JPS5034966B2 - - Google Patents

Info

Publication number
JPS5034966B2
JPS5034966B2 JP47073976A JP7397672A JPS5034966B2 JP S5034966 B2 JPS5034966 B2 JP S5034966B2 JP 47073976 A JP47073976 A JP 47073976A JP 7397672 A JP7397672 A JP 7397672A JP S5034966 B2 JPS5034966 B2 JP S5034966B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP47073976A
Other versions
JPS4932701A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP47073976A priority Critical patent/JPS5034966B2/ja
Priority to US380018A priority patent/US3895949A/en
Priority to CA177,041A priority patent/CA1015198A/en
Priority to FR7326917A priority patent/FR2193992B1/fr
Priority to IT26990/73A priority patent/IT1017521B/it
Priority to GB3523873A priority patent/GB1419332A/en
Priority to DE19732337645 priority patent/DE2337645C3/de
Publication of JPS4932701A publication Critical patent/JPS4932701A/ja
Publication of JPS5034966B2 publication Critical patent/JPS5034966B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/156Precursor compound
    • Y10S430/16Blocked developers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP47073976A 1972-07-24 1972-07-24 Expired JPS5034966B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP47073976A JPS5034966B2 (ja) 1972-07-24 1972-07-24
US380018A US3895949A (en) 1972-07-24 1973-07-17 Photosensitive element comprising photopolymerizable layer and protective layer
CA177,041A CA1015198A (en) 1972-07-24 1973-07-23 Photosensitive elements
FR7326917A FR2193992B1 (ja) 1972-07-24 1973-07-23
IT26990/73A IT1017521B (it) 1972-07-24 1973-07-24 Elementi fotosensibili
GB3523873A GB1419332A (en) 1972-07-24 1973-07-24 Photosensitive elements
DE19732337645 DE2337645C3 (de) 1972-07-24 1973-07-24 Photographisches Aufzeichnungsmaterial

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47073976A JPS5034966B2 (ja) 1972-07-24 1972-07-24

Publications (2)

Publication Number Publication Date
JPS4932701A JPS4932701A (ja) 1974-03-26
JPS5034966B2 true JPS5034966B2 (ja) 1975-11-12

Family

ID=13533619

Family Applications (1)

Application Number Title Priority Date Filing Date
JP47073976A Expired JPS5034966B2 (ja) 1972-07-24 1972-07-24

Country Status (6)

Country Link
US (1) US3895949A (ja)
JP (1) JPS5034966B2 (ja)
CA (1) CA1015198A (ja)
FR (1) FR2193992B1 (ja)
GB (1) GB1419332A (ja)
IT (1) IT1017521B (ja)

Families Citing this family (101)

