HK1190979A1 - 氣體轉化系統 - Google Patents

氣體轉化系統

Info

Publication number
HK1190979A1
HK1190979A1 HK14104079.0A HK14104079A HK1190979A1 HK 1190979 A1 HK1190979 A1 HK 1190979A1 HK 14104079 A HK14104079 A HK 14104079A HK 1190979 A1 HK1190979 A1 HK 1190979A1
Authority
HK
Hong Kong
Prior art keywords
conversion system
gas conversion
gas
conversion
Prior art date
Application number
HK14104079.0A
Other languages
English (en)
Inventor
Toru Tanibata
Jae-Mo Koo
Sang Hun Lee
Original Assignee
雷卡邦股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 雷卡邦股份有限公司 filed Critical 雷卡邦股份有限公司
Publication of HK1190979A1 publication Critical patent/HK1190979A1/zh

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J7/00—Apparatus for generating gases
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/50—Carbon dioxide
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
    • H05H1/4622—Microwave discharges using waveguides

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Organic Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treating Waste Gases (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
HK14104079.0A 2011-06-28 2014-04-29 氣體轉化系統 HK1190979A1 (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161501767P 2011-06-28 2011-06-28
US13/526,653 US8633648B2 (en) 2011-06-28 2012-06-19 Gas conversion system
PCT/US2012/043421 WO2013003164A2 (en) 2011-06-28 2012-06-21 Gas conversion system

Publications (1)

Publication Number Publication Date
HK1190979A1 true HK1190979A1 (zh) 2014-07-18

Family

ID=47389923

Family Applications (1)

Application Number Title Priority Date Filing Date
HK14104079.0A HK1190979A1 (zh) 2011-06-28 2014-04-29 氣體轉化系統

Country Status (9)

Country Link
US (1) US8633648B2 (zh)
EP (1) EP2726195B1 (zh)
JP (2) JP6289365B2 (zh)
KR (1) KR101609576B1 (zh)
CN (1) CN103648635B (zh)
CA (1) CA2838943C (zh)
ES (1) ES2751112T3 (zh)
HK (1) HK1190979A1 (zh)
WO (1) WO2013003164A2 (zh)

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DE102013215252A1 (de) * 2013-08-02 2015-02-05 Eeplasma Gmbh Vorrichtung und Verfahren zur Behandlung von Prozessgasen in einem Plasma angeregt durch elektromagnetische Wellen hoher Frequenz
JP6334947B2 (ja) * 2014-02-20 2018-05-30 愛知電機株式会社 マイクロ波非平衡プラズマによる二酸化炭素の分解方法
MX2016015919A (es) * 2014-06-02 2017-04-10 Phg Energy Llc Dispositivo de limpieza de plasma inducido por microondas y metodo para gas pobre.
US20160048305A1 (en) * 2014-08-14 2016-02-18 Microsoft Corporation Group-Based User Interface Rearrangement
JP6643034B2 (ja) * 2015-10-09 2020-02-12 東京エレクトロン株式会社 プラズマ処理装置
JP6055949B1 (ja) * 2016-04-20 2016-12-27 マイクロ波化学株式会社 処理装置
JP6615134B2 (ja) * 2017-01-30 2019-12-04 日本碍子株式会社 ウエハ支持台
GB201722035D0 (en) * 2017-12-28 2018-02-14 Arcs Energy Ltd Fluid traetment apparatus for an exhaust system and method thereof
US20200312629A1 (en) 2019-03-25 2020-10-01 Recarbon, Inc. Controlling exhaust gas pressure of a plasma reactor for plasma stability
CN110677969A (zh) * 2019-10-24 2020-01-10 上海工程技术大学 一种等离子体射流装置
WO2021183373A1 (en) * 2020-03-13 2021-09-16 Vandermeulen Peter F Methods and systems for medical plasma treatment and generation of plasma activated media
WO2023137470A1 (en) * 2022-01-14 2023-07-20 Recarbon, Inc. Integrated carbon transformation reformer and processes
AT526238B1 (de) * 2022-08-09 2024-01-15 Thermal Proc Solutions Gmbh Vorrichtung zur Bereitstellung eines Plasmas
AT526239B1 (de) * 2022-08-09 2024-01-15 Thermal Proc Solutions Gmbh Vorrichtung zur Bereitstellung eines Plasmas
KR102627141B1 (ko) 2023-07-20 2024-01-23 (주)효진이앤하이 플라즈마 가스 변환 시스템

