JPS54144497A - Polymerizable oligomer * photopolymerizable composition and base material coated by said composition - Google Patents

Polymerizable oligomer * photopolymerizable composition and base material coated by said composition

Info

Publication number
JPS54144497A
JPS54144497A JP5399379A JP5399379A JPS54144497A JP S54144497 A JPS54144497 A JP S54144497A JP 5399379 A JP5399379 A JP 5399379A JP 5399379 A JP5399379 A JP 5399379A JP S54144497 A JPS54144497 A JP S54144497A
Authority
JP
Japan
Prior art keywords
composition
base material
material coated
polymerizable oligomer
photopolymerizable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5399379A
Other languages
English (en)
Inventor
Debitsudo Rusoo Aran
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of JPS54144497A publication Critical patent/JPS54144497A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/08—Processes
    • C08G18/10—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
    • C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
    • C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
    • C08G18/8175—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with esters of acrylic or alkylacrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/83—Chemically modified polymers
    • C08G18/831—Chemically modified polymers by oxygen-containing compounds inclusive of carbonic acid halogenides, carboxylic acid halogenides and epoxy halides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
JP5399379A 1978-05-01 1979-05-01 Polymerizable oligomer * photopolymerizable composition and base material coated by said composition Pending JPS54144497A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US90148078A 1978-05-01 1978-05-01

Publications (1)

Publication Number Publication Date
JPS54144497A true JPS54144497A (en) 1979-11-10

Family

ID=25414263

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5399379A Pending JPS54144497A (en) 1978-05-01 1979-05-01 Polymerizable oligomer * photopolymerizable composition and base material coated by said composition

Country Status (11)

Country Link
JP (1) JPS54144497A (ja)
AU (1) AU524592B2 (ja)
BR (1) BR7902646A (ja)
CA (1) CA1122999A (ja)
DE (1) DE2917483A1 (ja)
FR (1) FR2425094B1 (ja)
GB (2) GB2020297B (ja)
HK (1) HK34685A (ja)
IT (1) IT1116471B (ja)
SE (1) SE444991B (ja)
SG (1) SG17385G (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57164595A (en) * 1981-01-16 1982-10-09 Grace W R & Co Method and device for producing printed circuit board

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2933871A1 (de) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung.
US4337303A (en) * 1980-08-11 1982-06-29 Minnesota Mining And Manufacturing Company Transfer, encapsulating, and fixing of toner images
CA1167408A (en) * 1980-09-22 1984-05-15 Hao-Jan Chang Electron beam curing of magnetic media
US4422914A (en) * 1981-01-16 1983-12-27 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4506055A (en) * 1983-06-23 1985-03-19 Ici Americas Inc. Carboxy modified vinyl ester urethane resins
DE3567294D1 (en) * 1984-12-06 1989-02-09 Hoechst Celanese Corp Light-sensitive composition
DE3619129A1 (de) * 1986-06-06 1987-12-10 Basf Ag Lichtempfindliches aufzeichnungselement
DE4138309C2 (de) * 1991-11-21 1995-02-09 Eos Electro Optical Syst Durch Einwirkung elektromagnetischer Strahlung vernetzbares Kunststoffmaterial
US5998496A (en) * 1995-10-31 1999-12-07 Spectra Group Limited, Inc. Photosensitive intramolecular electron transfer compounds
JP3907144B2 (ja) * 1998-04-09 2007-04-18 富士フイルム株式会社 平版印刷版の製造方法、レーザ走査露光用平版印刷版原版、および光重合性組成物
US6258918B1 (en) 1998-04-22 2001-07-10 3M Innovative Properties Company Flexible polyurethane material

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5242587A (en) * 1975-09-29 1977-04-02 Goodyear Tire & Rubber Polyurethane composition used for print plate material
JPS52155694A (en) * 1976-06-22 1977-12-24 Toyobo Co Ltd Urethane-modified acrylate resin

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL254617A (ja) * 1959-08-05
US3297745A (en) * 1962-04-05 1967-01-10 Robertson Co H H Ethylenically unsaturated di-and tetra-urethane monomers
JPS5034966B2 (ja) * 1972-07-24 1975-11-12
US3827956A (en) * 1973-01-12 1974-08-06 Scm Corp Photopolymerizable pigmented vehicles containing chlorosulfonated or alpha-haloalkylated benzanthrone initiators
US4017649A (en) * 1973-02-05 1977-04-12 Ppg Industries, Inc. Radiation-sensitive compounds and methods of using same
DE2443665A1 (de) * 1974-09-12 1976-03-25 Basf Ag Photovernetzbare formmasse fuer die herstellung von waessrig-alkalisch entwickelbaren druckformen
DE2443786C2 (de) * 1974-09-13 1984-01-19 Basf Ag, 6700 Ludwigshafen Flüssige, photovernetzbare Formmasse zur Herstellung von Reliefdruckplatten
JPS5290304A (en) * 1976-01-24 1977-07-29 Asahi Chemical Ind Photoosensitive resin composition for making flexo graphic printing plate
GB1590412A (en) * 1976-08-02 1981-06-03 Lord Corp Radiation curable compositions
US4065627A (en) * 1976-09-27 1977-12-27 General Mills Chemicals, Inc. High molecular weight radiation curable resins

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5242587A (en) * 1975-09-29 1977-04-02 Goodyear Tire & Rubber Polyurethane composition used for print plate material
JPS52155694A (en) * 1976-06-22 1977-12-24 Toyobo Co Ltd Urethane-modified acrylate resin

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57164595A (en) * 1981-01-16 1982-10-09 Grace W R & Co Method and device for producing printed circuit board

Also Published As

Publication number Publication date
FR2425094A1 (fr) 1979-11-30
DE2917483A1 (de) 1979-11-15
HK34685A (en) 1985-05-10
BR7902646A (pt) 1979-11-27
GB2020297B (en) 1983-04-27
FR2425094B1 (fr) 1985-07-19
DE2917483C2 (ja) 1991-01-24
SE7903709L (sv) 1979-11-02
AU524592B2 (en) 1982-09-23
AU4650379A (en) 1979-11-08
GB2104086B (en) 1983-07-06
CA1122999A (en) 1982-05-04
IT7948892A0 (it) 1979-04-30
GB2020297A (en) 1979-11-14
SE444991B (sv) 1986-05-20
SG17385G (en) 1986-11-21
IT1116471B (it) 1986-02-10
GB2104086A (en) 1983-03-02

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