HK1164905A1 - (meth)acrylate polymers and the use thereof as polymer-bound uv initiators or additive to uv-curable resins () uv uv - Google Patents
(meth)acrylate polymers and the use thereof as polymer-bound uv initiators or additive to uv-curable resins () uv uvInfo
- Publication number
- HK1164905A1 HK1164905A1 HK12105574.9A HK12105574A HK1164905A1 HK 1164905 A1 HK1164905 A1 HK 1164905A1 HK 12105574 A HK12105574 A HK 12105574A HK 1164905 A1 HK1164905 A1 HK 1164905A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- initiators
- meth
- additive
- bound
- polymer
- Prior art date
Links
- 239000000654 additive Substances 0.000 title 1
- 230000000996 additive effect Effects 0.000 title 1
- 239000003999 initiator Substances 0.000 title 1
- 229920000058 polyacrylate Polymers 0.000 title 1
- 229920000642 polymer Polymers 0.000 title 1
- 229920005989 resin Polymers 0.000 title 1
- 239000011347 resin Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/12—Esters of monohydric alcohols or phenols
- C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F20/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/12—Polymerisation in non-solvents
- C08F2/16—Aqueous medium
- C08F2/18—Suspension polymerisation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F20/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
- C08F220/302—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and two or more oxygen atoms in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09D133/10—Homopolymers or copolymers of methacrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102009001775A DE102009001775A1 (de) | 2009-03-24 | 2009-03-24 | (Meth)acrylatpolymere und deren Verwendung als polymergebundene UV-Initiatoren oder Zusatz zu UV-härtbaren Harzen |
PCT/EP2010/052384 WO2010108752A1 (de) | 2009-03-24 | 2010-02-25 | (meth)acrylatpolymere und deren verwendung als polymergebundene uv-initiatoren oder zusatz zu uv-härtbaren harzen |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1164905A1 true HK1164905A1 (en) | 2012-09-28 |
Family
ID=42651445
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK12105574.9A HK1164905A1 (en) | 2009-03-24 | 2012-06-07 | (meth)acrylate polymers and the use thereof as polymer-bound uv initiators or additive to uv-curable resins () uv uv |
Country Status (10)
Country | Link |
---|---|
US (1) | US20120010317A1 (es) |
EP (1) | EP2411426B1 (es) |
JP (1) | JP5901515B2 (es) |
KR (1) | KR20110139234A (es) |
CN (1) | CN102361893B (es) |
DE (1) | DE102009001775A1 (es) |
HK (1) | HK1164905A1 (es) |
RU (1) | RU2553661C2 (es) |
TW (1) | TWI478947B (es) |
WO (1) | WO2010108752A1 (es) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG186778A1 (en) * | 2010-06-22 | 2013-02-28 | Coloplast As | Hydrophilic gels derived from grafted photoinitiators |
WO2012145857A1 (en) * | 2011-04-25 | 2012-11-01 | Evonik Röhm Gmbh | Aqueous dispersion of preferably benzophenone-containing (meth)acrylate polymers for leather coating |
EP2763707B1 (en) | 2011-10-03 | 2018-03-28 | Hyalex Orthopaedics, Inc. | Polymeric adhesive for anchoring compliant materials to another surface |
