HK1108062A1 - 光學積分器、照明光學設備、曝光設備、曝光方法、以及裝置製造方法 - Google Patents

光學積分器、照明光學設備、曝光設備、曝光方法、以及裝置製造方法

Info

Publication number
HK1108062A1
HK1108062A1 HK08101705.6A HK08101705A HK1108062A1 HK 1108062 A1 HK1108062 A1 HK 1108062A1 HK 08101705 A HK08101705 A HK 08101705A HK 1108062 A1 HK1108062 A1 HK 1108062A1
Authority
HK
Hong Kong
Prior art keywords
exposure
device manufacturing
optical
illumination optical
optical integrator
Prior art date
Application number
HK08101705.6A
Other languages
English (en)
Inventor
Naonori Kita
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=36614701&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=HK1108062(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1108062A1 publication Critical patent/HK1108062A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0961—Lens arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Optical Elements Other Than Lenses (AREA)
HK08101705.6A 2004-12-27 2008-02-15 光學積分器、照明光學設備、曝光設備、曝光方法、以及裝置製造方法 HK1108062A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004375854 2004-12-27
PCT/JP2005/022612 WO2006070580A1 (ja) 2004-12-27 2005-12-09 オプティカルインテグレータ、照明光学装置、露光装置、露光方法、およびデバイス製造方法

Publications (1)

Publication Number Publication Date
HK1108062A1 true HK1108062A1 (zh) 2008-04-25

Family

ID=36614701

Family Applications (1)

Application Number Title Priority Date Filing Date
HK08101705.6A HK1108062A1 (zh) 2004-12-27 2008-02-15 光學積分器、照明光學設備、曝光設備、曝光方法、以及裝置製造方法

Country Status (7)

Country Link
US (1) US7706072B2 (zh)
EP (1) EP1837895B1 (zh)
JP (2) JPWO2006070580A1 (zh)
KR (1) KR101336404B1 (zh)
CN (1) CN100521089C (zh)
HK (1) HK1108062A1 (zh)
WO (1) WO2006070580A1 (zh)

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EP2009678A4 (en) * 2006-04-17 2011-04-06 Nikon Corp OPTICAL LIGHTING DEVICE, EXPOSURE DEVICE AND COMPONENT MANUFACTURING METHOD
JP5071385B2 (ja) 2006-06-16 2012-11-14 株式会社ニコン 可変スリット装置、照明装置、露光装置、露光方法及びデバイス製造方法
WO2008004654A1 (fr) * 2006-07-07 2008-01-10 Nikon Corporation Appareil optique d'éclairage, appareil d'exposition et procédé de fabrication du dispositif
JP5167789B2 (ja) * 2006-12-01 2013-03-21 セイコーエプソン株式会社 光源装置、画像表示装置、プロジェクタ、照明装置、及びモニタ装置
US8587764B2 (en) * 2007-03-13 2013-11-19 Nikon Corporation Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method
US20080225257A1 (en) * 2007-03-13 2008-09-18 Nikon Corporation Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method
JP5035747B2 (ja) 2007-03-16 2012-09-26 株式会社ニコン オプティカルインテグレータ、照明光学装置、露光装置、およびデバイス製造方法
DE202007008430U1 (de) * 2007-06-15 2008-10-16 Heise, Sebastian Beleuchtungsvorrichtung
WO2009050976A1 (en) 2007-10-16 2009-04-23 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
EP2179329A1 (en) * 2007-10-16 2010-04-28 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US8908151B2 (en) 2008-02-14 2014-12-09 Nikon Corporation Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system
JP5182588B2 (ja) * 2008-04-29 2013-04-17 株式会社ニコン オプティカルインテグレータ、照明光学系、露光装置、およびデバイス製造方法
JP2011009611A (ja) * 2009-06-29 2011-01-13 Ushio Inc インテグレータおよびそのインテグレータを用いた光照射装置
JP2011091177A (ja) * 2009-10-22 2011-05-06 V Technology Co Ltd レーザ露光装置
KR20150033614A (ko) * 2012-06-21 2015-04-01 가부시키가이샤 니콘 조명 장치, 처리 장치, 및 디바이스 제조 방법
FR2996016B1 (fr) * 2012-09-25 2014-09-19 Sagem Defense Securite Illuminateur de photolithographie telecentrique selon deux directions
EP2876499B1 (en) * 2013-11-22 2017-05-24 Carl Zeiss SMT GmbH Illumination system of a microlithographic projection exposure apparatus
CN109996990B (zh) * 2016-10-14 2021-12-28 科思创德国股份有限公司 用于减少彩色边纹的装置
CN110146991B (zh) * 2019-04-18 2024-07-09 珠海市运泰利自动化设备有限公司 一种激光光斑整形光学系统

