HK1169862A1 - Pattern formation apparatus, pattern formation method, and device manufacturing method - Google Patents

Pattern formation apparatus, pattern formation method, and device manufacturing method

Info

Publication number
HK1169862A1
HK1169862A1 HK12110489.3A HK12110489A HK1169862A1 HK 1169862 A1 HK1169862 A1 HK 1169862A1 HK 12110489 A HK12110489 A HK 12110489A HK 1169862 A1 HK1169862 A1 HK 1169862A1
Authority
HK
Hong Kong
Prior art keywords
pattern formation
device manufacturing
formation apparatus
pattern
formation method
Prior art date
Application number
HK12110489.3A
Other languages
English (en)
Chinese (zh)
Inventor
木內徹
水谷英夫
Original Assignee
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式會社尼康 filed Critical 株式會社尼康
Publication of HK1169862A1 publication Critical patent/HK1169862A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
HK12110489.3A 2009-07-17 2012-10-22 Pattern formation apparatus, pattern formation method, and device manufacturing method HK1169862A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US22643309P 2009-07-17 2009-07-17
US12/833,632 US8379186B2 (en) 2009-07-17 2010-07-09 Pattern formation apparatus, pattern formation method, and device manufacturing method
PCT/JP2010/062292 WO2011007896A1 (en) 2009-07-17 2010-07-14 Pattern formation apparatus, pattern formation method, and device manufacturing method

Publications (1)

Publication Number Publication Date
HK1169862A1 true HK1169862A1 (en) 2013-02-08

Family

ID=42790610

Family Applications (1)

Application Number Title Priority Date Filing Date
HK12110489.3A HK1169862A1 (en) 2009-07-17 2012-10-22 Pattern formation apparatus, pattern formation method, and device manufacturing method

Country Status (7)

Country Link
US (1) US8379186B2 (xx)
JP (1) JP5605044B2 (xx)
KR (1) KR20120038446A (xx)
CN (1) CN102472978B (xx)
HK (1) HK1169862A1 (xx)
TW (1) TWI522748B (xx)
WO (1) WO2011007896A1 (xx)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2095946A1 (en) * 2008-02-27 2009-09-02 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO A system for patterning flexible foils
US8379186B2 (en) * 2009-07-17 2013-02-19 Nikon Corporation Pattern formation apparatus, pattern formation method, and device manufacturing method
WO2012147658A1 (ja) * 2011-04-25 2012-11-01 株式会社ニコン 基板処理装置
JP6008165B2 (ja) * 2012-04-04 2016-10-19 株式会社ニコン 露光方法及び露光装置、並びにデバイス製造方法
JP5752088B2 (ja) * 2012-06-11 2015-07-22 株式会社アドテックエンジニアリング 露光装置
KR101243354B1 (ko) * 2012-12-04 2013-03-13 주식회사 쓰리디플러스 롤투롤 타입의 얼라인먼트 스테이지 장치
KR102007627B1 (ko) * 2013-07-08 2019-08-05 가부시키가이샤 니콘 기판 처리 장치, 디바이스 제조 시스템, 디바이스 제조 방법, 및 패턴 형성 장치
WO2015133391A1 (ja) * 2014-03-07 2015-09-11 富士フイルム株式会社 トランジスタの製造方法
JP6311450B2 (ja) * 2014-05-23 2018-04-18 株式会社ニコン 搬送装置
JP6746092B2 (ja) * 2015-03-31 2020-08-26 株式会社ニコン 露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
CN106406032B (zh) * 2015-07-29 2018-03-30 上海微电子装备（集团）股份有限公司 一种重载基板台的六自由度调整装置
CN105739235A (zh) * 2016-03-23 2016-07-06 常州鸿开电子科技有限公司 掩膜板检测用带背光多功能吸盘装置
US11067900B2 (en) 2016-05-19 2021-07-20 Nikon Corporation Dense line extreme ultraviolet lithography system with distortion matching
US11099483B2 (en) 2016-05-19 2021-08-24 Nikon Corporation Euv lithography system for dense line patterning
US10712671B2 (en) 2016-05-19 2020-07-14 Nikon Corporation Dense line extreme ultraviolet lithography system with distortion matching
US10295911B2 (en) * 2016-05-19 2019-05-21 Nikon Corporation Extreme ultraviolet lithography system that utilizes pattern stitching
JP6655753B2 (ja) * 2016-07-13 2020-02-26 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 照明源としてのマイクロｌｅｄアレイ
US10908507B2 (en) * 2016-07-13 2021-02-02 Applied Materials, Inc. Micro LED array illumination source
US11934105B2 (en) 2017-04-19 2024-03-19 Nikon Corporation Optical objective for operation in EUV spectral region
US11054745B2 (en) 2017-04-26 2021-07-06 Nikon Corporation Illumination system with flat 1D-patterned mask for use in EUV-exposure tool
US11300884B2 (en) 2017-05-11 2022-04-12 Nikon Corporation Illumination system with curved 1d-patterned mask for use in EUV-exposure tool
JP6516030B2 (ja) * 2018-03-05 2019-05-22 株式会社ニコン パターン形成方法
JP2022512980A (ja) * 2018-11-14 2022-02-07 １１０９３６０６ カナダ エルティーディー． 空間変調装置
US20220004109A1 (en) 2018-11-15 2022-01-06 Inspec Inc. Calibration system and drawing device
CN109856925B (zh) * 2019-03-22 2020-01-24 上海微电子装备（集团）股份有限公司 双工件台柔性卷带曝光装置及曝光方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5196745A (en) * 1991-08-16 1993-03-23 Massachusetts Institute Of Technology Magnetic positioning device
US5652645A (en) * 1995-07-24 1997-07-29 Anvik Corporation High-throughput, high-resolution, projection patterning system for large, flexible, roll-fed, electronic-module substrates
JP3417313B2 (ja) * 1998-09-28 2003-06-16 ウシオ電機株式会社 帯状ワークの露光装置
JP2001215718A (ja) * 1999-11-26 2001-08-10 Nikon Corp 露光装置及び露光方法
TW529172B (en) * 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
US6665054B2 (en) * 2001-10-22 2003-12-16 Nikon Corporation Two stage method
JP4218418B2 (ja) * 2003-05-23 2009-02-04 ウシオ電機株式会社 帯状ワークの両面投影露光装置
JP4238078B2 (ja) * 2003-07-03 2009-03-11 富士フイルム株式会社 画像形成装置
JP2006098718A (ja) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 描画装置
JP4491311B2 (ja) * 2004-09-30 2010-06-30 富士フイルム株式会社 画像記録装置及び画像記録方法
JP2006102991A (ja) * 2004-09-30 2006-04-20 Fuji Photo Film Co Ltd 画像記録装置及び画像記録方法
JP2007294594A (ja) * 2006-04-24 2007-11-08 Nsk Ltd 露光装置及び露光方法
US8130364B2 (en) * 2007-01-04 2012-03-06 Nikon Corporation Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
JP5487981B2 (ja) * 2009-01-30 2014-05-14 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
US8541163B2 (en) * 2009-06-05 2013-09-24 Nikon Corporation Transporting method, transporting apparatus, exposure method, and exposure apparatus
US8379186B2 (en) 2009-07-17 2013-02-19 Nikon Corporation Pattern formation apparatus, pattern formation method, and device manufacturing method
US8235695B2 (en) * 2009-07-17 2012-08-07 Nikon Corporation Pattern forming device, pattern forming method, and device manufacturing method
JP5630113B2 (ja) * 2009-07-17 2014-11-26 株式会社ニコン パターン形成装置及びパターン形成方法、並びにデバイス製造方法
JP2011164430A (ja) * 2010-02-10 2011-08-25 Nikon Corp 露光方法及び装置、並びにデバイス製造方法

