US2876177A - Additives for nickel electroplating baths - Google Patents
Additives for nickel electroplating baths Download PDFInfo
- Publication number
- US2876177A US2876177A US571125A US57112556A US2876177A US 2876177 A US2876177 A US 2876177A US 571125 A US571125 A US 571125A US 57112556 A US57112556 A US 57112556A US 2876177 A US2876177 A US 2876177A
- Authority
- US
- United States
- Prior art keywords
- nickel
- sulfonic acid
- acid
- propane
- bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title description 104
- 229910052759 nickel Inorganic materials 0.000 title description 52
- 238000009713 electroplating Methods 0.000 title description 27
- 239000000654 additive Substances 0.000 title description 8
- 239000002253 acid Substances 0.000 claims description 18
- 150000002391 heterocyclic compounds Chemical class 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 description 30
- 150000001875 compounds Chemical class 0.000 description 14
- 239000002659 electrodeposit Substances 0.000 description 13
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 159000000000 sodium salts Chemical class 0.000 description 9
- 125000004433 nitrogen atom Chemical group N* 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 150000003460 sulfonic acids Chemical class 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 3
- XSCHRSMBECNVNS-UHFFFAOYSA-N benzopyrazine Natural products N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 150000008053 sultones Chemical class 0.000 description 3
- FSSPGSAQUIYDCN-UHFFFAOYSA-N 1,3-Propane sultone Chemical compound O=S1(=O)CCCO1 FSSPGSAQUIYDCN-UHFFFAOYSA-N 0.000 description 2
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 2
- MUDSDYNRBDKLGK-UHFFFAOYSA-N 4-methylquinoline Chemical compound C1=CC=C2C(C)=CC=NC2=C1 MUDSDYNRBDKLGK-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- -1 dicyclic heterocyclic nitrogen compounds Chemical group 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- MHYFEEDKONKGEB-UHFFFAOYSA-N oxathiane 2,2-dioxide Chemical compound O=S1(=O)CCCCO1 MHYFEEDKONKGEB-UHFFFAOYSA-N 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920000136 polysorbate Polymers 0.000 description 2
- SMUQFGGVLNAIOZ-UHFFFAOYSA-N quinaldine Chemical compound C1=CC=CC2=NC(C)=CC=C21 SMUQFGGVLNAIOZ-UHFFFAOYSA-N 0.000 description 2
- IEIADDVJUYQKAZ-UHFFFAOYSA-N 1,8-naphthosultone Chemical compound C1=CC(S(=O)(=O)O2)=C3C2=CC=CC3=C1 IEIADDVJUYQKAZ-UHFFFAOYSA-N 0.000 description 1
- VEPOHXYIFQMVHW-XOZOLZJESA-N 2,3-dihydroxybutanedioic acid (2S,3S)-3,4-dimethyl-2-phenylmorpholine Chemical compound OC(C(O)C(O)=O)C(O)=O.C[C@H]1[C@@H](OCCN1C)c1ccccc1 VEPOHXYIFQMVHW-XOZOLZJESA-N 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- YDQJXVYGARVLRT-UHFFFAOYSA-N Lepidine Natural products C=1C=CC(CC=2NC=CN=2)=CC=1OC=1C(OC)=CC=CC=1CC1=NC=CN1 YDQJXVYGARVLRT-UHFFFAOYSA-N 0.000 description 1
- 238000005684 Liebig rearrangement reaction Methods 0.000 description 1
- 235000014676 Phragmites communis Nutrition 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- 241000272534 Struthio camelus Species 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- HPYNZHMRTTWQTB-UHFFFAOYSA-N dimethylpyridine Natural products CC1=CC=CN=C1C HPYNZHMRTTWQTB-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- RDOWQLZANAYVLL-UHFFFAOYSA-N phenanthrridine Natural products C1=CC=C2C3=CC=CC=C3C=NC2=C1 RDOWQLZANAYVLL-UHFFFAOYSA-N 0.000 description 1
- LFSXCDWNBUNEEM-UHFFFAOYSA-N phthalazine Chemical compound C1=NN=CC2=CC=CC=C21 LFSXCDWNBUNEEM-UHFFFAOYSA-N 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical compound N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/18—Heterocyclic compounds
Definitions
- This invention relates to additives for electroplating baths, and more particularly to nickel electroplating baths modified with internal salts of quaternary ammonium-N- alkyl-sulfonic acids.
- the internal salts used as additives for nickel electroplating baths in accordance with the present invention are formed by a reaction of tertiary monocyclic or dicyclic heterocyclic nitrogen compounds of the aromatic type, especially pyridine and its homologues, with lower 1,3- or 1,4-alkylsultones, especially propanesultone and 1,3- or 1,4-butanesultone.