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JPH01124810A (ja) * 1987-11-10 1989-05-17 Olympus Optical Co Ltd 像伝達光学系
JP3360686B2 (ja) * 1990-12-27 2002-12-24 株式会社ニコン 照明光学装置および投影露光装置並びに露光方法および素子製造方法
FR2676288B1 (fr) * 1991-05-07 1994-06-17 Thomson Csf Collecteur d'eclairage pour projecteur.
KR0168879B1 (ko) * 1992-12-25 1999-04-15 기따지마 요시또시 렌티큘러 렌즈, 면광원 및 액정 표시 장치
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JP3508190B2 (ja) * 1993-12-21 2004-03-22 セイコーエプソン株式会社 照明装置及び投写型表示装置
JP3060357B2 (ja) * 1994-06-22 2000-07-10 キヤノン株式会社 走査型露光装置及び該走査型露光装置を用いてデバイスを製造する方法
JP4521896B2 (ja) * 1999-06-08 2010-08-11 キヤノン株式会社 照明装置、投影露光装置及びデバイス製造方法
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JP2002246297A (ja) * 2001-02-20 2002-08-30 Canon Inc 光源装置、その光源装置に用いられるフライアイ・レンズ、その光源装置を有する露光装置
JP3605047B2 (ja) * 2001-05-22 2004-12-22 キヤノン株式会社 照明装置、露光装置、デバイス製造方法及びデバイス
JP3826047B2 (ja) * 2002-02-13 2006-09-27 キヤノン株式会社 露光装置、露光方法、及びそれを用いたデバイス製造方法
JP4324957B2 (ja) * 2002-05-27 2009-09-02 株式会社ニコン 照明光学装置、露光装置および露光方法
TW200412617A (en) * 2002-12-03 2004-07-16 Nikon Corp Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method
JP2004198748A (ja) * 2002-12-19 2004-07-15 Nikon Corp オプティカルインテグレータ、照明光学装置、露光装置および露光方法
JP2004266259A (ja) * 2003-02-10 2004-09-24 Nikon Corp 照明光学装置、露光装置および露光方法
JP2004335575A (ja) * 2003-05-01 2004-11-25 Canon Inc 露光装置
JP4366163B2 (ja) * 2003-09-25 2009-11-18 キヤノン株式会社 照明装置及び露光装置
WO2005085935A1 (de) * 2004-03-06 2005-09-15 Hentze-Lissotschenko Gmbh & Co. Kg Vorrichtung zur homogenisierung von licht sowie anordnung zur beleuchtung oder fokussierung mit einer derartigen vorrichtung
DE102004035595B4 (de) * 2004-04-09 2008-02-07 Carl Zeiss Smt Ag Verfahren zur Justage eines Projektionsobjektives

Also Published As

Publication number Publication date
KR101336404B1 (ko) 2013-12-04
JPWO2006070580A1 (ja) 2008-06-12
CN100521089C (zh) 2009-07-29
US20080074631A1 (en) 2008-03-27
KR20070102653A (ko) 2007-10-19
EP1837895A4 (en) 2011-06-01
US7706072B2 (en) 2010-04-27
JP5500454B2 (ja) 2014-05-21
CN101006553A (zh) 2007-07-25
WO2006070580A1 (ja) 2006-07-06
JP2011135099A (ja) 2011-07-07
EP1837895B1 (en) 2016-02-24
EP1837895A1 (en) 2007-09-26

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20201209