HK1118529A1 - Improved process and apparatus for preparing trichlorosilane and polycrystalline silicon - Google Patents

Improved process and apparatus for preparing trichlorosilane and polycrystalline silicon

Info

Publication number
HK1118529A1
HK1118529A1 HK08109592.5A HK08109592A HK1118529A1 HK 1118529 A1 HK1118529 A1 HK 1118529A1 HK 08109592 A HK08109592 A HK 08109592A HK 1118529 A1 HK1118529 A1 HK 1118529A1
Authority
HK
Hong Kong
Prior art keywords
polycrystalline silicon
improved process
preparing trichlorosilane
trichlorosilane
preparing
Prior art date
Application number
HK08109592.5A
Other languages
English (en)
Inventor
Chen Weiping
Original Assignee
Xuzhou Southeast Polysilicon R D
Hualu Engineering & Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=39206479&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=HK1118529(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Xuzhou Southeast Polysilicon R D, Hualu Engineering & Technology filed Critical Xuzhou Southeast Polysilicon R D
Publication of HK1118529A1 publication Critical patent/HK1118529A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
    • C01B33/10763—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane from silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/03—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/037—Purification
    • C01B33/039—Purification by conversion of the silicon into a compound, optional purification of the compound, and reconversion into silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/10—Process efficiency
    • Y02P20/129—Energy recovery, e.g. by cogeneration, H2recovery or pressure recovery turbines
HK08109592.5A 2007-08-08 2008-08-28 Improved process and apparatus for preparing trichlorosilane and polycrystalline silicon HK1118529A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2007101435227A CN101143723B (zh) 2007-08-08 2007-08-08 制备三氯氢硅和多晶硅的改进方法和装置

Publications (1)

Publication Number Publication Date
HK1118529A1 true HK1118529A1 (en) 2009-02-13

Family

ID=39206479

Family Applications (1)

Application Number Title Priority Date Filing Date
HK08109592.5A HK1118529A1 (en) 2007-08-08 2008-08-28 Improved process and apparatus for preparing trichlorosilane and polycrystalline silicon

Country Status (4)

Country Link
EP (1) EP2179965A1 (zh)
CN (1) CN101143723B (zh)
HK (1) HK1118529A1 (zh)
WO (1) WO2009018713A1 (zh)

