HK1073337A1 - Porous gettr devices with reduced particle loss and method for their manufacture - Google Patents
Porous gettr devices with reduced particle loss and method for their manufactureInfo
- Publication number
- HK1073337A1 HK1073337A1 HK05105847A HK05105847A HK1073337A1 HK 1073337 A1 HK1073337 A1 HK 1073337A1 HK 05105847 A HK05105847 A HK 05105847A HK 05105847 A HK05105847 A HK 05105847A HK 1073337 A1 HK1073337 A1 HK 1073337A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- porous
- deposition
- getter
- gettr
- manufacture
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
- H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
- H01J7/18—Means for absorbing or adsorbing gas, e.g. by gettering
- H01J7/183—Composition or manufacture of getters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/10—Sintering only
- B22F3/11—Making porous workpieces or articles
- B22F3/1146—After-treatment maintaining the porosity
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/045—Alloys based on refractory metals
- C22C1/0458—Alloys based on titanium, zirconium or hafnium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12014—All metal or with adjacent metals having metal particles
- Y10T428/12021—All metal or with adjacent metals having metal particles having composition or density gradient or differential porosity
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12479—Porous [e.g., foamed, spongy, cracked, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
- Y10T428/24298—Noncircular aperture [e.g., slit, diamond, rectangular, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Common Detailed Techniques For Electron Tubes Or Discharge Tubes (AREA)
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
- Powder Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT2000MI002099A IT1318937B1 (it) | 2000-09-27 | 2000-09-27 | Metodo per la produzione di dispositivi getter porosi con ridottaperdita di particelle e dispositivi cosi' prodotti |
PCT/IT2001/000488 WO2002027058A1 (fr) | 2000-09-27 | 2001-09-25 | Dispositifs poreux d'absorption de gaz a perte de particules reduite et leur procede de fabrication |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1073337A1 true HK1073337A1 (en) | 2005-09-30 |
Family
ID=11445869
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK05105847A HK1073337A1 (en) | 2000-09-27 | 2005-07-11 | Porous gettr devices with reduced particle loss and method for their manufacture |
Country Status (13)
Country | Link |
---|---|
US (3) | US6620297B2 (fr) |
EP (1) | EP1322795B1 (fr) |
JP (1) | JP2004509757A (fr) |
KR (1) | KR100784584B1 (fr) |
CN (1) | CN1318642C (fr) |
AT (1) | ATE370261T1 (fr) |
AU (1) | AU2001295881A1 (fr) |
DE (1) | DE60130001T2 (fr) |
HK (1) | HK1073337A1 (fr) |
IT (1) | IT1318937B1 (fr) |
RU (1) | RU2253695C2 (fr) |
TW (1) | TWI278523B (fr) |
WO (1) | WO2002027058A1 (fr) |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6475725B1 (en) * | 1997-06-20 | 2002-11-05 | Baxter Aktiengesellschaft | Recombinant cell clones having increased stability and methods of making and using the same |
IT1312248B1 (it) * | 1999-04-12 | 2002-04-09 | Getters Spa | Metodo per aumentare la produttivita' di processi di deposizione distrati sottili su un substrato e dispositivi getter per la |
EP1355944B1 (fr) * | 2000-06-08 | 2010-01-06 | Baylor College of Medicine | Compositions et procedes a base des proteines vespides et pathogenes associees a des proteines specifiques aux testicules (rtvp) pour le traitement du cancer prostatique |
IT1318937B1 (it) * | 2000-09-27 | 2003-09-19 | Getters Spa | Metodo per la produzione di dispositivi getter porosi con ridottaperdita di particelle e dispositivi cosi' prodotti |
CN100550277C (zh) | 2001-05-01 | 2009-10-14 | 萨伊斯吉提斯公司 | 放电灯 |
