GB784001A - Positive diazotype printing plates - Google Patents

Positive diazotype printing plates

Info

Publication number
GB784001A
GB784001A GB15451/55A GB1545155A GB784001A GB 784001 A GB784001 A GB 784001A GB 15451/55 A GB15451/55 A GB 15451/55A GB 1545155 A GB1545155 A GB 1545155A GB 784001 A GB784001 A GB 784001A
Authority
GB
United Kingdom
Prior art keywords
diazo
cellulose
copolymer
exposed
offset
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB15451/55A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GAF Chemicals Corp
Original Assignee
General Aniline and Film Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Aniline and Film Corp filed Critical General Aniline and Film Corp
Publication of GB784001A publication Critical patent/GB784001A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
GB15451/55A 1954-08-20 1955-05-27 Positive diazotype printing plates Expired GB784001A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US451271A US2772972A (en) 1954-08-20 1954-08-20 Positive diazotype printing plates

Publications (1)

Publication Number Publication Date
GB784001A true GB784001A (en) 1957-10-02

Family

ID=23791529

Family Applications (1)

Application Number Title Priority Date Filing Date
GB15451/55A Expired GB784001A (en) 1954-08-20 1955-05-27 Positive diazotype printing plates

Country Status (7)

Country Link
US (1) US2772972A (es)
BE (1) BE540225A (es)
CH (1) CH347712A (es)
DE (1) DE1108079B (es)
FR (1) FR1134857A (es)
GB (1) GB784001A (es)
NL (2) NL95407C (es)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3634086A (en) * 1966-05-31 1972-01-11 Howson Algraphy Ltd Solvent development of light-sensitive diazo layers

