HK1042473A1 - 生產鹽衍生物的方法、和新的鹽衍生物 - Google Patents

生產鹽衍生物的方法、和新的鹽衍生物

Info

Publication number
HK1042473A1
HK1042473A1 HK02104327.4A HK02104327A HK1042473A1 HK 1042473 A1 HK1042473 A1 HK 1042473A1 HK 02104327 A HK02104327 A HK 02104327A HK 1042473 A1 HK1042473 A1 HK 1042473A1
Authority
HK
Hong Kong
Prior art keywords
onium salt
salt derivative
producing
novel
derivative
Prior art date
Application number
HK02104327.4A
Other languages
English (en)
Inventor
Tomita Kyoichi
Ishii Shinji
Original Assignee
Toyo Gosei Kogyo Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Gosei Kogyo Kk filed Critical Toyo Gosei Kogyo Kk
Publication of HK1042473A1 publication Critical patent/HK1042473A1/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12Sulfonium compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C25/00Compounds containing at least one halogen atom bound to a six-membered aromatic ring
    • C07C25/02Monocyclic aromatic halogenated hydrocarbons
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C25/00Compounds containing at least one halogen atom bound to a six-membered aromatic ring
    • C07C25/18Polycyclic aromatic halogenated hydrocarbons
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C303/00Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides
    • C07C303/24Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of esters of sulfuric acids
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C303/00Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides
    • C07C303/32Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of salts of sulfonic acids
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/06Phosphorus compounds without P—C bonds
    • C07F9/08Esters of oxyacids of phosphorus
    • C07F9/09Esters of phosphoric acids
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/38Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
    • C07F9/40Esters thereof
    • C07F9/4071Esters thereof the ester moiety containing a substituent or a structure which is considered as characteristic
    • C07F9/4075Esters with hydroxyalkyl compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2602/00Systems containing two condensed rings
    • C07C2602/36Systems containing two condensed rings the rings having more than two atoms in common
    • C07C2602/42Systems containing two condensed rings the rings having more than two atoms in common the bicyclo ring system containing seven carbon atoms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
HK02104327.4A 1999-12-03 2002-06-08 生產鹽衍生物的方法、和新的鹽衍生物 HK1042473A1 (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP34548899 1999-12-03
JP2000065213 2000-03-09
JP2000260928 2000-08-30
JP2000284186 2000-09-19
JP2000286306 2000-09-21
PCT/JP2000/008488 WO2001040167A1 (fr) 1999-12-03 2000-12-01 Procede de production de derive de sel d'onium et nouveau derive de sel d'onium

Publications (1)

Publication Number Publication Date
HK1042473A1 true HK1042473A1 (zh) 2002-08-16

Family

ID=27531280

Family Applications (1)

Application Number Title Priority Date Filing Date
HK02104327.4A HK1042473A1 (zh) 1999-12-03 2002-06-08 生產鹽衍生物的方法、和新的鹽衍生物

Country Status (7)

Country Link
US (2) US6620957B1 (zh)
EP (1) EP1164127A4 (zh)
KR (1) KR100646739B1 (zh)
CN (1) CN1177818C (zh)
HK (1) HK1042473A1 (zh)
TW (1) TWI260673B (zh)
WO (1) WO2001040167A1 (zh)

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WO2001040167A1 (fr) * 1999-12-03 2001-06-07 Toyo Gosei Kogyo Co., Ltd. Procede de production de derive de sel d'onium et nouveau derive de sel d'onium
DE60133929D1 (de) 2000-12-04 2008-06-19 Ciba Holding Inc Oniumsalze und ihre verwendung als latente säuren
US6787281B2 (en) * 2002-05-24 2004-09-07 Kodak Polychrome Graphics Llc Selected acid generating agents and their use in processes for imaging radiation-sensitive elements
US7045269B2 (en) * 2003-03-10 2006-05-16 Eastman Kodak Company Method for forming images using negative working imageable elements
JP2005035162A (ja) * 2003-07-14 2005-02-10 Fuji Photo Film Co Ltd 平版印刷版の製版方法、平版印刷方法および機上現像用平版印刷原版
DE102004060075A1 (de) * 2004-12-14 2006-07-06 Merck Patent Gmbh Verfahren zur Herstellung von Onium-Salzen mit Dialkylphosphat-, Dialkylphosphinat oder (O-Alkyl)-alkyl- oder Alkyl-phosphonat-Anionen mit geringem Halogenid-Gehalt
EP1780199B1 (en) * 2005-10-31 2012-02-01 Shin-Etsu Chemical Co., Ltd. Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
EP1780198B1 (en) * 2005-10-31 2011-10-05 Shin-Etsu Chemical Co., Ltd. Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
GB2433264A (en) * 2005-12-16 2007-06-20 Sun Chemical Ltd Process for preparing ammonium, phosphonium & sulphonium salts of anionic dyes from aqueous solution of a salt of dye & non-aqueous solution of an onium salt
JP4548616B2 (ja) 2006-05-15 2010-09-22 信越化学工業株式会社 熱酸発生剤及びこれを含むレジスト下層膜材料、並びにこのレジスト下層膜材料を用いたパターン形成方法
JP5124806B2 (ja) * 2006-06-27 2013-01-23 信越化学工業株式会社 光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
JP5124805B2 (ja) * 2006-06-27 2013-01-23 信越化学工業株式会社 光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
US8192590B1 (en) * 2008-04-14 2012-06-05 University Of Central Florida Research Foundation, Inc. Microwave-assisted formation of sulfonium photoacid generators
JP4813537B2 (ja) 2008-11-07 2011-11-09 信越化学工業株式会社 熱酸発生剤を含有するレジスト下層材料、レジスト下層膜形成基板及びパターン形成方法
JP5561192B2 (ja) * 2010-02-26 2014-07-30 信越化学工業株式会社 高分子化合物及びこれを用いた化学増幅ポジ型レジスト組成物並びにパターン形成方法
CN113149872A (zh) * 2021-03-18 2021-07-23 河北凯诺中星科技有限公司 一种全氟丁烷基磺酸对苯碘鎓盐的制备方法
CN113173873A (zh) * 2021-03-18 2021-07-27 河北凯诺中星科技有限公司 一种三苯基硫全氟丁烷基磺酸硫鎓盐的制备方法

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WO2001040167A1 (fr) * 1999-12-03 2001-06-07 Toyo Gosei Kogyo Co., Ltd. Procede de production de derive de sel d'onium et nouveau derive de sel d'onium

Also Published As

Publication number Publication date
US7335787B2 (en) 2008-02-26
KR20010101960A (ko) 2001-11-15
US20050176982A1 (en) 2005-08-11
CN1177818C (zh) 2004-12-01
TWI260673B (en) 2006-08-21
US6620957B1 (en) 2003-09-16
CN1339024A (zh) 2002-03-06
WO2001040167A1 (fr) 2001-06-07
EP1164127A4 (en) 2005-06-01
EP1164127A1 (en) 2001-12-19
KR100646739B1 (ko) 2006-11-17

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