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FR2579855A1 (fr) 1985-03-28 1986-10-03 Centre Nat Rech Scient Dispositif pour l'excitation par ondes hyperfrequences d'un plasma dans une colonne de gaz, permettant notamment la realisation d'un laser ionique
JPH02279160A (ja) * 1989-03-08 1990-11-15 Abtox Inc プラズマ滅菌方法及び滅菌装置
EP0423498B1 (en) 1989-09-20 1995-08-23 Sumitomo Electric Industries, Ltd. Method of and apparatus for synthesizing hard material
US5131992A (en) * 1990-01-08 1992-07-21 The United States Of America, As Represented By The Secretary Of The Interior Microwave induced plasma process for producing tungsten carbide
JP2973472B2 (ja) 1990-03-08 1999-11-08 ヤマハ株式会社 プラズマｃｖｄ装置
US5262610A (en) * 1991-03-29 1993-11-16 The United States Of America As Represented By The Air Force Low particulate reliability enhanced remote microwave plasma discharge device
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JP2967060B2 (ja) 1997-02-21 1999-10-25 日本高周波株式会社 マイクロ波プラズマ発生装置
FR2762748B1 (fr) 1997-04-25 1999-06-11 Air Liquide Dispositif d'excitation d'un gaz par plasma d'onde de surface
JP2000133494A (ja) 1998-10-23 2000-05-12 Mitsubishi Heavy Ind Ltd マイクロ波プラズマ発生装置及び方法
JP2001244249A (ja) 2000-03-01 2001-09-07 Speedfam Co Ltd 局部エッチング装置の放電管及びテーパ型放電管を用いた局部エッチング装置
US6401653B1 (en) 2000-04-18 2002-06-11 Daihen Corporation Microwave plasma generator
JP2002030920A (ja) * 2000-07-17 2002-01-31 Mitsubishi Motors Corp プラズマ式排気浄化装置
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JP2005260060A (ja) 2004-03-12 2005-09-22 Semiconductor Leading Edge Technologies Inc レジスト除去装置及びレジスト除去方法、並びにそれを用いて製造した半導体装置
JP2005305412A (ja) * 2004-03-25 2005-11-04 Tomoyuki Nakada 内燃機関等の排ガス処理装置
US20070007257A1 (en) * 2005-07-05 2007-01-11 Uhm Han S Microwave plasma burner
JP4777717B2 (ja) * 2005-08-10 2011-09-21 東京エレクトロン株式会社 成膜方法、プラズマ処理装置および記録媒体
US7554053B2 (en) 2005-12-23 2009-06-30 Lam Research Corporation Corrugated plasma trap arrangement for creating a highly efficient downstream microwave plasma system
JP5062658B2 (ja) * 2006-07-28 2012-10-31 東京エレクトロン株式会社 導波管内の定在波測定部および定在波測定方法、電磁波利用装置、プラズマ処理装置およびプラズマ処理方法
JP2008071500A (ja) * 2006-09-12 2008-03-27 Noritsu Koki Co Ltd プラズマ発生装置およびそれを用いるワーク処理装置
TW200829325A (en) * 2007-01-15 2008-07-16 Kanken Techno Co Ltd Apparatus and method for processing gas
US20100254863A1 (en) * 2009-04-06 2010-10-07 Sang Hun Lee Sterilant gas generating system
JP2011029475A (ja) * 2009-07-28 2011-02-10 Shibaura Mechatronics Corp プラズマ処理装置及びプラズマ処理方法
CN101734666B (zh) * 2009-11-24 2012-09-26 中国科学院过程工程研究所 用微波等离子氢化四氯化硅制三氯氢硅和二氯氢硅的方法
US20120235569A1 (en) * 2011-03-18 2012-09-20 Amarante Technologies, Inc/ Nozzle for generating microwave plasma from combustion flame

Also Published As

Publication number Publication date
EP2726195B1 (en) 2019-08-28
ES2751112T3 (es) 2020-03-30
CN103648635B (zh) 2015-04-08
JP6239031B2 (ja) 2017-11-29
EP2726195A4 (en) 2015-01-07
KR20140039037A (ko) 2014-03-31
CA2838943C (en) 2016-07-12
US8633648B2 (en) 2014-01-21
CA2838943A1 (en) 2013-01-03
CN103648635A (zh) 2014-03-19
WO2013003164A3 (en) 2013-04-18
WO2013003164A2 (en) 2013-01-03
JP6289365B2 (ja) 2018-03-07
JP2016182599A (ja) 2016-10-20
EP2726195A2 (en) 2014-05-07
JP2014520663A (ja) 2014-08-25
KR101609576B1 (ko) 2016-04-06
US20130002137A1 (en) 2013-01-03

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