20 years

Effective date: 19990429