HK1079279A1 - Reduced moisture compositions comprising an acid gas and a matrix gas, aritcles of manufacture comprising said compoisitons, and processes for manufacturing same - Google Patents

Reduced moisture compositions comprising an acid gas and a matrix gas, aritcles of manufacture comprising said compoisitons, and processes for manufacturing same

Info

Publication number
HK1079279A1
HK1079279A1 HK05111128A HK05111128A HK1079279A1 HK 1079279 A1 HK1079279 A1 HK 1079279A1 HK 05111128 A HK05111128 A HK 05111128A HK 05111128 A HK05111128 A HK 05111128A HK 1079279 A1 HK1079279 A1 HK 1079279A1
Authority
HK
Hong Kong
Prior art keywords
gas
compoisitons
aritcles
manufacture
processes
Prior art date
Application number
HK05111128A
Other languages
English (en)
Inventor
Tracey Jacksier
Robert Benesch
John Kuhn
Original Assignee
Air Liquide
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide filed Critical Air Liquide
Publication of HK1079279A1 publication Critical patent/HK1079279A1/xx

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/0004—Gaseous mixtures, e.g. polluted air
    • G01N33/0006—Calibrating gas analysers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2221/00—Handled fluid, in particular type of fluid
    • F17C2221/05—Ultrapure fluid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Food Science & Technology (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Drying Of Gases (AREA)
HK05111128A 2002-05-29 2005-12-06 Reduced moisture compositions comprising an acid gas and a matrix gas, aritcles of manufacture comprising said compoisitons, and processes for manufacturing same HK1079279A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15746802A 2002-05-29 2002-05-29
PCT/IB2003/001204 WO2003100410A1 (en) 2002-05-29 2003-04-02 Reduced moisture compositions comprising an acid gas and a matrix gas, articles of manufacture comprising said compositions and processes for manufacturing same

Publications (1)

Publication Number Publication Date
HK1079279A1 true HK1079279A1 (en) 2006-03-31

Family

ID=29582474

Family Applications (1)

Application Number Title Priority Date Filing Date
HK05111128A HK1079279A1 (en) 2002-05-29 2005-12-06 Reduced moisture compositions comprising an acid gas and a matrix gas, aritcles of manufacture comprising said compoisitons, and processes for manufacturing same

Country Status (8)

Country Link
US (2) US7156225B2 (xx)
EP (1) EP1512000A1 (xx)
JP (1) JP4504184B2 (xx)
KR (1) KR100923941B1 (xx)
CN (2) CN1975415B (xx)
AU (1) AU2003214502A1 (xx)
HK (1) HK1079279A1 (xx)
WO (1) WO2003100410A1 (xx)

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US7905154B2 (en) * 2004-11-29 2011-03-15 Jones Jr Arthur T Apparatus and method of contaminant detection for food industry
US20090047447A1 (en) * 2005-08-02 2009-02-19 Sawin Herbert H Method for removing surface deposits and passivating interior surfaces of the interior of a chemical vapor deposition reactor
US8361199B2 (en) * 2011-05-27 2013-01-29 Air Liquide Electronics U.S. Lp Purification of H2Se
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Also Published As

Publication number Publication date
US20050167636A1 (en) 2005-08-04
EP1512000A1 (en) 2005-03-09
US7156225B2 (en) 2007-01-02
US20050150779A1 (en) 2005-07-14
KR20050016321A (ko) 2005-02-21
WO2003100410A1 (en) 2003-12-04
JP2005527822A (ja) 2005-09-15
CN1316246C (zh) 2007-05-16
CN1975415A (zh) 2007-06-06
CN1975415B (zh) 2010-09-22
JP4504184B2 (ja) 2010-07-14
CN1646907A (zh) 2005-07-27
US7229667B2 (en) 2007-06-12
KR100923941B1 (ko) 2009-10-29
AU2003214502A1 (en) 2003-12-12

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20200408