JPS5624042A - Preparation of drying agent by utilizing used cation exchange resin - Google Patents

Preparation of drying agent by utilizing used cation exchange resin

Info

Publication number
JPS5624042A
JPS5624042A JP9869179A JP9869179A JPS5624042A JP S5624042 A JPS5624042 A JP S5624042A JP 9869179 A JP9869179 A JP 9869179A JP 9869179 A JP9869179 A JP 9869179A JP S5624042 A JPS5624042 A JP S5624042A
Authority
JP
Japan
Prior art keywords
cation exchange
exchange resin
drying agent
passed
used cation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9869179A
Other languages
Japanese (ja)
Inventor
Tsunekichi Miyazawa
Tsutomu Sakamoto
Tokiya Ando
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Organo Corp
Original Assignee
Organo Corp
Japan Organo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Organo Corp, Japan Organo Co Ltd filed Critical Organo Corp
Priority to JP9869179A priority Critical patent/JPS5624042A/en
Publication of JPS5624042A publication Critical patent/JPS5624042A/en
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Gases (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)

Abstract

PURPOSE: To reutilize a used cation exchange resin which has been conventionally abandoned, as a valuable drying agent by sufficiently washing a used cation exchange resin treated by a strong acid solution and, moreover, by a strong alkali solution and, thereafter, drying the same.
CONSTITUTION: To a used cation exchange resin, a strong acid solution such as hydrogen chloride or a strong acid solution and a strong alkali solution such as NaOH is passed to remove impurities adsorbed and adhered in fine pores or to a surface of aformentioned resin particle. Subsequently, to this cation exchange resin treated by the chemical solution, a predetermined amount of water is passed to extrude said chemical solution and, succeedingly, a predetermined amount of water is passed to wash said cation exchange resin. Subsequently, the cation exchange resin completed from washing is drained and dried by air to reduce a moisture content to about 30% and, thereafter, dried at a temp. of about 110°C in the conventional dryer to lower the moisture content to 5% or less, especially, 2% or less to obtain a drying agent.
COPYRIGHT: (C)1981,JPO&Japio
JP9869179A 1979-08-03 1979-08-03 Preparation of drying agent by utilizing used cation exchange resin Pending JPS5624042A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9869179A JPS5624042A (en) 1979-08-03 1979-08-03 Preparation of drying agent by utilizing used cation exchange resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9869179A JPS5624042A (en) 1979-08-03 1979-08-03 Preparation of drying agent by utilizing used cation exchange resin

Publications (1)

Publication Number Publication Date
JPS5624042A true JPS5624042A (en) 1981-03-07

Family

ID=14226524

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9869179A Pending JPS5624042A (en) 1979-08-03 1979-08-03 Preparation of drying agent by utilizing used cation exchange resin

Country Status (1)

Country Link
JP (1) JPS5624042A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05234876A (en) * 1991-09-03 1993-09-10 Ocg Microelectron Materials Inc Method for removing metal impurity from resist component
JPH05234877A (en) * 1991-09-03 1993-09-10 Ocg Microelectron Materials Inc Method for removing metallic impurities from resist component
JPH05234878A (en) * 1991-09-03 1993-09-10 Ocg Microelectron Materials Inc Method for removing impurities from resist component
JPH08503983A (en) * 1992-11-25 1996-04-30 ヘキスト、セラニーズ、コーポレーション Reduction of metal ions in bottom antireflective coatings for photoresists
JPH08504279A (en) * 1992-07-10 1996-05-07 ヘキスト、セラニーズ、コーポレーション Reduction of metal ion content in top anti-reflective coatings for photoresists

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05234876A (en) * 1991-09-03 1993-09-10 Ocg Microelectron Materials Inc Method for removing metal impurity from resist component
JPH05234877A (en) * 1991-09-03 1993-09-10 Ocg Microelectron Materials Inc Method for removing metallic impurities from resist component
JPH05234878A (en) * 1991-09-03 1993-09-10 Ocg Microelectron Materials Inc Method for removing impurities from resist component
JPH08504279A (en) * 1992-07-10 1996-05-07 ヘキスト、セラニーズ、コーポレーション Reduction of metal ion content in top anti-reflective coatings for photoresists
JPH08503983A (en) * 1992-11-25 1996-04-30 ヘキスト、セラニーズ、コーポレーション Reduction of metal ions in bottom antireflective coatings for photoresists

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