US20050187153A1 (en) * | 2001-06-08 | 2005-08-25 | Baylor College Of Medicine | RTVP based compositions and methods for the treatment of prostate cancer, autoimmunity and infectious disease |
JP3740479B2 (ja) * | 2002-07-23 | 2006-02-01 | キヤノン株式会社 | 画像表示装置とその製造方法 |
US6911065B2 (en) * | 2002-12-26 | 2005-06-28 | Matheson Tri-Gas, Inc. | Method and system for supplying high purity fluid |
JP2004265776A (ja) * | 2003-03-03 | 2004-09-24 | Hitachi Ltd | 有機elディスプレイ装置 |
US7135141B2 (en) * | 2003-03-31 | 2006-11-14 | Hitachi Metals, Ltd. | Method of manufacturing a sintered body |
ITMI20031178A1 (it) * | 2003-06-11 | 2004-12-12 | Getters Spa | Depositi multistrato getter non evaporabili ottenuti per |
US7871660B2 (en) * | 2003-11-14 | 2011-01-18 | Saes Getters, S.P.A. | Preparation of getter surfaces using caustic chemicals |
US7824685B2 (en) * | 2004-01-26 | 2010-11-02 | Baylor College Of Medicine | RTVP based compositions and methods for the treatment of prostate cancer |
JPWO2005124813A1 (ja) * | 2004-06-18 | 2008-04-17 | 株式会社東芝 | 画像表示装置および画像表示装置の製造方法 |
KR100641301B1 (ko) * | 2004-09-15 | 2006-11-02 | 주식회사 세종소재 | 겟터 겸용 수은 보충재 |
ITMI20042271A1 (it) * | 2004-11-23 | 2005-02-23 | Getters Spa | Leghe getter non evaporabili per assorbimento di idrogeno |
US20060240276A1 (en) * | 2005-04-20 | 2006-10-26 | Technic, Inc. | Underlayer for reducing surface oxidation of plated deposits |
EP1821328A1 (fr) | 2006-02-10 | 2007-08-22 | Nanoshell Materials Research & Development GmbH | Matériau de dégazage dendritique et métallique et son procédé de production |
EP2032735A4 (fr) * | 2006-06-21 | 2011-12-21 | Proteus Biomedical Inc | Appareils médicaux implantables comprenant des structures produites par un arc cathodique |
FR2903678B1 (fr) | 2006-07-13 | 2008-10-24 | Commissariat Energie Atomique | Microcomposant encapsule equipe d'au moins un getter |
JP2009522104A (ja) * | 2006-12-15 | 2009-06-11 | ビ−エイイ− システムズ パブリック リミテッド カンパニ− | 薄膜ゲッタ装置に関する改善 |
ITMI20090410A1 (it) * | 2009-03-18 | 2010-09-19 | Getters Spa | Leghe getter non evaporabili adatte particolarmente per l'assorbimento di idrogeno |
DE102009029495A1 (de) * | 2009-09-16 | 2011-03-24 | Endress + Hauser Conducta Gesellschaft für Mess- und Regeltechnik mbH + Co. KG | Messumformer für ein Multisensorsystem, insbesondere als Feldgerät für die Prozessautomatisierungstechnik und Verfahren zum Betreiben des Messumformers |
CN102534489A (zh) * | 2010-12-30 | 2012-07-04 | 鸿富锦精密工业(深圳)有限公司 | 镀膜件及其制造方法 |
RU2474912C1 (ru) * | 2011-08-23 | 2013-02-10 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Национальный исследовательский университет "МИЭТ" (МИЭТ) | Способ получения газопоглощающей структуры |
RU2513563C2 (ru) * | 2012-08-17 | 2014-04-20 | Федеральное государственное унитарное предприятие "Научно-производственное предприятие "Исток" (ФГУП "НПП "Исток") | Спеченный неиспаряющийся геттер |
RU2523718C2 (ru) * | 2012-11-20 | 2014-07-20 | Федеральное государственное автономное образовательное учреждение высшего профессионального образования "Национальный исследовательский университет "МИЭТ" (МИЭТ) | Нанокомпозитная газопоглощающая структура и способ ее получения |
WO2014122700A1 (fr) * | 2013-02-05 | 2014-08-14 | キヤノンアネルバ株式会社 | Appareil filmogène |
FR3003647B1 (fr) * | 2013-03-25 | 2015-12-25 | IFP Energies Nouvelles | Procede et systeme d'analyse d'un fluide gazeux comprenant au moins un gaz rare au moyen d'un substrat de getterisation |
RU2532788C1 (ru) * | 2013-06-20 | 2014-11-10 | Федеральное государственное автономное образовательное учреждение высшего профессионального образования "Национальный исследовательский технологический университет "МИСиС" | Способ получения объемно-пористых структур сплавов-накопителей водорода, способных выдерживать многократные циклы гидрирования-дегидрирования без разрушения |
