ATE52060T1 - Lichtempfindliche flachdruckplatte. - Google Patents

Lichtempfindliche flachdruckplatte.

Info

Publication number
ATE52060T1
ATE52060T1 AT85113407T AT85113407T ATE52060T1 AT E52060 T1 ATE52060 T1 AT E52060T1 AT 85113407 T AT85113407 T AT 85113407T AT 85113407 T AT85113407 T AT 85113407T AT E52060 T1 ATE52060 T1 AT E52060T1
Authority
AT
Austria
Prior art keywords
printing plate
photosensitive
electrolyte
carboxylic acid
alloy plate
Prior art date
Application number
AT85113407T
Other languages
English (en)
Inventor
Shigeki Shimizu
Hiroshi Ide
Original Assignee
Mitsubishi Chem Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chem Ind filed Critical Mitsubishi Chem Ind
Application granted granted Critical
Publication of ATE52060T1 publication Critical patent/ATE52060T1/de

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00Preparing for use and conserving printing surfaces
    • B41N3/03Chemical or electrical pretreatment
    • B41N3/034Chemical or electrical pretreatment characterised by the electrochemical treatment of the aluminum support, e.g. anodisation, electro-graining; Sealing of the anodised layer; Treatment of the anodic layer with inorganic compounds; Colouring of the anodic layer
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/111Polymer of unsaturated acid or ester

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
AT85113407T 1984-10-23 1985-10-22 Lichtempfindliche flachdruckplatte. ATE52060T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP59222811A JPH0767868B2 (ja) 1984-10-23 1984-10-23 感光性平版印刷版
EP85113407A EP0179448B1 (de) 1984-10-23 1985-10-22 Lichtempfindliche Flachdruckplatte

Publications (1)

Publication Number Publication Date
ATE52060T1 true ATE52060T1 (de) 1990-05-15

Family

ID=16788268

Family Applications (1)

Application Number Title Priority Date Filing Date
AT85113407T ATE52060T1 (de) 1984-10-23 1985-10-22 Lichtempfindliche flachdruckplatte.

Country Status (8)

Country Link
US (1) US4990428A (de)
EP (1) EP0179448B1 (de)
JP (1) JPH0767868B2 (de)
AT (1) ATE52060T1 (de)
AU (1) AU584924B2 (de)
CA (1) CA1277946C (de)
DE (1) DE3577192D1 (de)
NZ (1) NZ213896A (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2202957A (en) * 1987-02-10 1988-10-05 Nordisk Tidningsplat Ab Lithographic printing plate
GB8720424D0 (en) * 1987-08-28 1987-10-07 Horsell Graphic Ind Ltd Pre-sensitized lithographic printing plate production
JP3115745B2 (ja) * 1993-07-12 2000-12-11 富士写真フイルム株式会社 感光材料
US5514522A (en) * 1993-11-01 1996-05-07 Polaroid Corporation Synthesis of photoreactive polymeric binders
US5753414A (en) * 1995-10-02 1998-05-19 Macdermid Imaging Technology, Inc. Photopolymer plate having a peelable substrate
US5786127A (en) * 1996-08-15 1998-07-28 Western Litho Plate & Supply Co. Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen
JPH10282681A (ja) * 1997-04-04 1998-10-23 Fuji Photo Film Co Ltd 感光性印刷版材用合紙
GB9710551D0 (en) * 1997-05-23 1997-07-16 Horsell Graphic Ind Ltd Planographic printing
EP1142707B2 (de) 2000-04-07 2011-11-30 FUJIFILM Corporation Wärmeempfindlicher lithographischer Druckplattevorläufer
US6692890B2 (en) 2001-04-04 2004-02-17 Kodak Polychrome Graphics Llc Substrate improvements for thermally imageable composition and methods of preparation
JP4152656B2 (ja) * 2002-04-02 2008-09-17 富士フイルム株式会社 平版印刷版用原版
JP4360242B2 (ja) * 2004-03-24 2009-11-11 Jsr株式会社 ネガ型感放射線性樹脂組成物

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3511661A (en) * 1966-07-01 1970-05-12 Eastman Kodak Co Lithographic printing plate
GB1244723A (en) * 1967-11-15 1971-09-02 Howson Algraphy Ltd Improvements in or relating to presensitised lithographic printing plates
JPS4912903A (de) * 1972-05-15 1974-02-04
JPS5432424B2 (de) * 1972-06-03 1979-10-15
GB1463816A (en) * 1973-11-08 1977-02-09 Kodak Ltd Photosensitive lithographic materials and polymers useful therein
US4116695A (en) * 1974-09-12 1978-09-26 Fuji Photo Film Co., Ltd. Method of producing a support for a printing plate
GB1509314A (en) * 1975-05-20 1978-05-04 Kodak Ltd Radiation-sensitive resist-forming composition
DE2622799A1 (de) * 1976-05-21 1977-12-08 Hoechst Ag Vorsensibilisierte flachdruckplatte
JPS597089B2 (ja) * 1976-07-30 1984-02-16 関西ペイント株式会社 平版印刷用版の製版方法
DE2836803A1 (de) * 1978-08-23 1980-03-06 Hoechst Ag Verfahren zur anodischen oxidation von aluminium und dessen verwendung als druckplatten-traegermaterial
JPS5722032A (en) * 1980-07-17 1982-02-04 Toshiba Mach Co Ltd Extrusion by multiple shaft extruder and screw used for it
US4517281A (en) * 1980-10-06 1985-05-14 E. I. Du Pont De Nemours And Company Development process for aqueous developable photopolymerizable elements
JPS58173740A (ja) * 1982-04-05 1983-10-12 Mitsubishi Chem Ind Ltd 感光性組成物
DE3206469A1 (de) * 1982-02-23 1983-09-01 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung von traegermaterialien fuer offsetdruckplatten
JPS5946643A (ja) * 1982-09-09 1984-03-16 Fuji Photo Film Co Ltd 感光性平版印刷版
JPS5971048A (ja) * 1982-10-18 1984-04-21 Mitsubishi Chem Ind Ltd 光重合系感光性組成物

Also Published As

Publication number Publication date
EP0179448A2 (de) 1986-04-30
JPH0767868B2 (ja) 1995-07-26
JPS61100497A (ja) 1986-05-19
NZ213896A (en) 1988-01-08
EP0179448B1 (de) 1990-04-18
CA1277946C (en) 1990-12-18
EP0179448A3 (en) 1986-08-27
US4990428A (en) 1991-02-05
AU4844085A (en) 1986-05-01
DE3577192D1 (de) 1990-05-23
AU584924B2 (en) 1989-06-08

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee