IT1017521B - Elementi fotosensibili - Google Patents

Elementi fotosensibili

Info

Publication number
IT1017521B
IT1017521B IT26990/73A IT2699073A IT1017521B IT 1017521 B IT1017521 B IT 1017521B IT 26990/73 A IT26990/73 A IT 26990/73A IT 2699073 A IT2699073 A IT 2699073A IT 1017521 B IT1017521 B IT 1017521B
Authority
IT
Italy
Prior art keywords
photosensitive elements
photosensitive
elements
Prior art date
Application number
IT26990/73A
Other languages
English (en)
Original Assignee
Asahi Chemical Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Ind filed Critical Asahi Chemical Ind
Application granted granted Critical
Publication of IT1017521B publication Critical patent/IT1017521B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/156—Precursor compound
    • Y10S430/16—Blocked developers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
IT26990/73A 1972-07-24 1973-07-24 Elementi fotosensibili IT1017521B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47073976A JPS5034966B2 (it) 1972-07-24 1972-07-24

Publications (1)

Publication Number Publication Date
IT1017521B true IT1017521B (it) 1977-08-10

Family

ID=13533619

Family Applications (1)

Application Number Title Priority Date Filing Date
IT26990/73A IT1017521B (it) 1972-07-24 1973-07-24 Elementi fotosensibili

Country Status (6)

Country Link
US (1) US3895949A (it)
JP (1) JPS5034966B2 (it)
CA (1) CA1015198A (it)
FR (1) FR2193992B1 (it)
GB (1) GB1419332A (it)
IT (1) IT1017521B (it)

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KR101426181B1 (ko) * 2004-01-15 2014-07-31 제이에스알 가부시끼가이샤 액침용 상층막 형성 조성물 및 포토레지스트 패턴 형성 방법
JP4428642B2 (ja) * 2004-04-30 2010-03-10 東京応化工業株式会社 パターン微細化用被覆形成剤およびそれを用いた微細パターンの形成方法
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Also Published As

Publication number Publication date
US3895949A (en) 1975-07-22
FR2193992A1 (it) 1974-02-22
DE2337645A1 (de) 1974-02-21
CA1015198A (en) 1977-08-09
JPS5034966B2 (it) 1975-11-12
JPS4932701A (it) 1974-03-26
GB1419332A (en) 1975-12-31
DE2337645B2 (de) 1975-11-13
FR2193992B1 (it) 1977-09-30

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