US9764946B2 (en) | 2013-10-24 | 2017-09-19 | Analog Devices, Inc. | MEMs device with outgassing shield |
ITMI20131921A1 (it) * | 2013-11-20 | 2015-05-21 | Getters Spa | Leghe getter non evaporabili particolarmente adatte per l'assorbimento di idrogeno e monossido di carbonio |
US10421059B2 (en) | 2014-10-24 | 2019-09-24 | Samsung Electronics Co., Ltd. | Gas-adsorbing material and vacuum insulation material including the same |
US10801097B2 (en) * | 2015-12-23 | 2020-10-13 | Praxair S.T. Technology, Inc. | Thermal spray coatings onto non-smooth surfaces |
CN106591790B (zh) * | 2016-12-28 | 2019-12-13 | 杭州大立微电子有限公司 | 靶材制备方法和吸气剂薄膜形成方法 |
RU2771308C2 (ru) * | 2017-11-17 | 2022-04-29 | Роквул Интернэшнл А/С | Подвесная система |
CN110820031A (zh) * | 2019-11-19 | 2020-02-21 | 有研工程技术研究院有限公司 | 一种微型吸气剂的制备方法 |
CN111001545A (zh) * | 2019-11-25 | 2020-04-14 | 烟台艾睿光电科技有限公司 | 防止吸气剂掉落颗粒的方法及吸气剂与加固涂层组件 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2491284A (en) * | 1946-12-13 | 1949-12-13 | Bell Telephone Labor Inc | Electrode for electron discharge devices and method of making the same |
DE1064646B (de) * | 1955-06-07 | 1959-09-03 | Ernesto Gabbrielli | Verfahren zum Herstellen von Gettern |
NL126633C (fr) * | 1958-02-24 | 1900-01-01 | ||
IT963874B (it) * | 1972-08-10 | 1974-01-21 | Getters Spa | Dispositivo getter perfezionato contenente materiale non evapora bile |
US4428856A (en) | 1982-09-30 | 1984-01-31 | Boyarina Maya F | Non-evaporable getter |
IT1173866B (it) | 1984-03-16 | 1987-06-24 | Getters Spa | Metodo perfezionato per fabbricare dispositivi getter non evarobili porosi e dispositivi getter cosi' prodotti |
US5456740A (en) * | 1994-06-22 | 1995-10-10 | Millipore Corporation | High-efficiency metal membrane getter element and process for making |
US5908579A (en) | 1994-12-02 | 1999-06-01 | Saes Getters, S.P.A. | Process for producing high-porosity non-evaporable getter materials and materials thus obtained |
IT1283484B1 (it) | 1996-07-23 | 1998-04-21 | Getters Spa | Metodo per la produzione di strati sottili supportati di materiale getter non-evaporabile e dispositivi getter cosi' prodotti |
CN1187684A (zh) * | 1997-01-10 | 1998-07-15 | 工程吸气公司 | 具有较短激发时间的可蒸发的吸气装置 |
FR2760089B1 (fr) * | 1997-02-26 | 1999-04-30 | Org Europeene De Rech | Agencement et procede pour ameliorer le vide dans un systeme a vide tres pousse |
IT1290451B1 (it) | 1997-04-03 | 1998-12-03 | Getters Spa | Leghe getter non evaporabili |
IT1301948B1 (it) * | 1998-07-28 | 2000-07-20 | Getters Spa | Processo per la produzione di dispositivi getter evaporabili conridotta perdita di particelle |
EP1032456A1 (fr) | 1998-08-21 | 2000-09-06 | Medtronic Ave, Inc. | Structure de cathode a materiau adsorbeur et film en diamant, et procede de fabrication |
JP3518855B2 (ja) * | 1999-02-26 | 2004-04-12 | キヤノン株式会社 | ゲッター、ゲッターを有する気密容器および画像形成装置、ゲッターの製造方法 |
CN1149609C (zh) * | 1999-06-02 | 2004-05-12 | 工程吸气公司 | 能够无需激活处理而吸附氢的复合材料及其生产方法 |
IT1318937B1 (it) * | 2000-09-27 | 2003-09-19 | Getters Spa | Metodo per la produzione di dispositivi getter porosi con ridottaperdita di particelle e dispositivi cosi' prodotti |
-
2000
- 2000-09-27 IT IT2000MI002099A patent/IT1318937B1/it active
-
2001
- 2001-09-20 TW TW090123227A patent/TWI278523B/zh not_active IP Right Cessation
- 2001-09-25 WO PCT/IT2001/000488 patent/WO2002027058A1/fr active IP Right Grant
- 2001-09-25 CN CNB018164315A patent/CN1318642C/zh not_active Expired - Lifetime
- 2001-09-25 DE DE60130001T patent/DE60130001T2/de not_active Expired - Lifetime
- 2001-09-25 KR KR1020037004244A patent/KR100784584B1/ko active IP Right Grant
- 2001-09-25 AT AT01976619T patent/ATE370261T1/de active
- 2001-09-25 JP JP2002530818A patent/JP2004509757A/ja active Pending