Families Citing this family (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE507657A (es) * 1950-12-06
GB907718A (en) * 1957-11-01 1962-10-10 Lithoplate Inc Hydrophilic base plates for diazo presensitized lithographic printing plates
US2993788A (en) * 1958-06-17 1961-07-25 Gen Aniline & Film Corp Multicolor reproduction using light sensitive diazo oxides
US3130051A (en) * 1958-12-10 1964-04-21 Gen Aniline & Film Corp Process for producing negative working offset diazo printing plates
DE1095665B (de) * 1959-01-12 1960-12-22 Hans Hoerner Verfahren zur fotomechanischen Herstellung von Hochdruckformen aus mehreren Kunststoffschichten
US3095301A (en) * 1959-04-06 1963-06-25 Gen Aniline & Film Corp Electrophotographic element
US3173788A (en) * 1960-02-10 1965-03-16 Gen Aniline & Film Corp Developing positive working photolitho-graphic printing plates containing diazo oxides
US3164468A (en) * 1960-06-06 1965-01-05 Gen Aniline & Film Corp Photomechanical reversal process and foil and dyes for use therein
US3086861A (en) * 1960-07-01 1963-04-23 Gen Aniline & Film Corp Printing plates comprising ink receptive azo dye surfaces
US3149972A (en) * 1960-08-16 1964-09-22 Gen Aniline & Film Corp Diazo and resinous coupler printing plates for photomechanical reproduction
BE612386A (es) * 1961-01-09
BE620660A (es) * 1961-07-28
CA774047A (en) * 1963-12-09 1967-12-19 Shipley Company Light-sensitive material and process for the development thereof
US3486450A (en) * 1964-02-27 1969-12-30 Eastman Kodak Co Color proofing system
DE1472771A1 (de) * 1965-07-30 1969-01-02 Adox Du Pont Fotowerke Verfahren zur Herstellung von masshaltigen photographischen Filmen
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
US3474719A (en) * 1966-04-15 1969-10-28 Gaf Corp Offset printing plates
NL136645C (es) * 1966-12-12
US3637384A (en) * 1969-02-17 1972-01-25 Gaf Corp Positive-working diazo-oxide terpolymer photoresists
US3920455A (en) * 1971-05-28 1975-11-18 Polychrome Corp Light-sensitive compositions and materials with O-naphthoquinone diazide sulfonyl esters
JPS521663B2 (es) * 1973-02-10 1977-01-17
JPS5421089B2 (es) * 1973-05-29 1979-07-27
GB1482921A (en) * 1973-07-31 1977-08-17 Glaxo Lab Ltd Polymers
GB2036993B (en) * 1978-02-06 1983-03-09 Napp Systems Inc Desensitizing solution and process for treating a diazo photosensitive printing plate
CA1180931A (en) * 1980-09-15 1985-01-15 Robert W. Hallman Bilayer photosensitive imaging article including film-forming bimodal styrene-maleic anhydride copolymer in the image layer
AU8173487A (en) * 1986-10-20 1988-05-06 Macdermid, Incorporated Image reversal system and process
EP0280197A3 (en) * 1987-02-23 1990-05-23 Oki Electric Industry Company, Limited Process for forming photoresist pattern
DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
US5314782A (en) * 1993-03-05 1994-05-24 Morton International, Inc. Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative
US5308744A (en) * 1993-03-05 1994-05-03 Morton International, Inc. Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives
JPH0876380A (ja) 1994-09-06 1996-03-22 Fuji Photo Film Co Ltd ポジ型印刷版組成物
JP3522923B2 (ja) 1995-10-23 2004-04-26 富士写真フイルム株式会社 ハロゲン化銀感光材料
DE29724584U1 (de) 1996-04-23 2002-04-18 Kodak Polychrome Graphics Co. Ltd., Norwalk, Conn. Wärmeempfindliche Zusammensetzung und damit hergestellter Vorläufer einer Lithographie-Druckform
TW502135B (en) 1996-05-13 2002-09-11 Sumitomo Bakelite Co Positive type photosensitive resin composition and process for preparing polybenzoxazole resin film by using the same
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
GB9622657D0 (en) 1996-10-31 1997-01-08 Horsell Graphic Ind Ltd Direct positive lithographic plate
EP0852341B1 (en) 1997-01-03 2001-08-29 Sumitomo Bakelite Company Limited Method for the pattern-processing of photosensitive resin composition
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
JP2002511955A (ja) 1997-07-05 2002-04-16 コダック・ポリクローム・グラフィックス・エルエルシー パターン形成方法
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US6045963A (en) * 1998-03-17 2000-04-04 Kodak Polychrome Graphics Llc Negative-working dry planographic printing plate
US6296982B1 (en) 1999-11-19 2001-10-02 Kodak Polychrome Graphics Llc Imaging articles
US6908717B2 (en) * 2000-10-31 2005-06-21 Sumitomo Bakelite Company Limited Positive photosensitive resin composition, process for its preparation, and semiconductor devices
JP5030425B2 (ja) * 2004-01-20 2012-09-19 旭化成イーマテリアルズ株式会社 樹脂及び樹脂組成物
JP5034269B2 (ja) 2005-03-31 2012-09-26 大日本印刷株式会社 パターン形成材料、及びポリイミド前駆体樹脂組成物
US7687208B2 (en) 2006-08-15 2010-03-30 Asahi Kasei Emd Corporation Positive photosensitive resin composition
CN107850844B (zh) 2016-03-31 2021-09-07 旭化成株式会社 感光性树脂组合物、固化浮雕图案的制造方法和半导体装置
CN112142613B (zh) * 2020-09-22 2021-06-25 江南大学 一种松香基小分子有机凝胶剂及其形成的环己烷凝胶

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE525534C (de) * 1930-07-09 1931-05-26 Klimsch & Co Verfahren zum Entwickeln von Chromat-Schellackkopien
BE416158A (es) * 1935-01-12
DE699462C (de) * 1936-02-15 1940-11-29 Kodak Akt Ges Photographischer Film mit Haftschicht fuer die lichtempfindliche Emulsion
DE754015C (de) * 1940-02-24 1953-05-11 Johannes Dr Albrecht Lichtempfindliche Schicht zur Herstellung von Druckformen
DE862956C (de) * 1941-10-30 1953-01-15 Basf Ag Verfahren zur Herstellung von Mischpolymerisaten
BE476486A (es) * 1947-05-09
NL70798C (es) * 1948-10-15
BE510151A (es) * 1949-07-23
DE960335C (de) * 1951-06-07 1957-03-21 Kalle & Co Ag Lichtempfindliches Material
DE904733C (de) * 1951-09-29 1954-02-22 Johannes Herzog & Co Photochem Lichtempfindliches Material fuer die Herstellung von Quellreliefs fuer Druckzwecke und Verfahren zum Drucken mit den Reliefs
BE523231A (es) * 1953-05-22

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3634086A (en) * 1966-05-31 1972-01-11 Howson Algraphy Ltd Solvent development of light-sensitive diazo layers

Also Published As

Publication number Publication date
DE1108079B (de) 1961-05-31
US2772972A (en) 1956-12-04
NL199728A (es)
FR1134857A (fr) 1957-04-18
BE540225A (es)
NL95407C (es)
CH347712A (de) 1960-07-15

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