HK22090A - Formaldehyde-free autocatalytic electroless copper plating - Google Patents

Formaldehyde-free autocatalytic electroless copper plating Download PDF

Info

Publication number
HK22090A
HK22090A HK220/90A HK22090A HK22090A HK 22090 A HK22090 A HK 22090A HK 220/90 A HK220/90 A HK 220/90A HK 22090 A HK22090 A HK 22090A HK 22090 A HK22090 A HK 22090A
Authority
HK
Hong Kong
Prior art keywords
formaldehyde
copper plating
electroless copper
autocatalytic electroless
free
Prior art date
Application number
HK220/90A
Other languages
English (en)
Inventor
Darken Jeffrey
Original Assignee
Omi International Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB848432400A external-priority patent/GB8432400D0/en
Priority claimed from GB848432395A external-priority patent/GB8432395D0/en
Application filed by Omi International Corporation filed Critical Omi International Corporation
Publication of HK22090A publication Critical patent/HK22090A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/38—Coating with copper
    • C23C18/40—Coating with copper using reducing agents
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/922—Static electricity metal bleed-off metallic stock
    • Y10S428/9335—Product by special process
    • Y10S428/936—Chemical deposition, e.g. electroless plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Sealing Material Composition (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
HK220/90A 1984-12-21 1990-03-22 Formaldehyde-free autocatalytic electroless copper plating HK22090A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB848432400A GB8432400D0 (en) 1984-12-21 1984-12-21 Copper plating
GB848432395A GB8432395D0 (en) 1984-12-21 1984-12-21 Copper plating

Publications (1)

Publication Number Publication Date
HK22090A true HK22090A (en) 1990-03-30

Family

ID=26288606

Family Applications (1)

Application Number Title Priority Date Filing Date
HK220/90A HK22090A (en) 1984-12-21 1990-03-22 Formaldehyde-free autocatalytic electroless copper plating

Country Status (14)