- 2001-09-25 RU RU2003112221/02A patent/RU2253695C2/ru active
- 2001-09-25 EP EP01976619A patent/EP1322795B1/fr not_active Expired - Lifetime
- 2001-09-25 AU AU2001295881A patent/AU2001295881A1/en not_active Abandoned
- 2001-09-27 US US09/967,234 patent/US6620297B2/en not_active Expired - Fee Related
-
2003
- 2003-03-14 US US10/389,382 patent/US6783696B2/en not_active Expired - Lifetime
-
2004
- 2004-06-18 US US10/871,353 patent/US7122100B2/en not_active Expired - Fee Related
-
2005
- 2005-07-11 HK HK05105847A patent/HK1073337A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US6620297B2 (en) | 2003-09-16 |
EP1322795A1 (fr) | 2003-07-02 |
ITMI20002099A0 (it) | 2000-09-27 |
ATE370261T1 (de) | 2007-09-15 |
KR100784584B1 (ko) | 2007-12-10 |
JP2004509757A (ja) | 2004-04-02 |
AU2001295881A1 (en) | 2002-04-08 |
US7122100B2 (en) | 2006-10-17 |
US20020093003A1 (en) | 2002-07-18 |
RU2253695C2 (ru) | 2005-06-10 |
US20030165707A1 (en) | 2003-09-04 |
ITMI20002099A1 (it) | 2002-03-27 |
US20050023134A1 (en) | 2005-02-03 |
CN1596323A (zh) | 2005-03-16 |
DE60130001T2 (de) | 2008-05-08 |
EP1322795B1 (fr) | 2007-08-15 |
DE60130001D1 (de) | 2007-09-27 |
TWI278523B (en) | 2007-04-11 |
IT1318937B1 (it) | 2003-09-19 |
KR20030038765A (ko) | 2003-05-16 |
WO2002027058A1 (fr) | 2002-04-04 |
WO2002027058A8 (fr) | 2003-04-10 |
CN1318642C (zh) | 2007-05-30 |
US6783696B2 (en) | 2004-08-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
HK1073337A1 (en) | Porous gettr devices with reduced particle loss and method for their manufacture | |
Kelly et al. | Magnetron sputtering: a review of recent developments and applications | |
TW200605194A (en) | Method and apparatus of distributed plasma processing system for conformal ion stimulated nanoscale deposition process | |
WO2004059027A3 (fr) | Revetement par depot de plasma de surfaces antimicrobiennes et surfaces antimicrobiennes obtenues | |
TR199901222A3 (tr) | Sürtünme yatagi gövdesi ve üretim islemi. | |
EP0969117A3 (fr) | Procédé pour la production d'un système de revêtement de barrière thermique | |
EP0926258A3 (fr) | Système de getter pour purifier l'atmosphère de travail de procédés de déposition physique en phase vapeur | |
WO2001036704A3 (fr) | Procede et appareil permettant de former un film dur carbone et dispositifs associes | |
EP0947603A3 (fr) | Méthode et appareillage pour déposer un film | |
TWI264039B (en) | Fed cathode structure using electrophoretic deposition and method of fabrication | |
PL1675971T3 (pl) | Metoda powlekania powierzchni przedmiotów przy użyciu strumienia plazmy | |
WO2002092866A3 (fr) | Materiau composite et son procede de realisation | |
CA2273235A1 (fr) | Procede permettant de recouvrir d'une chape des residus miniers et des depots de boues | |
AU3340497A (en) | Pumping device by non-vaporisable getter and method for using this getter | |
DE69904826D1 (de) | Ionenergiedämpfung | |
Liu et al. | MEVVA ion source development and its industrial applications at Beijing Normal University | |
ATE221581T1 (de) | Verfahren und vorrichtung zur beschichtung von substraten im vakuum | |
WO1999028520A3 (fr) | Dispositif de traitement de pieces dans un plasma basse pression | |
Martin | Filtered arc evaporation | |
GR3024288T3 (en) | Suspension for coating substrates with thin solder layers. | |
WO2002027057A3 (fr) | Cible de pulverisation amelioree; methodes de fabrication et utilisation | |
Melaibari et al. | Pulsed laser deposition to synthesize the bridge structure of artificial nacre: Comparison of nano-and femtosecond lasers | |
JP2001172763A (ja) | 金属含有硬質炭素膜の形成方法 | |
KR100686318B1 (ko) | 전도성 탄소계 나노구조 코팅장치 및 방법 | |
AU1027200A (en) | Method for producing an electrochromic layer |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20110925 |