HK1203637A1 - Dust-prevention film assembly - Google Patents
Dust-prevention film assemblyInfo
- Publication number
- HK1203637A1 HK1203637A1 HK15104240.3A HK15104240A HK1203637A1 HK 1203637 A1 HK1203637 A1 HK 1203637A1 HK 15104240 A HK15104240 A HK 15104240A HK 1203637 A1 HK1203637 A1 HK 1203637A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- dust
- prevention film
- film assembly
- assembly
- prevention
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013196840A JP5950467B2 (ja) | 2013-09-24 | 2013-09-24 | ペリクル |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| HK1203637A1 true HK1203637A1 (en) | 2015-10-30 |
Family
ID=51421838
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| HK15104240.3A HK1203637A1 (en) | 2013-09-24 | 2015-05-04 | Dust-prevention film assembly |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9594300B2 (ja) |
| EP (1) | EP2860583B1 (ja) |
| JP (1) | JP5950467B2 (ja) |
| KR (2) | KR102251928B1 (ja) |
| CN (2) | CN104460225A (ja) |
| HK (1) | HK1203637A1 (ja) |
| TW (1) | TWI522730B (ja) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6632057B2 (ja) * | 2016-01-07 | 2020-01-15 | 信越化学工業株式会社 | ペリクル |
| TWI670562B (zh) * | 2018-06-21 | 2019-09-01 | 美商微相科技股份有限公司 | 光罩保護組件結構 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58219023A (ja) | 1982-06-15 | 1983-12-20 | Daicel Chem Ind Ltd | 樹脂薄膜の製造方法 |
| JPS6083032A (ja) | 1983-10-13 | 1985-05-11 | Asahi Chem Ind Co Ltd | 光透過性に優れたフオトマスク用防塵カバ− |
| US4861402A (en) | 1984-10-16 | 1989-08-29 | Du Pont Tau Laboratories, Inc. | Method of making a cellulose acetate butyrate pellicle |
| GB2165545B (en) * | 1984-10-16 | 1988-03-30 | Du Pont | Pellicle structure for transmission of mid ultraviolet light |
| JPS6327707U (ja) | 1986-08-06 | 1988-02-23 | ||
| US5344677A (en) * | 1992-08-27 | 1994-09-06 | Hong Gilbert H | Photochemically stable deep ultraviolet pellicles for excimer lasers |
| JPH0772617A (ja) * | 1993-09-02 | 1995-03-17 | Shin Etsu Chem Co Ltd | ペリクル |
| JPH11160854A (ja) * | 1997-11-28 | 1999-06-18 | Shin Etsu Chem Co Ltd | ペリクル用ライナー及びそれを用いたペリクル |
| JPH11219023A (ja) | 1998-02-03 | 1999-08-10 | Fuji Xerox Co Ltd | 現像装置 |
| JP3601996B2 (ja) * | 1999-03-05 | 2004-12-15 | 信越化学工業株式会社 | ペリクル粘着層保護用ライナーおよびこれを具備するペリクル |
| JP2002219778A (ja) * | 2001-01-25 | 2002-08-06 | Daikyo Giken Kogyo Kk | 剥離材及びその製造方法並びに粘着性物品 |
| JP2004157229A (ja) * | 2002-11-05 | 2004-06-03 | Shin Etsu Chem Co Ltd | リソグラフィ用ペリクル及びその製造方法 |
| JP2005350650A (ja) | 2004-05-14 | 2005-12-22 | Nitto Denko Corp | 剥離ライナー及びそれを用いた感圧性接着テープ又はシート |
| JP2007099858A (ja) * | 2005-10-03 | 2007-04-19 | Furukawa Electric Co Ltd:The | 半導体加工用テープ |
| JP4931717B2 (ja) | 2007-07-19 | 2012-05-16 | 信越化学工業株式会社 | リソグラフィー用ペリクルの製造方法 |
| JP5534728B2 (ja) * | 2009-07-15 | 2014-07-02 | 日東電工株式会社 | 透明フィルムおよびその利用 |
| KR101990345B1 (ko) * | 2009-10-02 | 2019-06-18 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 펠리클의 제조 방법 |
| JP4889778B2 (ja) * | 2009-10-02 | 2012-03-07 | 信越化学工業株式会社 | ペリクルの製造方法及びリソグラフィ用ペリクル |
| JP4974389B2 (ja) * | 2009-10-30 | 2012-07-11 | 信越化学工業株式会社 | リソグラフィ用ペリクルフレーム及びリソグラフィ用ペリクル |
| JP2011095586A (ja) * | 2009-10-30 | 2011-05-12 | Shin-Etsu Chemical Co Ltd | ペリクルおよびその製造方法 |
| JP5152870B2 (ja) * | 2009-12-07 | 2013-02-27 | 信越化学工業株式会社 | リソグラフィ用ペリクル及びその製造方法 |
| JP2011253176A (ja) * | 2010-05-07 | 2011-12-15 | Shin Etsu Chem Co Ltd | ペリクル用粘着剤 |
| JP5485083B2 (ja) * | 2010-08-31 | 2014-05-07 | 日東電工株式会社 | 熱硬化型接着テープ又はシート |
| JP2012093518A (ja) * | 2010-10-26 | 2012-05-17 | Asahi Kasei E-Materials Corp | ペリクル |
| JP2012093595A (ja) * | 2010-10-28 | 2012-05-17 | Shin Etsu Chem Co Ltd | ペリクルフレームおよびペリクル |
| JP5478463B2 (ja) * | 2010-11-17 | 2014-04-23 | 信越化学工業株式会社 | リソグラフィー用ペリクル |
-
2013
- 2013-09-24 JP JP2013196840A patent/JP5950467B2/ja active Active
-
2014
- 2014-08-25 US US14/467,256 patent/US9594300B2/en active Active
- 2014-08-25 EP EP14182098.5A patent/EP2860583B1/en active Active
- 2014-09-02 KR KR1020140116061A patent/KR102251928B1/ko active IP Right Grant
- 2014-09-23 TW TW103132695A patent/TWI522730B/zh active
- 2014-09-23 CN CN201410490285.1A patent/CN104460225A/zh active Pending
- 2014-09-23 CN CN202010862483.1A patent/CN111948902A/zh active Pending
-
2015
- 2015-05-04 HK HK15104240.3A patent/HK1203637A1/xx unknown
-
2021
- 2021-05-06 KR KR1020210058393A patent/KR102322399B1/ko active IP Right Grant
Also Published As
| Publication number | Publication date |
|---|---|
| KR102251928B1 (ko) | 2021-05-14 |
| CN104460225A (zh) | 2015-03-25 |
| JP5950467B2 (ja) | 2016-07-13 |
| US20150085265A1 (en) | 2015-03-26 |
| CN111948902A (zh) | 2020-11-17 |
| TWI522730B (zh) | 2016-02-21 |
| EP2860583A3 (en) | 2015-05-20 |
| TW201518858A (zh) | 2015-05-16 |
| EP2860583B1 (en) | 2016-07-13 |
| US9594300B2 (en) | 2017-03-14 |
| KR20150033532A (ko) | 2015-04-01 |
| KR102322399B1 (ko) | 2021-11-05 |
| KR20210056298A (ko) | 2021-05-18 |
| EP2860583A2 (en) | 2015-04-15 |
| JP2015064416A (ja) | 2015-04-09 |
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