HK1001101A1 - Metal ion reduction in bottom anti-reflective coatings for photoresists - Google Patents

Metal ion reduction in bottom anti-reflective coatings for photoresists

Info

Publication number
HK1001101A1
HK1001101A1 HK98100206A HK98100206A HK1001101A1 HK 1001101 A1 HK1001101 A1 HK 1001101A1 HK 98100206 A HK98100206 A HK 98100206A HK 98100206 A HK98100206 A HK 98100206A HK 1001101 A1 HK1001101 A1 HK 1001101A1
Authority
HK
Hong Kong
Prior art keywords
photoresists
metal ion
bottom anti
reflective coatings
ion reduction
Prior art date
Application number
HK98100206A
Other languages
English (en)
Inventor
Dalil M Rahman
Original Assignee
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp
Publication of HK1001101A1 publication Critical patent/HK1001101A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
HK98100206A 1992-11-25 1998-01-10 Metal ion reduction in bottom anti-reflective coatings for photoresists HK1001101A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US98219792A 1992-11-25 1992-11-25
PCT/US1993/010798 WO1994012912A1 (en) 1992-11-25 1993-11-08 Metal ion reduction in bottom anti-reflective coatings for photoresists

Publications (1)

Publication Number Publication Date
HK1001101A1 true HK1001101A1 (en) 1998-05-22

Family

ID=25528927

Family Applications (1)

Application Number Title Priority Date Filing Date
HK98100206A HK1001101A1 (en) 1992-11-25 1998-01-10 Metal ion reduction in bottom anti-reflective coatings for photoresists

Country Status (7)

Country Link
US (1) US5580700A (xx)
EP (1) EP0671025B1 (xx)
JP (1) JP3727335B2 (xx)
DE (1) DE69313132T2 (xx)
HK (1) HK1001101A1 (xx)
SG (1) SG49596A1 (xx)
WO (1) WO1994012912A1 (xx)

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Also Published As

Publication number Publication date
JPH08503983A (ja) 1996-04-30
EP0671025A1 (en) 1995-09-13
SG49596A1 (en) 1998-06-15
DE69313132D1 (de) 1997-09-18
US5580700A (en) 1996-12-03
WO1994012912A1 (en) 1994-06-09
DE69313132T2 (de) 1997-12-11
JP3727335B2 (ja) 2005-12-14
EP0671025B1 (en) 1997-08-13

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Legal Events

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PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)