* Cited by examiner, † Cited by third party
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JPS5240979B2 (ja) * 1973-09-17 1977-10-15
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IT1032800B (it) * 1975-06-23 1979-06-20 Siap Societa Ind Agglo Merate Procediment di produzione di agglomerati grafitici e prodotti cosi ottenuti
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US4294533A (en) * 1978-03-23 1981-10-13 E. I. Du Pont De Nemours And Company Apparatus for pre-conditioning film
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US4245030A (en) * 1979-05-23 1981-01-13 Hoechst Aktiengesellschaft Photopolymerizable mixture containing improved plasticizer
ATE2980T1 (de) * 1979-09-21 1983-04-15 Censor Patent- Und Versuchs-Anstalt Verfahren zur uebertragung eines musters auf eine halbleiterscheibe.
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US4383878A (en) * 1980-05-20 1983-05-17 Minnesota Mining And Manufacturing Company Transfer process
US4503140A (en) 1982-05-18 1985-03-05 Minnesota Mining And Manufacturing Company Radiation-sensitive compositions of polymers containing a π-metal carbonyl complex of conjugated polyolefin
US4559293A (en) * 1983-04-08 1985-12-17 Kimoto & Co., Ltd. Photosensitive recording material developable with aqueous neutral salt solution
JPS6060640A (ja) * 1983-09-13 1985-04-08 Toyobo Co Ltd 画像複製材料およびその製造法
US4476215A (en) * 1983-11-25 1984-10-09 Minnesota Mining And Manufacturing Company Negative-acting photoresist composition
JPH0642073B2 (ja) * 1984-04-10 1994-06-01 三菱レイヨン株式会社 光重合性樹脂組成物
US4591546A (en) * 1984-06-11 1986-05-27 General Electric Company Spin castable resist composition and use
JPS60263141A (ja) * 1984-06-12 1985-12-26 Fuji Photo Film Co Ltd 光重合性感光材料
US4686171A (en) * 1986-02-14 1987-08-11 Hercules Incorporated Photopolymerizable films containing plasticizer silica combinations
US4751138A (en) 1986-08-11 1988-06-14 Minnesota Mining And Manufacturing Company Coated abrasive having radiation curable binder
JPS63225673A (ja) * 1987-01-29 1988-09-20 ダイマックス コーポレーション アミドを含有し、活性線で硬化する接着システム
JP2571251B2 (ja) * 1988-01-22 1997-01-16 株式会社神戸製鋼所 摩擦材用炭素繊維強化炭素複合材料
US5032486A (en) * 1990-03-02 1991-07-16 Minnesota Mining And Manufacturing Company Method for forming printing plates and plate-making element
US5124227A (en) * 1990-03-15 1992-06-23 Graphics Technology International Inc. Protective overcoats for diazo type layers
DE69126586T2 (de) * 1990-08-30 1997-11-27 At & T Corp Verfahren zur Herstellung einer Vorrichtung
US5236472A (en) * 1991-02-22 1993-08-17 Minnesota Mining And Manufacturing Company Abrasive product having a binder comprising an aminoplast binder
CN1068092A (zh) * 1991-06-21 1993-01-20 瑞士隆萨股份公司 生产以α-氧化铝为基质的烧结材料特别是磨料的方法
US5368618A (en) * 1992-01-22 1994-11-29 Minnesota Mining And Manufacturing Company Method of making a coated abrasive article
US5178646A (en) * 1992-01-22 1993-01-12 Minnesota Mining And Manufacturing Company Coatable thermally curable binder presursor solutions modified with a reactive diluent, abrasive articles incorporating same, and methods of making said abrasive articles
US5256170A (en) * 1992-01-22 1993-10-26 Minnesota Mining And Manufacturing Company Coated abrasive article and method of making same
US5344688A (en) * 1992-08-19 1994-09-06 Minnesota Mining And Manufacturing Company Coated abrasive article and a method of making same
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US5773182A (en) 1993-08-05 1998-06-30 Kimberly-Clark Worldwide, Inc. Method of light stabilizing a colorant
US5700850A (en) 1993-08-05 1997-12-23 Kimberly-Clark Worldwide Colorant compositions and colorant stabilizers
US5733693A (en) 1993-08-05 1998-03-31 Kimberly-Clark Worldwide, Inc. Method for improving the readability of data processing forms
US5643356A (en) 1993-08-05 1997-07-01 Kimberly-Clark Corporation Ink for ink jet printers
US6071979A (en) 1994-06-30 2000-06-06 Kimberly-Clark Worldwide, Inc. Photoreactor composition method of generating a reactive species and applications therefor
US5685754A (en) * 1994-06-30 1997-11-11 Kimberly-Clark Corporation Method of generating a reactive species and polymer coating applications therefor
US5739175A (en) 1995-06-05 1998-04-14 Kimberly-Clark Worldwide, Inc. Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer
US6242057B1 (en) 1994-06-30 2001-06-05 Kimberly-Clark Worldwide, Inc. Photoreactor composition and applications therefor
US6008268A (en) 1994-10-21 1999-12-28 Kimberly-Clark Worldwide, Inc. Photoreactor composition, method of generating a reactive species, and applications therefor
US5786132A (en) 1995-06-05 1998-07-28 Kimberly-Clark Corporation Pre-dyes, mutable dye compositions, and methods of developing a color
US5811199A (en) 1995-06-05 1998-09-22 Kimberly-Clark Worldwide, Inc. Adhesive compositions containing a photoreactor composition
