GB815916A - Process for the production of electrolytic nickel coatings using internal salts of aromatic bases as plating bath additives - Google Patents
Process for the production of electrolytic nickel coatings using internal salts of aromatic bases as plating bath additivesInfo
- Publication number
- GB815916A GB815916A GB7388/56A GB738856A GB815916A GB 815916 A GB815916 A GB 815916A GB 7388/56 A GB7388/56 A GB 7388/56A GB 738856 A GB738856 A GB 738856A GB 815916 A GB815916 A GB 815916A
- Authority
- GB
- United Kingdom
- Prior art keywords
- nickel
- agents
- sultones
- isomers
- propane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title abstract 8
- 229910052759 nickel Inorganic materials 0.000 title abstract 4
- 125000003118 aryl group Chemical class 0.000 title abstract 3
- 150000003839 salts Chemical class 0.000 title abstract 3
- 238000000576 coating method Methods 0.000 title abstract 2
- 239000000654 additive Substances 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 238000007747 plating Methods 0.000 title 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 abstract 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 abstract 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 abstract 2
- 239000003795 chemical substances by application Substances 0.000 abstract 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 abstract 2
- RDOWQLZANAYVLL-UHFFFAOYSA-N phenanthridine Chemical compound C1=CC=C2C3=CC=CC=C3C=NC2=C1 RDOWQLZANAYVLL-UHFFFAOYSA-N 0.000 abstract 2
- XSCHRSMBECNVNS-UHFFFAOYSA-N quinoxaline Chemical compound N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 abstract 2
- 150000008053 sultones Chemical class 0.000 abstract 2
- VEPOHXYIFQMVHW-XOZOLZJESA-N 2,3-dihydroxybutanedioic acid (2S,3S)-3,4-dimethyl-2-phenylmorpholine Chemical compound OC(C(O)C(O)=O)C(O)=O.C[C@H]1[C@@H](OCCN1C)c1ccccc1 VEPOHXYIFQMVHW-XOZOLZJESA-N 0.000 abstract 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 abstract 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 abstract 1
- 125000001931 aliphatic group Chemical group 0.000 abstract 1
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- VQLYBLABXAHUDN-UHFFFAOYSA-N bis(4-fluorophenyl)-methyl-(1,2,4-triazol-1-ylmethyl)silane;methyl n-(1h-benzimidazol-2-yl)carbamate Chemical compound C1=CC=C2NC(NC(=O)OC)=NC2=C1.C=1C=C(F)C=CC=1[Si](C=1C=CC(F)=CC=1)(C)CN1C=NC=N1 VQLYBLABXAHUDN-UHFFFAOYSA-N 0.000 abstract 1
- 150000001721 carbon Chemical group 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 238000009713 electroplating Methods 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 125000000623 heterocyclic group Chemical group 0.000 abstract 1
- 229910052742 iron Inorganic materials 0.000 abstract 1
- 150000002828 nitro derivatives Chemical class 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 125000004433 nitrogen atom Chemical group N* 0.000 abstract 1
- MHYFEEDKONKGEB-UHFFFAOYSA-N oxathiane 2,2-dioxide Chemical class O=S1(=O)CCCCO1 MHYFEEDKONKGEB-UHFFFAOYSA-N 0.000 abstract 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 abstract 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 abstract 1
- 229910052708 sodium Inorganic materials 0.000 abstract 1
- 239000011734 sodium Substances 0.000 abstract 1
- 239000000080 wetting agent Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/18—Heterocyclic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DED20039A DE1004011B (de) | 1955-03-16 | 1955-03-16 | Saures galvanisches Nickelbad |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB815916A true GB815916A (en) | 1959-07-01 |
Family
ID=7036582
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB7388/56A Expired GB815916A (en) | 1955-03-16 | 1956-03-09 | Process for the production of electrolytic nickel coatings using internal salts of aromatic bases as plating bath additives |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US2876177A (enrdf_load_stackoverflow) |