CN103087234A (zh) * | 2011-11-08 | 2013-05-08 | 广州市博兴化工科技有限公司 | 具有光引发活性端基的丙烯酸酯官能性聚合物及其制备方法 |
BE1020472A5 (nl) * | 2012-03-16 | 2013-11-05 | Arets Graphics | Verbeterde deklagen en werkwijze om deklagen te maken. |
WO2013170858A1 (en) * | 2012-05-16 | 2013-11-21 | Coloplast A/S | Novel polymeric photoinitiators and photoinitiator monomers |
DE102012216170A1 (de) * | 2012-09-12 | 2014-03-13 | Basf Se | Photoreaktives Polymer |
US9034938B2 (en) * | 2012-09-12 | 2015-05-19 | Basf Se | Photoreactive polymer |
TWI585144B (zh) * | 2014-10-21 | 2017-06-01 | Mitsubishi Rayon Co | (Meth) acrylic resin composition and a resin molded product |
CN110229253B (zh) | 2015-01-05 | 2021-11-02 | Igm集团公司 | Led可固化的低迁移性光引发剂 |
JP6791615B2 (ja) * | 2015-03-06 | 2020-11-25 | スリーエム イノベイティブ プロパティズ カンパニー | 紫外線架橋性組成物 |
JP6985148B2 (ja) | 2015-03-20 | 2021-12-22 | ヘンケル アイピー アンド ホールディング ゲゼルシャフト ミット ベシュレンクテル ハフツング | 紫外線硬化性感圧接着剤に使用するための重合性または重合可能な光開始剤 |
MX2019001725A (es) * | 2016-08-12 | 2019-07-04 | Dow Global Technologies Llc | Composiciones adhesivas sensibles a la presion a base de agua y metodos para elaborarlas. |
JP7225530B2 (ja) * | 2017-10-30 | 2023-02-21 | 株式会社レゾナック | 無溶剤型樹脂組成物 |
CN114855295B (zh) * | 2021-01-20 | 2024-04-05 | 东华大学 | 一种纺丝原液、耐热抗蠕变纤维及其制备方法 |
CN114854114A (zh) * | 2021-01-20 | 2022-08-05 | 东华大学 | 一种交联聚烯烃及其制备方法 |
CN112851845B (zh) * | 2021-01-20 | 2022-04-29 | 东华大学 | 一种共聚高分子光引发剂及其制备方法 |
CN113336882B (zh) * | 2021-05-24 | 2022-11-04 | 博立尔化工(扬州)有限公司 | 一种采用间歇式本体聚合法制备窄分子量分布的pmma树脂的工艺 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3429852A (en) * | 1967-03-30 | 1969-02-25 | Nat Starch Chem Corp | Ethylenically unsaturated derivatives of benzophenone and crosslinkable polymers thereof |
US4737559A (en) * | 1986-05-19 | 1988-04-12 | Minnesota Mining And Manufacturing Co. | Pressure-sensitive adhesive crosslinked by copolymerizable aromatic ketone monomers |
DE3820464A1 (de) * | 1988-06-16 | 1990-02-08 | Basf Ag | Neue benzophenonderivate und deren herstellung |
DE3914374A1 (de) * | 1989-04-29 | 1990-10-31 | Basf Ag | Durch ultraviolette strahlung unter luftsauerstoffatmosphaere vernetzbare copolymerisate |
DE4007318A1 (de) * | 1990-03-08 | 1991-09-12 | Basf Ag | Ethylenisch ungesaettigte verbindungen |
DE4037079A1 (de) * | 1990-11-22 | 1992-05-27 | Basf Ag | Ungesaettigte phenonderivate und ihre verwendung als haftklebstoffe |
JP3019229B2 (ja) * | 1991-10-24 | 2000-03-13 | 根上工業株式会社 | 記録材料 |
FR2697530B1 (fr) * | 1992-11-04 | 1994-12-16 | Rhone Poulenc Chimie | Liant pour peinture à base de latex acrylique ou styrène/acrylate. |
AU6612796A (en) * | 1995-07-19 | 1997-02-18 | Ciba Specialty Chemicals Holding Inc. | Heterogeneous photo-initiators, photopolymerisable compositions and their use |
DE19600147A1 (de) * | 1996-01-04 | 1997-07-10 | Basf Lacke & Farben | Verfahren zur Lackierung von Gegenständen unter Verwendung strahlungshärtbarer Pulverlacke |
US5900472A (en) | 1996-12-23 | 1999-05-04 | Sartomer Technology | Copolymerizable benzophenone photoinitiators |