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CN101143723B (zh) * 2007-08-08 2010-09-01 徐州东南多晶硅材料研发有限公司 制备三氯氢硅和多晶硅的改进方法和装置
CN101279734B (zh) * 2008-05-30 2010-06-02 广州吉必盛科技实业有限公司 合成多晶硅原料三氯氢硅的方法
DE102008002537A1 (de) * 2008-06-19 2009-12-24 Evonik Degussa Gmbh Verfahren zur Entfernung von Bor enthaltenden Verunreinigungen aus Halogensilanen sowie Anlage zur Durchführung des Verfahrens
CN101941703B (zh) * 2010-09-08 2012-07-18 洛阳晶辉新能源科技有限公司 一种生产三氯氢硅的方法
RU2440293C1 (ru) * 2010-09-09 2012-01-20 Закрытое акционерное общество "ЭЛЛИНА-НТ" Способ получения высокочистого трихлорсилана
CN103228351B (zh) * 2010-09-27 2019-09-24 Gtat公司 加热装置及与其相关的方法
CN101966993B (zh) * 2010-09-30 2012-03-14 河南尚宇新能源股份有限公司 一种三氯氢硅生产过程中废硅粉的回收利用方法
US20120107216A1 (en) * 2010-10-27 2012-05-03 Gt Solar Incorporated Hydrochlorination heater and related methods therefor
US8715597B2 (en) 2010-12-20 2014-05-06 Memc Electronic Materials, Inc. Production of polycrystalline silicon in substantially closed-loop systems that involve disproportionation operations
DE102011002749A1 (de) * 2011-01-17 2012-07-19 Wacker Chemie Ag Verfahren und Vorrichtung zur Konvertierung von Siliciumtetrachlorid in Trichlorsilan
CN102502649B (zh) * 2011-09-28 2014-05-14 陆飞飞 多晶硅生产过程中的带旋流板的传热传质装置
CN103055867B (zh) * 2011-10-21 2015-04-29 中国石油化工股份有限公司 一种镍催化剂、制备方法及其应用
CN103170206A (zh) * 2011-12-20 2013-06-26 西安航天远征流体控制股份有限公司 文丘里洗涤器除去冷氢化工艺反应气中的硅粉方法
CN103170200A (zh) * 2011-12-20 2013-06-26 西安航天远征流体控制股份有限公司 冷氢化湿法除尘单元
KR20140136985A (ko) * 2012-03-14 2014-12-01 센트로섬 포토볼타익스 유에스에이, 인크. 트리클로로실란의 제조
CN102815709B (zh) * 2012-08-10 2014-08-06 中国恩菲工程技术有限公司 一种四氯化硅冷氢化制备三氯氢硅的方法
CN102849740B (zh) * 2012-08-23 2015-04-29 内蒙古盾安光伏科技有限公司 一种多晶硅生产工艺
CN102786056B (zh) * 2012-09-03 2014-02-12 内蒙古盾安光伏科技有限公司 多晶硅还原生产装置及方法
CN102974569B (zh) * 2012-11-14 2015-06-03 内蒙古盾安光伏科技有限公司 冷氢化电加热器在线清洗方法及清洗装置
EP2969948A1 (en) * 2013-03-13 2016-01-20 SiTec GmbH Temperature management in chlorination processes and systems related thereto
DE102013210039A1 (de) * 2013-05-29 2014-12-04 Wacker Chemie Ag Verfahren zur Herstellung von granularem Polysilicium
US9352971B2 (en) 2013-06-14 2016-05-31 Rec Silicon Inc Method and apparatus for production of silane and hydrohalosilanes
CN103382032A (zh) * 2013-06-26 2013-11-06 内蒙古同远企业管理咨询有限责任公司 一种四氯化硅制备三氯氢硅的方法
KR101616043B1 (ko) 2014-07-22 2016-04-27 한화케미칼 주식회사 삼염화실란의 제조방법
CN104512895B (zh) * 2014-12-31 2017-01-11 沁阳国顺硅源光电气体有限公司 生产电子级高纯二氯二氢硅及硅烷的装置
CN106554017A (zh) * 2015-09-28 2017-04-05 新特能源股份有限公司 一种提升生产多晶硅内在品质的方法
CN108069428B (zh) * 2016-11-18 2023-10-10 江苏中能硅业科技发展有限公司 用于处理多晶硅副产渣浆的装置和工艺
CN107416840A (zh) * 2017-06-26 2017-12-01 张兆民 一种多晶硅料提纯方法
CN107162003A (zh) * 2017-06-30 2017-09-15 于志远 一种四氯化硅氢化工艺和三氯氢硅制备高纯硅工艺
CN110563753B (zh) * 2019-08-05 2022-04-26 潜江宜生新材料有限公司 一种甲基三氯硅烷的光氯化反应系统
CN110950342A (zh) * 2019-11-29 2020-04-03 天华化工机械及自动化研究设计院有限公司 一种多晶硅渣浆无水化处理工艺
CN110817884A (zh) * 2019-12-10 2020-02-21 唐山三孚硅业股份有限公司 一种高转化率的四氯化硅合成炉
CN113044848B (zh) * 2019-12-27 2023-03-28 亚洲硅业(青海)股份有限公司 多晶硅尾气处理回收系统及方法
CN112390257B (zh) * 2020-11-19 2021-09-21 江苏鑫华半导体材料科技有限公司 电子级多晶硅生产系统和方法
CN115215344B (zh) * 2021-04-15 2023-10-27 新疆硅基新材料创新中心有限公司 一种三氯氢硅的制备方法及制备装置
CN113387362B (zh) * 2021-05-08 2022-11-29 内蒙古新特硅材料有限公司 改进的冷氢化合成三氯氢硅的方法及装置
CN115092934A (zh) * 2022-06-21 2022-09-23 云南通威高纯晶硅有限公司 一种控制精制三氯氢硅中二氯氢硅含量的方法及系统
CN116395702A (zh) * 2023-03-24 2023-07-07 四川纳毕硅基材料科技有限公司 一种短流程制备高纯四氯化硅和多晶硅的装置及方法
CN116332189A (zh) * 2023-03-30 2023-06-27 北京市弘洁蓝天科技股份有限公司 一种四氯化硅处置方法及系统

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JPS5673617A (en) * 1979-11-17 1981-06-18 Osaka Titanium Seizo Kk Manufacture of trichlorosilane
DE10061682A1 (de) 2000-12-11 2002-07-04 Solarworld Ag Verfahren zur Herstellung von Reinstsilicium
EP1437327B1 (en) 2001-10-19 2007-04-11 Tokuyama Corporation Method for producing silicon
CN1183034C (zh) 2002-02-08 2005-01-05 中国有色工程设计研究总院 四氯化硅氢化生产三氯氢硅的方法
CN1222471C (zh) 2002-10-23 2005-10-12 同济大学 用三氯氢硅和四氯化硅混合源生产多晶硅的方法
JP4831285B2 (ja) * 2004-04-30 2011-12-07 三菱マテリアル株式会社 多結晶シリコンの製造方法
CN1291912C (zh) * 2005-06-16 2006-12-27 中国有色工程设计研究总院 大型三氯氢硅合成装置及合成方法
CN101143723B (zh) * 2007-08-08 2010-09-01 徐州东南多晶硅材料研发有限公司 制备三氯氢硅和多晶硅的改进方法和装置
CN101125654A (zh) * 2007-09-04 2008-02-20 浙江开化合成材料有限公司 一种用于三氯氢硅生产的大型流化床反应器

Also Published As

Publication number Publication date
WO2009018713A1 (fr) 2009-02-12
CN101143723B (zh) 2010-09-01
EP2179965A1 (en) 2010-04-28
CN101143723A (zh) 2008-03-19

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