| BE (1) | BE545564A (enrdf_load_stackoverflow) |
| CH (1) | CH341691A (enrdf_load_stackoverflow) |
| DE (1) | DE1004011B (enrdf_load_stackoverflow) |
| FR (1) | FR1143382A (enrdf_load_stackoverflow) |
| GB (1) | GB815916A (enrdf_load_stackoverflow) |
| NL (2) | NL205377A (enrdf_load_stackoverflow) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL132763C (enrdf_load_stackoverflow) * | 1961-02-10 | |||
| DE1182930B (de) * | 1961-06-12 | 1964-12-03 | Dehydag Gmbh | Verfahren zur Regenerierung von Nickelbaedern |
| DE1191652B (de) * | 1963-05-15 | 1965-04-22 | Dehydag Gmbh | Saures galvanisches Nickelbad |
| US3349015A (en) * | 1963-07-17 | 1967-10-24 | M & T Chemicals Inc | Electrodeposition of bright nickel |
| SE307487B (enrdf_load_stackoverflow) * | 1963-12-17 | 1969-01-07 | Candor Kemiska Ab | |
| FR1418244A (fr) * | 1964-10-08 | 1965-11-19 | Pernix Enthone | Nouvelles sultones et leur application comme agents de nivellement des revêtements électrolytiques, notamment de nickel |
| FR1418245A (fr) * | 1964-10-08 | 1965-11-19 | Pernix Enthone | Nouveaux agents brillanteurs pour bains galvaniques, notamment pour bains de nickelage |
| US3444056A (en) * | 1966-06-24 | 1969-05-13 | Cilag Chemie | Nickel electroplating electrolyte |
| US3862019A (en) * | 1974-04-26 | 1975-01-21 | R O Hull & Company Inc | Composition of electroplating bath for the electrodeposition of bright nickel |
| US4430171A (en) | 1981-08-24 | 1984-02-07 | M&T Chemicals Inc. | Electroplating baths for nickel, iron, cobalt and alloys thereof |
| US4638005A (en) * | 1983-03-18 | 1987-01-20 | The Coca-Cola Company | Monoquaternized pyrazinium compounds and their use as electron carriers in photosynthetic processes |
| DE3817722A1 (de) | 1988-05-25 | 1989-12-14 | Raschig Ag | Verwendung von 2-substituierten ethansulfon-verbindungen als galvanotechnische hilfsstoffe |
| IT1232841B (it) * | 1989-02-03 | 1992-03-05 | Kemifar Spa | Composizione attivante per la metallizzazione di substrati isolanti e procedimento di metalizzazione di tali substrati impiegante la stessa |
| DE4013349A1 (de) * | 1990-04-23 | 1991-10-24 | Schering Ag | 1-(2-sulfoaethyl)pyridiniumbetain, verfahren zu dessen herstellung sowie saure nickelbaeder enthaltend diese verbindung |
| US5417840A (en) * | 1993-10-21 | 1995-05-23 | Mcgean-Rohco, Inc. | Alkaline zinc-nickel alloy plating baths |
| US7300563B2 (en) * | 2003-02-07 | 2007-11-27 | Pavco, Inc. | Use of N-alllyl substituted amines and their salts as brightening agents in nickel plating baths |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA463174A (en) * | 1950-02-14 | Canadian Industries Limited | Electrodeposition of nickel | |
| US2469727A (en) * | 1944-03-30 | 1949-05-10 | Du Pont | Electrodeposition of nickel |
| BE504701A (enrdf_load_stackoverflow) * | 1950-07-17 | |||
| US2647866A (en) * | 1950-07-17 | 1953-08-04 | Udylite Corp | Electroplating of nickel |
-
0
- BE BE545564D patent/BE545564A/xx unknown
- NL NL100419D patent/NL100419C/xx active
- NL NL205377D patent/NL205377A/xx unknown
-
1955
- 1955-03-16 DE DED20039A patent/DE1004011B/de active Pending
-
1956
- 1956-02-22 CH CH341691D patent/CH341691A/de unknown
- 1956-03-09 GB GB7388/56A patent/GB815916A/en not_active Expired
- 1956-03-13 US US571125A patent/US2876177A/en not_active Expired - Lifetime
- 1956-03-14 FR FR1143382D patent/FR1143382A/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR1143382A (fr) | 1957-09-30 |
| DE1004011B (de) | 1957-03-07 |
| US2876177A (en) | 1959-03-03 |
| CH341691A (de) | 1959-10-15 |
| BE545564A (enrdf_load_stackoverflow) | |
| NL100419C (enrdf_load_stackoverflow) | |
| NL205377A (enrdf_load_stackoverflow) |
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