JPH10279859A (ja) * | 1997-04-07 | 1998-10-20 | Seiko Epson Corp | 耐光性に優れた画像を実現するインク組成物 |
EP1388545B1 (en) * | 1998-03-12 | 2007-06-27 | Lucite International UK Limited | Polymer composition |
US6340719B1 (en) * | 1999-12-29 | 2002-01-22 | 3M-Innovative Properties Company | Crosslinking process |
JP2002363226A (ja) * | 2001-06-04 | 2002-12-18 | Ipposha Oil Ind Co Ltd | 繊維用高分子紫外線吸収剤及びそれを含む難燃アクリル系繊維 |
JP2003040937A (ja) * | 2001-07-27 | 2003-02-13 | Ipposha Oil Ind Co Ltd | 高分子光安定剤 |
DE10158420A1 (de) * | 2001-11-29 | 2003-06-12 | Basf Ag | Glycidyl(meth)acrylat enthaltende Klebstoff |
MXPA05006547A (es) * | 2002-12-20 | 2005-08-16 | Ciba Sc Holding Ag | Metodo para formar recubrimientos reactivos. |
JP4265775B2 (ja) * | 2004-02-13 | 2009-05-20 | 一方社油脂工業株式会社 | 光学フィルム用添加剤、それを含む光学フィルム、それを用いた偏光板及び液晶表示装置 |
DE102004037929A1 (de) * | 2004-08-04 | 2006-03-16 | Rohmax Additives Gmbh | Verfahren zur radikalischen Polymerisation ethylenisch-ungesättigter Verbindungen |
US7745505B2 (en) * | 2004-12-29 | 2010-06-29 | Henkel Ag & Co. Kgaa | Photoinitiators and UV-crosslinkable acrylic polymers for pressure sensitive adhesives |
JP4814551B2 (ja) * | 2005-06-07 | 2011-11-16 | 株式会社リコー | 感熱性粘着剤及び粘着材料 |
JP2007047756A (ja) * | 2005-07-12 | 2007-02-22 | Fujifilm Electronic Materials Co Ltd | 光硬化性組成物、カラーフィルタ及びその製造方法 |
ES2376773T3 (es) * | 2006-10-27 | 2012-03-16 | Basf Se | Mezcla endurecible por radiación, que contiene compuestos de bajo peso molecular, con insaturación etilénica, con sistemas cíclicos no aromáticos |
JP2010209183A (ja) * | 2009-03-09 | 2010-09-24 | Fujifilm Corp | インク組成物及びインクジェット記録方法 |
-
2009
- 2009-03-24 DE DE102009001775A patent/DE102009001775A1/de not_active Withdrawn
-
2010
- 2010-02-25 WO PCT/EP2010/052384 patent/WO2010108752A1/de active Application Filing
- 2010-02-25 US US13/203,993 patent/US20120010317A1/en not_active Abandoned
- 2010-02-25 JP JP2012501217A patent/JP5901515B2/ja not_active Expired - Fee Related
- 2010-02-25 CN CN201080012598.6A patent/CN102361893B/zh not_active Expired - Fee Related
- 2010-02-25 EP EP10705371.2A patent/EP2411426B1/de not_active Not-in-force
- 2010-02-25 RU RU2011142635/04A patent/RU2553661C2/ru not_active IP Right Cessation
- 2010-02-25 KR KR1020117022237A patent/KR20110139234A/ko not_active Application Discontinuation
- 2010-03-19 TW TW099108188A patent/TWI478947B/zh not_active IP Right Cessation
-
2012
- 2012-06-07 HK HK12105574.9A patent/HK1164905A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP2411426B1 (de) | 2016-08-17 |
RU2011142635A (ru) | 2013-04-27 |
WO2010108752A1 (de) | 2010-09-30 |
US20120010317A1 (en) | 2012-01-12 |
KR20110139234A (ko) | 2011-12-28 |
JP2012521453A (ja) | 2012-09-13 |
JP5901515B2 (ja) | 2016-04-13 |
CN102361893B (zh) | 2015-06-17 |
CN102361893A (zh) | 2012-02-22 |
DE102009001775A1 (de) | 2010-09-30 |
RU2553661C2 (ru) | 2015-06-20 |
TW201105685A (en) | 2011-02-16 |
TWI478947B (zh) | 2015-04-01 |
EP2411426A1 (de) | 2012-02-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20190225 |