HK1169862A1 - Pattern formation apparatus, pattern formation method, and device manufacturing method - Google Patents
Pattern formation apparatus, pattern formation method, and device manufacturing methodInfo
- Publication number
- HK1169862A1 HK1169862A1 HK12110489.3A HK12110489A HK1169862A1 HK 1169862 A1 HK1169862 A1 HK 1169862A1 HK 12110489 A HK12110489 A HK 12110489A HK 1169862 A1 HK1169862 A1 HK 1169862A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- pattern formation
- device manufacturing
- formation apparatus
- pattern
- formation method
- Prior art date
Links
- 230000007261 regionalization Effects 0.000 title 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US22643309P | 2009-07-17 | 2009-07-17 | |
US12/833,632 US8379186B2 (en) | 2009-07-17 | 2010-07-09 | Pattern formation apparatus, pattern formation method, and device manufacturing method |
PCT/JP2010/062292 WO2011007896A1 (en) | 2009-07-17 | 2010-07-14 | Pattern formation apparatus, pattern formation method, and device manufacturing method |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1169862A1 true HK1169862A1 (en) | 2013-02-08 |
Family
ID=42790610
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK12110489.3A HK1169862A1 (en) | 2009-07-17 | 2012-10-22 | Pattern formation apparatus, pattern formation method, and device manufacturing method |
Country Status (7)
Country | Link |
---|---|
US (1) | US8379186B2 (ko) |
JP (1) | JP5605044B2 (ko) |
KR (1) | KR20120038446A (ko) |
CN (1) | CN102472978B (ko) |
HK (1) | HK1169862A1 (ko) |
TW (1) | TWI522748B (ko) |
WO (1) | WO2011007896A1 (ko) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2095946A1 (en) * | 2008-02-27 | 2009-09-02 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | A system for patterning flexible foils |
US8379186B2 (en) * | 2009-07-17 | 2013-02-19 | Nikon Corporation | Pattern formation apparatus, pattern formation method, and device manufacturing method |
KR101719860B1 (ko) * | 2011-04-25 | 2017-03-24 | 가부시키가이샤 니콘 | 기판처리장치 |
JP6008165B2 (ja) * | 2012-04-04 | 2016-10-19 | 株式会社ニコン | 露光方法及び露光装置、並びにデバイス製造方法 |
JP5752088B2 (ja) * | 2012-06-11 | 2015-07-22 | 株式会社アドテックエンジニアリング | 露光装置 |
KR101243354B1 (ko) * | 2012-12-04 | 2013-03-13 | 주식회사 쓰리디플러스 | 롤투롤 타입의 얼라인먼트 스테이지 장치 |
CN105556391B (zh) * | 2013-07-08 | 2018-06-29 | 株式会社尼康 | 基板处理装置、器件制造系统、器件制造方法及图案形成装置 |
JP6286024B2 (ja) * | 2014-03-07 | 2018-02-28 | 富士フイルム株式会社 | トランジスタの製造方法 |
JP6311450B2 (ja) * | 2014-05-23 | 2018-04-18 | 株式会社ニコン | 搬送装置 |
JP6746092B2 (ja) * | 2015-03-31 | 2020-08-26 | 株式会社ニコン | 露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法 |
CN106406032B (zh) * | 2015-07-29 | 2018-03-30 | 上海微电子装备(集团)股份有限公司 | 一种重载基板台的六自由度调整装置 |
CN105739235A (zh) * | 2016-03-23 | 2016-07-06 | 常州鸿开电子科技有限公司 | 掩膜板检测用带背光多功能吸盘装置 |
US10295911B2 (en) * | 2016-05-19 | 2019-05-21 | Nikon Corporation | Extreme ultraviolet lithography system that utilizes pattern stitching |
US11099483B2 (en) | 2016-05-19 | 2021-08-24 | Nikon Corporation | Euv lithography system for dense line patterning |
US11067900B2 (en) | 2016-05-19 | 2021-07-20 | Nikon Corporation | Dense line extreme ultraviolet lithography system with distortion matching |
US10712671B2 (en) | 2016-05-19 | 2020-07-14 | Nikon Corporation | Dense line extreme ultraviolet lithography system with distortion matching |
WO2018013270A1 (en) * | 2016-07-13 | 2018-01-18 | Applied Materials, Inc. | Micro led array as illumination source |
US10908507B2 (en) * | 2016-07-13 | 2021-02-02 | Applied Materials, Inc. | Micro LED array illumination source |
US11934105B2 (en) | 2017-04-19 | 2024-03-19 | Nikon Corporation | Optical objective for operation in EUV spectral region |