RU2170943C2 (ru) 1995-06-05 2001-07-20 Кимберли-Кларк Уорлдвайд, Инк. Новые прекрасители
US5798015A (en) 1995-06-05 1998-08-25 Kimberly-Clark Worldwide, Inc. Method of laminating a structure with adhesive containing a photoreactor composition
US5747550A (en) 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
US5849411A (en) 1995-06-05 1998-12-15 Kimberly-Clark Worldwide, Inc. Polymer film, nonwoven web and fibers containing a photoreactor composition
JP2000506550A (ja) 1995-06-28 2000-05-30 キンバリー クラーク ワールドワイド インコーポレイテッド 新規な着色剤および着色剤用改質剤
US5782963A (en) 1996-03-29 1998-07-21 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US6099628A (en) 1996-03-29 2000-08-08 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5855655A (en) 1996-03-29 1999-01-05 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
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US5891229A (en) 1996-03-29 1999-04-06 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US6200666B1 (en) 1996-07-25 2001-03-13 3M Innovative Properties Company Thermal transfer compositions, articles, and graphic articles made with same
US5723276A (en) * 1996-09-11 1998-03-03 Eastman Kodak Company Coating compositions for photographic paper
US5723275A (en) * 1996-09-11 1998-03-03 Eastman Kodak Company Vinylidene chloride containing coating composition for imaging elements
US5723274A (en) * 1996-09-11 1998-03-03 Eastman Kodak Company Film former and non-film former coating composition for imaging elements
US5846699A (en) * 1996-09-11 1998-12-08 Eastman Kodak Company Coating composition including polyurethane for imaging elements
US5786135A (en) * 1996-09-11 1998-07-28 Eastman Kodak Company Coating composition for imaging elements
US5723273A (en) * 1996-09-11 1998-03-03 Eastman Kodak Company Protective overcoat for antistatic layer
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
MY120763A (en) * 1997-09-19 2005-11-30 Hitachi Chemical Co Ltd Photosensitive film, process for laminating photosensitive resin layer, photosensitive resin layer-laminated substrate and process for curing photosensitive resin layer
BR9906513A (pt) 1998-06-03 2001-10-30 Kimberly Clark Co Fotoiniciadores novos e aplicações para osmesmos
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ATE238393T1 (de) 1999-01-19 2003-05-15 Kimberly Clark Co Farbstoffe, farbstoffstabilisatoren, tintenzusammensetzungen und verfahren zu deren herstellung
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
US6294698B1 (en) 1999-04-16 2001-09-25 Kimberly-Clark Worldwide, Inc. Photoinitiators and applications therefor
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US6984482B2 (en) 1999-06-03 2006-01-10 Hynix Semiconductor Inc. Top-coating composition for photoresist and process for forming fine pattern using the same
KR100401116B1 (ko) * 1999-06-03 2003-10-10 주식회사 하이닉스반도체 아민오염방지 물질 및 이를 이용한 미세패턴 형성방법
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US7270937B2 (en) * 2003-10-17 2007-09-18 Hynix Semiconductor Inc. Over-coating composition for photoresist and process for forming photoresist pattern using the same
KR101426181B1 (ko) * 2004-01-15 2014-07-31 제이에스알 가부시끼가이샤 액침용 상층막 형성 조성물 및 포토레지스트 패턴 형성 방법
JP4428642B2 (ja) * 2004-04-30 2010-03-10 東京応化工業株式会社 パターン微細化用被覆形成剤およびそれを用いた微細パターンの形成方法
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EP1739486B1 (en) * 2005-06-29 2015-06-03 FUJIFILM Corporation Photosensitive lithographic printing plate
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JP4869811B2 (ja) * 2006-07-19 2012-02-08 東京応化工業株式会社 微細パターンの形成方法
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WO2016099948A1 (en) 2014-12-16 2016-06-23 3M Innovative Properties Company Antistatic polymers and methods of making the same
WO2016099996A1 (en) 2014-12-16 2016-06-23 3M Innovative Properties Company Antistatic polymers and methods of making the same
US10308753B2 (en) 2014-12-16 2019-06-04 3M Innovative Properties Company Ionic diol, antistatic polyurethane, and method of making the same

Family Cites Families (4)

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US3113867A (en) * 1959-10-29 1963-12-10 Eastman Kodak Co Motion-picture film lacquer
US3458311A (en) * 1966-06-27 1969-07-29 Du Pont Photopolymerizable elements with solvent removable protective layers
US3591379A (en) * 1968-04-09 1971-07-06 Eastman Kodak Co Photographic overcoat compositions and photographic elements
US3796578A (en) * 1970-12-26 1974-03-12 Asahi Chemical Ind Photopolymerizable compositions and elements containing addition polymerizable polymeric compounds

Also Published As

Publication number Publication date
US3895949A (en) 1975-07-22
FR2193992A1 (ja) 1974-02-22
DE2337645A1 (de) 1974-02-21
CA1015198A (en) 1977-08-09
JPS4932701A (ja) 1974-03-26
GB1419332A (en) 1975-12-31
IT1017521B (it) 1977-08-10
DE2337645B2 (de) 1975-11-13
FR2193992B1 (ja) 1977-09-30

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