- the reaction products formed thereby are internal salts of quaternary ammonium-N- propane-w-sulfonic acids or the corresponding butane-wsulfonic acids, depending upon the alkylsultone used, wherein the nitrogen atoms are members of an aromatic ring system.
- Such compounds may be produced in a very simple manner in accordance with the method described by Helberger in Liebigs Annalen, vol. 565, page 24, by reacting equimolar amounts of the above reactants in the presence of organic solvents or even in an aqueous medium. As a rule, this method produces excellent yields of the reaction product.
- the internal heterocyclic sulfonates can be readily isolated from the reaction mixture; they crystallize very readily and are very stable under virtually all conditions. When added to nickel electroplating baths, these internal salts effect marked improvement in the brightness and, above all, in the smoothness of the nickel electrodeposits produced from such modified baths.
- heterocyclic ring system is a C-substituted pyridine radical, such as a picoline, lutidine, ethylpyridine radical, and the like.
- those analogous compounds which contain a polycyclic heterocyclic radical in place of the pyridine or substituted pyridine radical such as a quinoline, isoquinoline, quinaldine, lepidine, acridine, phenanthridine radical, and the like, may also be used as modifiers of nickel electroplating baths in accordanct with the present invention.
- interna sulfonic acid salts of the above general class wherein th pyridine ring is replaced by a heterocyclic radical com prising more than one nitrogen atom in the ring, havt been found to be effective additives for nickel electro plating baths, such as the internal sulfonic acid salts o pyridazine, pyrimidine, pyrazine, phthalazine, quinazo line, quinoxaline, phenazine, and the like.
- the other nitrogen atoms in th heterocyclic ring system may also be linked to additiona internal alkylsulionic acid radicals of the type shown it the structural formula above.
- any of tht heterocyclic radicals recited herein may carry substituent: such as halogen, nitro-groups, and the like.
- 1,3-propanesultone or 1,3- and 1,4 butanesultone other sultones may be used to produce tht above-described class of additives for nickel electroplating baths.
- substituted sultones such as 1,1-di methyl-1,3-propanesultone (isopentanesultone) may bl reacted with the various types of heterocyclic compound; above described to produce internal salts of quaternary ammonium-N-dimethyl-propane-w-sulfonic acid.
- Sucl compounds are also effective additives for nickel electro plating baths and produce the above-mentioned advan tageous effects upon nickel electrodeposits.
- ternal sulfonic acid salts of heterocyclic compounds whicl have been analogously formed from cycloaliphatic sul tones such as tolylsultone, 1,8-naphthalenesultone, and tilt like, may also be used for the purpose herein set forth.
- the compounds herein described are addet to the nickel electroplating bath either as such, that is ii the form of the internal salt, or also in the form of th corresponding metal sulfonates produced by reacting thl internal salt with a suitable inorganic metal base, where by the cyclic sulfonic radical is cleaved to produce tht compound where Me represents the metal atom.
- the quantity 0 these compounds which is added to the nickel electroplat ing bath to achieve the desired results may range be tween 0.1 and 10 gm. per liter of bath, but amounts be tween 0.4 and 1 gm. per liter of bath are preferred. I1 general, the best results are obtained if the nickel is elec trodeposited from baths modified in accordance with th present invention at a temperature of about 60 C. am at current densities up to about 8 amp./dm.
- nickel electroplating baths modified solely wit] the above compounds will produce the desired improve ment in the nickel electrodeposits
- baths may addi tionally comprise known brighteners, porosity-preventin, agents, Wetting agents and/or salts which increase th conductivity of the bath.
- the nickel electroplating baths modified in accordano with our invention may be employed to deposit nickel or 11 types of metals and alloys, for example on iron, alumium, copper, brass and many more; moreover, the comounds may be added to nickel-plating baths employed in ll types of industrial nickehplating processes, including me drum-plating method.
- Example I 0.8 gm. of the inner salt of pyridinium-N-propane-wulfonic acid and from 4 to 8 gm. of the sodium salt of itolyl-disulfimide were added to each liter of a Wattslpe nickel electroplating bath and dissolved therein. Iron nd copper sheet metal were electroplated in this modied bath at a temperature of about 60 C. and an averge current density of 6 amp./dm. The sheet metal as provided with full-bright, ductile nickel deposits, iarked by a high degree of smoothness.
- Example II 0.2 gm./l. of the inner salt of the isoquinoliniurn-N- ropane-w-sulfonic acid were used instead of the inner alt of pyridinium-N-propane-w-sulfonic acid of Example A full-bright nickel deposit was obtained.