US11054745B2 (en) | 2017-04-26 | 2021-07-06 | Nikon Corporation | Illumination system with flat 1D-patterned mask for use in EUV-exposure tool |
US11300884B2 (en) | 2017-05-11 | 2022-04-12 | Nikon Corporation | Illumination system with curved 1d-patterned mask for use in EUV-exposure tool |
JP6516030B2 (ja) * | 2018-03-05 | 2019-05-22 | 株式会社ニコン | パターン形成方法 |
CN113167998A (zh) * | 2018-11-14 | 2021-07-23 | 11093606加拿大有限公司 | 空间调制装置 |
WO2020100446A1 (ja) | 2018-11-15 | 2020-05-22 | インスペック株式会社 | キャリブレーションシステム及び描画装置 |
CN109856925B (zh) * | 2019-03-22 | 2020-01-24 | 上海微电子装备(集团)股份有限公司 | 双工件台柔性卷带曝光装置及曝光方法 |
CN112697805B (zh) * | 2021-01-10 | 2024-07-05 | 内蒙古工业大学 | 一种织物疵点智能检测装置 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5196745A (en) | 1991-08-16 | 1993-03-23 | Massachusetts Institute Of Technology | Magnetic positioning device |
US5652645A (en) | 1995-07-24 | 1997-07-29 | Anvik Corporation | High-throughput, high-resolution, projection patterning system for large, flexible, roll-fed, electronic-module substrates |
JP3417313B2 (ja) | 1998-09-28 | 2003-06-16 | ウシオ電機株式会社 | 帯状ワークの露光装置 |
JP2001215718A (ja) | 1999-11-26 | 2001-08-10 | Nikon Corp | 露光装置及び露光方法 |
TW529172B (en) | 2001-07-24 | 2003-04-21 | Asml Netherlands Bv | Imaging apparatus |
US6665054B2 (en) | 2001-10-22 | 2003-12-16 | Nikon Corporation | Two stage method |
JP4218418B2 (ja) * | 2003-05-23 | 2009-02-04 | ウシオ電機株式会社 | 帯状ワークの両面投影露光装置 |
JP4238078B2 (ja) * | 2003-07-03 | 2009-03-11 | 富士フイルム株式会社 | 画像形成装置 |
JP2006098718A (ja) | 2004-09-29 | 2006-04-13 | Fuji Photo Film Co Ltd | 描画装置 |
JP2006102991A (ja) * | 2004-09-30 | 2006-04-20 | Fuji Photo Film Co Ltd | 画像記録装置及び画像記録方法 |
JP4491311B2 (ja) * | 2004-09-30 | 2010-06-30 | 富士フイルム株式会社 | 画像記録装置及び画像記録方法 |
JP2007294594A (ja) * | 2006-04-24 | 2007-11-08 | Nsk Ltd | 露光装置及び露光方法 |
US8130364B2 (en) | 2007-01-04 | 2012-03-06 | Nikon Corporation | Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method |
JP5487981B2 (ja) * | 2009-01-30 | 2014-05-14 | 株式会社ニコン | 露光方法及び装置、並びにデバイス製造方法 |
US8541163B2 (en) * | 2009-06-05 | 2013-09-24 | Nikon Corporation | Transporting method, transporting apparatus, exposure method, and exposure apparatus |
US8379186B2 (en) * | 2009-07-17 | 2013-02-19 | Nikon Corporation | Pattern formation apparatus, pattern formation method, and device manufacturing method |
US8235695B2 (en) * | 2009-07-17 | 2012-08-07 | Nikon Corporation | Pattern forming device, pattern forming method, and device manufacturing method |
JP5630113B2 (ja) * | 2009-07-17 | 2014-11-26 | 株式会社ニコン | パターン形成装置及びパターン形成方法、並びにデバイス製造方法 |
JP2011164430A (ja) * | 2010-02-10 | 2011-08-25 | Nikon Corp | 露光方法及び装置、並びにデバイス製造方法 |
-
2010
- 2010-07-09 US US12/833,632 patent/US8379186B2/en active Active
- 2010-07-14 KR KR1020127001313A patent/KR20120038446A/ko not_active Application Discontinuation
- 2010-07-14 CN CN201080032017.5A patent/CN102472978B/zh active Active
- 2010-07-14 WO PCT/JP2010/062292 patent/WO2011007896A1/en active Application Filing
- 2010-07-16 JP JP2010161276A patent/JP5605044B2/ja active Active
- 2010-07-16 TW TW099123396A patent/TWI522748B/zh active
-
2012
- 2012-10-22 HK HK12110489.3A patent/HK1169862A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP2011022583A (ja) | 2011-02-03 |
WO2011007896A1 (en) | 2011-01-20 |
TW201116943A (en) | 2011-05-16 |
CN102472978B (zh) | 2015-06-24 |
TWI522748B (zh) | 2016-02-21 |
US8379186B2 (en) | 2013-02-19 |
CN102472978A (zh) | 2012-05-23 |
JP5605044B2 (ja) | 2014-10-15 |
US20110013162A1 (en) | 2011-01-20 |
KR20120038446A (ko) | 2012-04-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20200714 |