Country Link
US (1) US4617205A (en, 2012)
JP (1) JPS61183474A (en, 2012)
AU (1) AU559526B2 (en, 2012)
BR (1) BR8506459A (en, 2012)
CA (1) CA1255975A (en, 2012)
CH (1) CH671037A5 (en, 2012)
DE (1) DE3544932C2 (en, 2012)
ES (1) ES8701853A1 (en, 2012)
FR (1) FR2575187B1 (en, 2012)
GB (1) GB2169924B (en, 2012)
HK (1) HK22090A (en, 2012)
IT (1) IT1182104B (en, 2012)
NL (1) NL8503530A (en, 2012)
SE (1) SE460483B (en, 2012)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2595319B2 (ja) * 1988-07-20 1997-04-02 日本電装株式会社 化学銅めっき液及びそれを用いた銅めっき皮膜の形成方法
US4877450A (en) * 1989-02-23 1989-10-31 Learonal, Inc. Formaldehyde-free electroless copper plating solutions
US5104688A (en) * 1990-06-04 1992-04-14 Macdermid, Incorporated Pretreatment composition and process for tin-lead immersion plating
DE4111559C1 (en) * 1991-04-05 1992-04-30 Schering Ag Berlin Und Bergkamen, 1000 Berlin, De Currentless bath for chemical deposition of copper@ (alloy) - contains polyethyleneimine deriv. and is formaldehyde-free
WO1992017624A1 (de) * 1991-04-05 1992-10-15 Schering Aktiengesellschaft Formaldehydfreies bad zur stromlosen abscheidung von kupfer, verfahren und die verwendung von polyethyleniminen in formaldehydfreien bädern
DE69434619T2 (de) * 1993-03-18 2006-08-17 Atotech Deutschland Gmbh Sich selbstbeschleunigendes und sich selbst auffrischendes Verfahren zur Tauchbeschichtung ohne Formaldehyd, sowie die entsprechende Zusammensetzung
US5419926A (en) * 1993-11-22 1995-05-30 Lilly London, Inc. Ammonia-free deposition of copper by disproportionation
US6042889A (en) * 1994-02-28 2000-03-28 International Business Machines Corporation Method for electrolessly depositing a metal onto a substrate using mediator ions
US5753309A (en) * 1995-12-19 1998-05-19 Surface Tek Specialty Products, Inc. Composition and method for reducing copper oxide to metallic copper
US5900186A (en) * 1995-12-19 1999-05-04 Morton International, Inc. Composition and method for reducing copper oxide to metallic copper
US5721014A (en) * 1995-12-19 1998-02-24 Surface Tek Specialty Products, Inc. Composition and method for reducing copper oxide to metallic copper
DE69735999T2 (de) 1997-04-07 2007-05-03 Okuno Chemical Industries Co., Ltd. Verfahren zur elektrobeschichtung eines nichtleitenden geformten kunststoffgegenstands
JP3444276B2 (ja) * 2000-06-19 2003-09-08 株式会社村田製作所 無電解銅めっき浴、無電解銅めっき方法および電子部品
JP4482744B2 (ja) 2001-02-23 2010-06-16 株式会社日立製作所 無電解銅めっき液、無電解銅めっき方法、配線板の製造方法
JP4595237B2 (ja) * 2001-04-27 2010-12-08 日立金属株式会社 銅めっき液および銅めっき方法
JP2003147541A (ja) * 2001-11-15 2003-05-21 Hitachi Ltd 無電解銅めっき液、無電解銅めっき用補給液及び配線板の製造方法
US6897152B2 (en) * 2003-02-05 2005-05-24 Enthone Inc. Copper bath composition for electroless and/or electrolytic filling of vias and trenches for integrated circuit fabrication
TWI348499B (en) * 2006-07-07 2011-09-11 Rohm & Haas Elect Mat Electroless copper and redox couples
US20080241401A1 (en) * 2007-03-28 2008-10-02 Hok-Kin Choi Method of monitoring electroless plating chemistry
US20080248194A1 (en) * 2007-04-04 2008-10-09 L'air Liquide - Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Method for producing a copper layer on a substrate in a flat panel display manufacturing process
TWI504787B (zh) * 2011-03-01 2015-10-21 Grand Plastic Technology Co Ltd 高深寬比通孔無電鍍銅沉積方法及配方
CN104040026B (zh) * 2011-10-05 2019-01-01 埃托特克德国有限公司 不含甲醛的化学镀镀铜溶液
US9153449B2 (en) * 2012-03-19 2015-10-06 Lam Research Corporation Electroless gap fill
US20160273112A1 (en) * 2013-03-27 2016-09-22 Atotech Deutschland Gmbh Electroless copper plating solution
EP2784181B1 (en) 2013-03-27 2015-12-09 ATOTECH Deutschland GmbH Electroless copper plating solution
ES2684353T3 (es) * 2013-09-25 2018-10-02 Atotech Deutschland Gmbh Método para depositar una capa de siembra de cobre sobre una capa de barrera y baño de cobreado
KR101799347B1 (ko) * 2014-01-27 2017-11-20 오꾸노 케미칼 인더스트리즈 컴파니,리미티드 도전성 피막 형성 욕
US9869026B2 (en) 2014-07-15 2018-01-16 Rohm And Haas Electronic Materials Llc Electroless copper plating compositions
US20160145745A1 (en) * 2014-11-24 2016-05-26 Rohm And Haas Electronic Materials Llc Formaldehyde-free electroless metal plating compositions and methods
EP3035122B1 (en) 2014-12-16 2019-03-20 ATOTECH Deutschland GmbH Method for fine line manufacturing
ES2639300T3 (es) 2014-12-16 2017-10-26 Atotech Deutschland Gmbh Composiciones de baño de chapado para el chapado no electrolítico de metales y aleaciones metálicas
EP3271500B1 (en) 2015-03-20 2018-06-20 ATOTECH Deutschland GmbH Activation method for silicon substrates
EP3452635B1 (en) 2016-05-04 2020-02-26 ATOTECH Deutschland GmbH Process for depositing a metal or metal alloy on a surface of a substrate including its activation
EP3578683B1 (en) 2018-06-08 2021-02-24 ATOTECH Deutschland GmbH Electroless copper or copper alloy plating bath and method for plating
CN111621773B (zh) * 2020-05-27 2022-08-16 广东东硕科技有限公司 二硫代氨基甲酸类化合物在化学镀钯中的应用以及化学镀钯组合物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3607317A (en) * 1969-02-04 1971-09-21 Photocircuits Corp Ductility promoter and stabilizer for electroless copper plating baths
US4171225A (en) * 1976-01-23 1979-10-16 U.S. Philips Corporation Electroless copper plating solutions
US4209331A (en) * 1978-05-25 1980-06-24 Macdermid Incorporated Electroless copper composition solution using a hypophosphite reducing agent

Also Published As

Publication number Publication date
JPS61183474A (ja) 1986-08-16
ES8701853A1 (es) 1986-12-01
ES550306A0 (es) 1986-12-01
NL8503530A (nl) 1986-07-16
SE460483B (sv) 1989-10-16
GB8531356D0 (en) 1986-02-05
IT1182104B (it) 1987-09-30
DE3544932C2 (de) 1987-04-09
AU5155485A (en) 1986-06-26
GB2169924B (en) 1988-07-13
JPH0224910B2 (en, 2012) 1990-05-31
SE8506078D0 (sv) 1985-12-20
DE3544932A1 (de) 1986-07-03
CA1255975A (en) 1989-06-20
BR8506459A (pt) 1986-09-02
CH671037A5 (en, 2012) 1989-07-31
GB2169924A (en) 1986-07-23
IT8548967A0 (it) 1985-12-20
SE8506078L (sv) 1986-06-22
US4617205A (en) 1986-10-14
AU559526B2 (en) 1987-03-12
FR2575187B1 (fr) 1989-04-28
FR2575187A1 (fr) 1986-06-27

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Legal Events

Date Code Title Description
PF Patent in force
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20041220