FR2425094A1 - Compositions photopolymerisables - Google Patents

Compositions photopolymerisables

Info

Publication number
FR2425094A1
FR2425094A1 FR7910908A FR7910908A FR2425094A1 FR 2425094 A1 FR2425094 A1 FR 2425094A1 FR 7910908 A FR7910908 A FR 7910908A FR 7910908 A FR7910908 A FR 7910908A FR 2425094 A1 FR2425094 A1 FR 2425094A1
Authority
FR
France
Prior art keywords
photopolymerisable compositions
free radicals
ethylenic
polymerisable
developable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7910908A
Other languages
English (en)
Other versions
FR2425094B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of FR2425094A1 publication Critical patent/FR2425094A1/fr
Application granted granted Critical
Publication of FR2425094B1 publication Critical patent/FR2425094B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/08—Processes
    • C08G18/10—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
    • C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
    • C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
    • C08G18/8175—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with esters of acrylic or alkylacrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/83—Chemically modified polymers
    • C08G18/831—Chemically modified polymers by oxygen-containing compounds inclusive of carbonic acid halogenides, carboxylic acid halogenides and epoxy halides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)

Abstract

L'INVENTION CONCERNE L'INDUSTRIE DES REVETEMENTS PHOTOREACTIFS. COMPOSITIONS PHOTOPOLYMERISABLES COMPRENANT UN LIANT FILMOGENE, UN MONOMERE ETHYLENIQUE, POLYMERISABLE PAR RADICAUX LIBRES; UN SYSTEME PHOTOINITIATEUR, ET UN OLIGOMERE ETHYLENIQUE, POLYMERISABLE PAR RADICAUX LIBRES, A SUBSTITUANTS CARBOXYLIQUES. APPLICATION AUX PLAQUES D'IMPRESSION, CONSTITUEES D'ALUMINIUM GRAINE ET ANODISE, DEVELOPPABLES EN MILIEU BASIQUE.
FR7910908A 1978-05-01 1979-04-27 Compositions photopolymerisables Expired FR2425094B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US90148078A 1978-05-01 1978-05-01

Publications (2)

Publication Number Publication Date
FR2425094A1 true FR2425094A1 (fr) 1979-11-30
FR2425094B1 FR2425094B1 (fr) 1985-07-19

Family

ID=25414263

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7910908A Expired FR2425094B1 (fr) 1978-05-01 1979-04-27 Compositions photopolymerisables

Country Status (11)

Country Link
JP (1) JPS54144497A (fr)
AU (1) AU524592B2 (fr)
BR (1) BR7902646A (fr)
CA (1) CA1122999A (fr)
DE (1) DE2917483A1 (fr)
FR (1) FR2425094B1 (fr)
GB (2) GB2020297B (fr)
HK (1) HK34685A (fr)
IT (1) IT1116471B (fr)
SE (1) SE444991B (fr)
SG (1) SG17385G (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0026299A1 (fr) * 1979-08-21 1981-04-08 Siemens Aktiengesellschaft Procédé de fabrication de structures en relief stables à haute température, structures en relief ainsi fabriquées et leur utilisation
FR2491246A1 (fr) * 1980-09-22 1982-04-02 Ampex Milieu magnetique muri par irradiation et son procede de production

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4337303A (en) * 1980-08-11 1982-06-29 Minnesota Mining And Manufacturing Company Transfer, encapsulating, and fixing of toner images
ZA8244B (en) * 1981-01-16 1982-11-24 Grace W R & Co Method and apparatus for making printed circuit boards
US4422914A (en) * 1981-01-16 1983-12-27 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4506055A (en) * 1983-06-23 1985-03-19 Ici Americas Inc. Carboxy modified vinyl ester urethane resins
EP0184725B1 (fr) * 1984-12-06 1989-01-04 Hoechst Celanese Corporation Composition photosensible
DE3619129A1 (de) * 1986-06-06 1987-12-10 Basf Ag Lichtempfindliches aufzeichnungselement
DE4138309C2 (de) * 1991-11-21 1995-02-09 Eos Electro Optical Syst Durch Einwirkung elektromagnetischer Strahlung vernetzbares Kunststoffmaterial
US5998496A (en) * 1995-10-31 1999-12-07 Spectra Group Limited, Inc. Photosensitive intramolecular electron transfer compounds
JP3907144B2 (ja) * 1998-04-09 2007-04-18 富士フイルム株式会社 平版印刷版の製造方法、レーザ走査露光用平版印刷版原版、および光重合性組成物
US6258918B1 (en) 1998-04-22 2001-07-10 3M Innovative Properties Company Flexible polyurethane material