- Example III 0.2 gm./l. of the inner salt of the quinolinium-N- ropane-w-sulfonic acid were used instead of the inner alt of pyridinium-N-propane-w-sulfonic acid of Example A full-bright nickel deposit was obtained.
- Example IV 0.5 gm./l. of the inner salt of the Z-methyl-pyridiniuml-butane-w-sulfonic acid were used instead of the inner alt of pyridinium-N-propane-w-sulfonic acid of Example A full-bright nickel deposit was obtained.
- Example V 0.4 gm./l. of the inner salt of the 2,4-dimethyl-pyriinium-N-propane-w-sulfonic acid were used instead of ie inner salt of pyridinium-N-propane-w-sulfonic acid f
- Example I A full-bright nickel deposit was obtained.
- Example VI 0.1 gm./l. of the inner salt of the 3-bromo-pyridiniumi-propane-w-sulfonic acid were used instead of the inner ilt of pyridinium-N-propane-w-sulfonic acid of Example A full-bright nickel deposit was obtained.
- Example VII 0.05 gm./l. of the inner salt of the acridinium-N-proane-w-sulfonic acid were used instead of the inner salt E pyridinium-N-propane-w-sulfonic acid of Example I. full-bright nickel deposit was obtained.
- Example VIII 0.15 gm./l. of the inner salt of the pyrazinium-N- utane-w-snlfonic acid were used instead of the inner llt of pyridinium-N-propane-w-sulfonic acid of Exnple I. A full-bright nickel deposit was obtained.
- Example X 8 gm./l. of the sodium salt of di-o-tolyl disulfimide were substituted for the sodium salt of ditolyl disulfimide. A full-bright nickel deposit was obtained.
- Example X I 6 gm./l. of the sodium salt of dibenzene disulfimide were substituted for the sodium salt of ditolyl disulfimide. A full-bright nickel deposit was obtained.
- An acid Watts-type nickel electroplating bath having dissolved therein a heterocyclic compound having the general structural formula selected from the group consisting of and RiSO- Me R ⁇ wherein R N is a heterocyclic radical, R being a cyclic radical with 0 to 1 ring nitrogen atoms, the remainder being carbon atoms, and R is selected from the group consisting of lower aliphatic, cycloaliphatic and aromatic radicals, and Me is an alkali metal atom, said compound being present in an amount sufiicient to produce smooth and ductile nickel electrodeposits.
- An acid Watts-type nickel electroplating bath having dissolved therein about 0.ll0 grams per liter of an internal salt of pyridinium-N-alkylsulfonic acid having the structural formula wherein R is a lower alkyl radical having from 3 to 4 carbon atoms.
- An acid Watts-type nickel electroplating bath having dissolved therein about 0.1-l0 grams per liter of the internal salt of pyridinium-N-propane-w-sulfonic acid.
- An acid Watts-type nickel electroplating bath as in claim 3, comprising in addition from about 4 to 8 grams per liter of a compound selected from the group consisting of diarylsulfimides and their water-soluble salts.
- the method of producing bright and smooth nickel electrodeposits on metal objects which comprises electroplating said objects in an acid Watts-type nickel bath having dissolved therein a heterocyclic compound having the general structural formula selected from the group consisting of is a heterocyclic radical, R being a cyclic radical with 0 to 1 ring nitrogen atoms, the remainder being carbon atoms, and R is selected from the group consisting of lower aliphatic, cycloaliphatic and aromatic radicals, and Me is an alkali metal atom, said compound being present in an amount sufficient to produce smooth and ductile nickel electrodeposits.
- a heterocyclic compound having the general structural formula selected from the group consisting of is a heterocyclic radical, R being a cyclic radical with 0 to 1 ring nitrogen atoms, the remainder being carbon atoms, and R is selected from the group consisting of lower aliphatic, cycloaliphatic and aromatic radicals, and Me is an alkali metal atom, said compound being present in an amount sufficient to produce smooth
- the method of producing bright and smooth nickel electrodeposits on metal objects which comprises electroplating said objects in an acid Watts-type nickel bath having dissolved therein about 0.1- grams per liter of an internal salt of pyridinium-N alkylsulfonic acid having the structural formula its wherein R, is a lower alkyl radical having from 3 to 4 carbon atoms.
- the method of producing bright and smooth nickel electrodeposits on metal objects which comprises electroplating said objects in an acid Watts-type nickel bath having dissolved therein about 0.1-10 grams per liter of the internal salt of pyridinium-N-propane-w-sulfonic acid.