Also Published As

Publication number Publication date
TWI522748B (zh) 2016-02-21
CN102472978A (zh) 2012-05-23
JP2011022583A (ja) 2011-02-03
WO2011007896A1 (en) 2011-01-20
US8379186B2 (en) 2013-02-19
CN102472978B (zh) 2015-06-24
US20110013162A1 (en) 2011-01-20
JP5605044B2 (ja) 2014-10-15
KR20120038446A (ko) 2012-04-23
TW201116943A (en) 2011-05-16

Similar Documents

Publication Publication Date Title
HK1169862A1 (en) Pattern formation apparatus, pattern formation method, and device manufacturing method
HK1215733A1 (zh) 曝光方法、曝光裝置以及器件製造方法
HK1206436A1 (en) Exposure apparatus, exposure method, and device manufacturing method
HK1170028A1 (en) Pattern forming device, pattern forming method, and device manufacturing method
GB0813241D0 (en) Manufacturing apparatus and method
EP2343730A4 (en) METHOD OF FORMING CONCAVER AND CONVEX PATTERN AND DEVICE FOR FORMING CONCAVER AND CONVEX PATTERN
IL225971A0 (en) Metrological method and system and method for producing a standard
GB2467143B (en) Wireless commication method and apparatus
HK1181124A1 (en) Exposure apparatus, exposure method, and device manufacturing method
EP2500399A4 (en) BETA-SIALON, METHOD FOR ITS MANUFACTURE AND LIGHT-EMITTING DEVICE THEREFOR
EP2400706A4 (en) METHOD FOR CREATING SEQUENCES AND ASSOCIATED APPARATUS
EP2498536A4 (en) COMMUNICATION APPARATUS AND COMMUNICATION METHOD
EP2405490A4 (en) LIGHT EMITTING DEVICE, LIGHT EMITTING UNIT AND METHOD FOR PRODUCING A LIGHT EMITTING DEVICE
IL220933A (en) Lithographic system and method for device production
EP2511788A4 (en) LOCKING DEVICE, ELECTRONIC APPARATUS, AND LATCHING METHOD
HK1155821A1 (en) Exposure apparatus, exposure method, and device manufacturing method
HK1150888A1 (en) Exposure apparatus, exposure method, and device manufacturing method
GB0901034D0 (en) Apparatus and method
EP2395544A4 (en) METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
HK1169492A1 (en) Exposure apparatus, exposure method and device manufacturing method
IL210832A0 (en) Lithographic apparatus and device manufacturing method
EP2450419A4 (en) IRON KOKS MANUFACTURING METHOD AND MANUFACTURER
EP2515150A4 (en) LATERAL EMITTER AND MANUFACTURING METHOD THEREFOR
IL210697A0 (en) Lithographic apparatus and device manufacturing method
EP2461438A4 (en) DEVICE AND METHOD FOR PRODUCING SPARK PLUGS

Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20200714