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2284621A1 (fr) * 1974-09-12 1976-04-09 Basf Ag Matieres a mouler photoreticulables pour la preparation de cliches d'impression developpables a l'aide de solutions aqueuses alcalines
FR2284622A1 (fr) * 1974-09-13 1976-04-09 Basf Ag Matiere a mouler liquide photoreticulable pour la confection de plaques d'impression en relief
DE2702708A1 (de) * 1976-01-24 1977-08-04 Asahi Chemical Ind Photopolymerisierbare massen
FR2360620A1 (fr) * 1976-08-02 1978-03-03 Lord Corp Composition de revetement durcissable par irradiation

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL287134A (fr) * 1959-08-05
US3297745A (en) * 1962-04-05 1967-01-10 Robertson Co H H Ethylenically unsaturated di-and tetra-urethane monomers
JPS5034966B2 (fr) * 1972-07-24 1975-11-12
US3827956A (en) * 1973-01-12 1974-08-06 Scm Corp Photopolymerizable pigmented vehicles containing chlorosulfonated or alpha-haloalkylated benzanthrone initiators
US4017649A (en) * 1973-02-05 1977-04-12 Ppg Industries, Inc. Radiation-sensitive compounds and methods of using same
US4057431A (en) * 1975-09-29 1977-11-08 The Goodyear Tire & Rubber Company Ethylenically polyurethane unsaturated composition
JPS52155694A (en) * 1976-06-22 1977-12-24 Toyobo Co Ltd Urethane-modified acrylate resin
US4065627A (en) * 1976-09-27 1977-12-27 General Mills Chemicals, Inc. High molecular weight radiation curable resins

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2284621A1 (fr) * 1974-09-12 1976-04-09 Basf Ag Matieres a mouler photoreticulables pour la preparation de cliches d'impression developpables a l'aide de solutions aqueuses alcalines
FR2284622A1 (fr) * 1974-09-13 1976-04-09 Basf Ag Matiere a mouler liquide photoreticulable pour la confection de plaques d'impression en relief
DE2702708A1 (de) * 1976-01-24 1977-08-04 Asahi Chemical Ind Photopolymerisierbare massen
FR2360620A1 (fr) * 1976-08-02 1978-03-03 Lord Corp Composition de revetement durcissable par irradiation

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0026299A1 (fr) * 1979-08-21 1981-04-08 Siemens Aktiengesellschaft Procédé de fabrication de structures en relief stables à haute température, structures en relief ainsi fabriquées et leur utilisation
FR2491246A1 (fr) * 1980-09-22 1982-04-02 Ampex Milieu magnetique muri par irradiation et son procede de production

Also Published As

Publication number Publication date
CA1122999A (fr) 1982-05-04
GB2020297A (en) 1979-11-14
GB2104086B (en) 1983-07-06
SE444991B (sv) 1986-05-20
AU4650379A (en) 1979-11-08
DE2917483A1 (de) 1979-11-15
HK34685A (en) 1985-05-10
SG17385G (en) 1986-11-21
BR7902646A (pt) 1979-11-27
GB2104086A (en) 1983-03-02
SE7903709L (sv) 1979-11-02
JPS54144497A (en) 1979-11-10
GB2020297B (en) 1983-04-27
DE2917483C2 (fr) 1991-01-24
IT1116471B (it) 1986-02-10
FR2425094B1 (fr) 1985-07-19
IT7948892A0 (it) 1979-04-30
AU524592B2 (en) 1982-09-23

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