- the method of producing bright and smooth nickel electrodeposits on metal objects which comprises electroplating said objects in an acid Watts-type nickel bath having dissolved therein about 0.1-10 grams per liter of the internal salt of pyridinium-N-propane-w-sulfonic acid and from about 4 to 8 grams per liter of a compound selected from the group consisting of diarylsulfimides and their water-soluble salts.
- the method of producing bright and smooth nickel electrodeposits on metal objects which comprises elec' troplating said objects in an acid Watts-type nickel bath having dissolved therein about 0.11() grams per liter of the internal salt of pyridinium-N-propane-w-sulfonic acid and from about 4 to 8 grams per liter of the sodium salt of ditolyl-sulfimide.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DED20039A DE1004011B (de) | 1955-03-16 | 1955-03-16 | Saures galvanisches Nickelbad |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US2876177A true US2876177A (en) | 1959-03-03 |
Family
ID=7036582
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US571125A Expired - Lifetime US2876177A (en) | 1955-03-16 | 1956-03-13 | Additives for nickel electroplating baths |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US2876177A (enrdf_load_stackoverflow) |
| BE (1) | BE545564A (enrdf_load_stackoverflow) |
| CH (1) | CH341691A (enrdf_load_stackoverflow) |
| DE (1) | DE1004011B (enrdf_load_stackoverflow) |
| FR (1) | FR1143382A (enrdf_load_stackoverflow) |
| GB (1) | GB815916A (enrdf_load_stackoverflow) |
| NL (2) | NL205377A (enrdf_load_stackoverflow) |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3122490A (en) * | 1961-06-12 | 1964-02-25 | Dehydag Gmbh | Procedure for regeneration of nickel baths |
| US3261772A (en) * | 1963-12-17 | 1966-07-19 | Sture Granberger Fa | Nickel electroplating bath and process |
| US3314868A (en) * | 1963-05-15 | 1967-04-18 | Dehydag Gmbh | Acid nickel electroplating baths and processes |
| US3349015A (en) * | 1963-07-17 | 1967-10-24 | M & T Chemicals Inc | Electrodeposition of bright nickel |
| US3423296A (en) * | 1964-10-08 | 1969-01-21 | Enthone | Nickel electrodepositing baths,process,and additive composition comprising levelling agent therefor |
| US3444056A (en) * | 1966-06-24 | 1969-05-13 | Cilag Chemie | Nickel electroplating electrolyte |
| US3457146A (en) * | 1964-10-08 | 1969-07-22 | Enthone | Process of electrodepositing nickel and electrolyte and additive composition therefor |
| US3862019A (en) * | 1974-04-26 | 1975-01-21 | R O Hull & Company Inc | Composition of electroplating bath for the electrodeposition of bright nickel |
| US4430171A (en) | 1981-08-24 | 1984-02-07 | M&T Chemicals Inc. | Electroplating baths for nickel, iron, cobalt and alloys thereof |
| US4638005A (en) * | 1983-03-18 | 1987-01-20 | The Coca-Cola Company | Monoquaternized pyrazinium compounds and their use as electron carriers in photosynthetic processes |
| US5024736A (en) * | 1988-05-25 | 1991-06-18 | Raschig Ag | Process for electroplating utilizing disubstituted ethane sulfonic compounds as electroplating auxiliaries and electroplating auxiliaries containing same |
| WO1991016474A1 (de) * | 1990-04-23 | 1991-10-31 | Schering Aktiengesellschaft | Saure nickelbäder, enthaltend 1-(2-sulfoethyl)-pyridiniumbetain |
| US5165971A (en) * | 1989-02-03 | 1992-11-24 | Kemifar S.P.A. | Activating composition for plating of electrically insulative substrates and method for plating of such substrates using said composition |
| US5417840A (en) * | 1993-10-21 | 1995-05-23 | Mcgean-Rohco, Inc. | Alkaline zinc-nickel alloy plating baths |
| US20040154928A1 (en) * | 2003-02-07 | 2004-08-12 | Pavco, Inc. | Use of N-allyl substituted amines and their salts as brightening agents in nickel plating baths |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL132763C (enrdf_load_stackoverflow) * | 1961-02-10 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2469727A (en) * | 1944-03-30 | 1949-05-10 | Du Pont | Electrodeposition of nickel |
| US2647866A (en) * | 1950-07-17 | 1953-08-04 | Udylite Corp | Electroplating of nickel |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA463174A (en) * | 1950-02-14 | Canadian Industries Limited | Electrodeposition of nickel | |
| BE504701A (enrdf_load_stackoverflow) * | 1950-07-17 |
-
0
- BE BE545564D patent/BE545564A/xx unknown
- NL NL100419D patent/NL100419C/xx active
- NL NL205377D patent/NL205377A/xx unknown
-
1955
- 1955-03-16 DE DED20039A patent/DE1004011B/de active Pending
-
1956
- 1956-02-22 CH CH341691D patent/CH341691A/de unknown
- 1956-03-09 GB GB7388/56A patent/GB815916A/en not_active Expired
- 1956-03-13 US US571125A patent/US2876177A/en not_active Expired - Lifetime
- 1956-03-14 FR FR1143382D patent/FR1143382A/fr not_active Expired
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2469727A (en) * | 1944-03-30 | 1949-05-10 | Du Pont | Electrodeposition of nickel |
| US2647866A (en) * | 1950-07-17 | 1953-08-04 | Udylite Corp | Electroplating of nickel |
Cited By (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3122490A (en) * | 1961-06-12 | 1964-02-25 | Dehydag Gmbh | Procedure for regeneration of nickel baths |
| US3314868A (en) * | 1963-05-15 | 1967-04-18 | Dehydag Gmbh | Acid nickel electroplating baths and processes |
| US3349015A (en) * | 1963-07-17 | 1967-10-24 | M & T Chemicals Inc | Electrodeposition of bright nickel |
| US3261772A (en) * | 1963-12-17 | 1966-07-19 | Sture Granberger Fa | Nickel electroplating bath and process |
| US3423296A (en) * | 1964-10-08 | 1969-01-21 | Enthone | Nickel electrodepositing baths,process,and additive composition comprising levelling agent therefor |
| US3457146A (en) * | 1964-10-08 | 1969-07-22 | Enthone | Process of electrodepositing nickel and electrolyte and additive composition therefor |
| US3444056A (en) * | 1966-06-24 | 1969-05-13 | Cilag Chemie | Nickel electroplating electrolyte |
| US3862019A (en) * | 1974-04-26 | 1975-01-21 | R O Hull & Company Inc | Composition of electroplating bath for the electrodeposition of bright nickel |
| US4430171A (en) | 1981-08-24 | 1984-02-07 | M&T Chemicals Inc. | Electroplating baths for nickel, iron, cobalt and alloys thereof |
| US4638005A (en) * | 1983-03-18 | 1987-01-20 | The Coca-Cola Company | Monoquaternized pyrazinium compounds and their use as electron carriers in photosynthetic processes |
| US5024736A (en) * | 1988-05-25 | 1991-06-18 | Raschig Ag | Process for electroplating utilizing disubstituted ethane sulfonic compounds as electroplating auxiliaries and electroplating auxiliaries containing same |
| JP2505281B2 (ja) | 1988-05-25 | 1996-06-05 | ラシーグ アーゲー | 電気メッキ用助剤としての２―置換エタンスルホン化合物の使用 |
| US5165971A (en) * | 1989-02-03 | 1992-11-24 | Kemifar S.P.A. | Activating composition for plating of electrically insulative substrates and method for plating of such substrates using said composition |
| WO1991016474A1 (de) * | 1990-04-23 | 1991-10-31 | Schering Aktiengesellschaft | Saure nickelbäder, enthaltend 1-(2-sulfoethyl)-pyridiniumbetain |
| US5264112A (en) * | 1990-04-23 | 1993-11-23 | Atotech Deutschland Gmbh | Acidic nickel baths containing 1-(2-sulfoethyl)-pyridiniumbetaine |
| JP3199729B2 (ja) | 1990-04-23 | 2001-08-20 | アトテク ドイチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング | １―（２―スルホエチル）―ピリジニウムベタインを含有する酸性ニッケル浴 |
| US5417840A (en) * | 1993-10-21 | 1995-05-23 | Mcgean-Rohco, Inc. | Alkaline zinc-nickel alloy plating baths |
| US20040154928A1 (en) * | 2003-02-07 | 2004-08-12 | Pavco, Inc. | Use of N-allyl substituted amines and their salts as brightening agents in nickel plating baths |
| US7300563B2 (en) | 2003-02-07 | 2007-11-27 | Pavco, Inc. | Use of N-alllyl substituted amines and their salts as brightening agents in nickel plating baths |
Also Published As
| Publication number | Publication date |
|---|---|
| FR1143382A (fr) | 1957-09-30 |
| GB815916A (en) | 1959-07-01 |
| DE1004011B (de) | 1957-03-07 |
| CH341691A (de) | 1959-10-15 |
| BE545564A (enrdf_load_stackoverflow) | |
| NL100419C (enrdf_load_stackoverflow) | |
| NL205377A (enrdf_load_stackoverflow) |
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