GB2163458B - Controlling arc spot in arc evaporation - Google Patents

Controlling arc spot in arc evaporation

Info

Publication number
GB2163458B
GB2163458B GB08520079A GB8520079A GB2163458B GB 2163458 B GB2163458 B GB 2163458B GB 08520079 A GB08520079 A GB 08520079A GB 8520079 A GB8520079 A GB 8520079A GB 2163458 B GB2163458 B GB 2163458B
Authority
GB
United Kingdom
Prior art keywords
arc
controlling
spot
evaporation
arc evaporation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08520079A
Other languages
English (en)
Other versions
GB2163458A (en
GB8520079D0 (en
Inventor
Jnr Charles F Morrison
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vac Tec Systems Inc
Original Assignee
Vac Tec Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vac Tec Systems Inc filed Critical Vac Tec Systems Inc
Publication of GB8520079D0 publication Critical patent/GB8520079D0/en
Publication of GB2163458A publication Critical patent/GB2163458A/en
Application granted granted Critical
Publication of GB2163458B publication Critical patent/GB2163458B/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H05H1/50—Generating plasma using an arc and using applied magnetic fields, e.g. for focusing or rotating the arc

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Vapour Deposition (AREA)
GB08520079A 1984-08-13 1985-08-09 Controlling arc spot in arc evaporation Expired GB2163458B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/640,353 US4724058A (en) 1984-08-13 1984-08-13 Method and apparatus for arc evaporating large area targets

Publications (3)

Publication Number Publication Date
GB8520079D0 GB8520079D0 (en) 1985-09-18
GB2163458A GB2163458A (en) 1986-02-26
GB2163458B true GB2163458B (en) 1988-06-08

Family

ID=24567902

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08520079A Expired GB2163458B (en) 1984-08-13 1985-08-09 Controlling arc spot in arc evaporation

Country Status (8)

Country Link
US (1) US4724058A (enExample)
JP (1) JPH072988B2 (enExample)
BE (1) BE903045A (enExample)
CA (1) CA1278773C (enExample)
DE (1) DE3528677A1 (enExample)
FR (1) FR2568896B1 (enExample)
GB (1) GB2163458B (enExample)
NL (1) NL193563C (enExample)

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US5587207A (en) * 1994-11-14 1996-12-24 Gorokhovsky; Vladimir I. Arc assisted CVD coating and sintering method
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CH689558A5 (de) 1995-07-11 1999-06-15 Erich Bergmann Bedampfungsanlage und Verdampfereinheit.
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US6036828A (en) * 1997-08-30 2000-03-14 United Technologies Corporation Apparatus for steering the arc in a cathodic arc coater
US6009829A (en) * 1997-08-30 2000-01-04 United Technologies Corporation Apparatus for driving the arc in a cathodic arc coater
US5932078A (en) * 1997-08-30 1999-08-03 United Technologies Corporation Cathodic arc vapor deposition apparatus
DE19853943B4 (de) * 1997-11-26 2006-04-20 Vapor Technologies, Inc. (Delaware Corporation), Longmont Katode zur Zerstäubung oder Bogenaufdampfung sowie Vorrichtung zur Beschichtung oder Ionenimplantation mit einer solchen Katode
JPH11200017A (ja) * 1998-01-20 1999-07-27 Nikon Corp 光学薄膜成膜装置およびこの光学薄膜成膜装置により成膜された光学素子
US6103074A (en) * 1998-02-14 2000-08-15 Phygen, Inc. Cathode arc vapor deposition method and apparatus
US6645354B1 (en) 2000-04-07 2003-11-11 Vladimir I. Gorokhovsky Rectangular cathodic arc source and method of steering an arc spot
CA2268659C (en) * 1999-04-12 2008-12-30 Vladimir I. Gorokhovsky Rectangular cathodic arc source and method of steering an arc spot
US6929727B2 (en) * 1999-04-12 2005-08-16 G & H Technologies, Llc Rectangular cathodic arc source and method of steering an arc spot
RU2164549C2 (ru) * 1999-05-27 2001-03-27 Всероссийский научно-исследовательский институт авиационных материалов Способ испарения и конденсации токопроводящих материалов
CA2305938C (en) * 2000-04-10 2007-07-03 Vladimir I. Gorokhovsky Filtered cathodic arc deposition method and apparatus
US7300559B2 (en) * 2000-04-10 2007-11-27 G & H Technologies Llc Filtered cathodic arc deposition method and apparatus
JP4085593B2 (ja) 2001-03-29 2008-05-14 日新電機株式会社 真空アーク蒸着装置
DE10127013A1 (de) * 2001-06-05 2002-12-12 Gabriel Herbert M Lichtbogen-Verdampfungsvorrichtung
US6936145B2 (en) * 2002-02-28 2005-08-30 Ionedge Corporation Coating method and apparatus
US7866342B2 (en) * 2002-12-18 2011-01-11 Vapor Technologies, Inc. Valve component for faucet
US8555921B2 (en) * 2002-12-18 2013-10-15 Vapor Technologies Inc. Faucet component with coating
US7866343B2 (en) * 2002-12-18 2011-01-11 Masco Corporation Of Indiana Faucet
US8220489B2 (en) 2002-12-18 2012-07-17 Vapor Technologies Inc. Faucet with wear-resistant valve component
JP4356365B2 (ja) * 2003-06-09 2009-11-04 日新電機株式会社 真空アーク蒸着装置
US20050176251A1 (en) * 2004-02-05 2005-08-11 Duong Chau H. Polishing pad with releasable slick particles
US8038858B1 (en) 2004-04-28 2011-10-18 Alameda Applied Sciences Corp Coaxial plasma arc vapor deposition apparatus and method
US7867366B1 (en) 2004-04-28 2011-01-11 Alameda Applied Sciences Corp. Coaxial plasma arc vapor deposition apparatus and method
WO2007068768A1 (es) 2005-12-16 2007-06-21 Fundacion Tekniker Máquina de evaporación catódica
EP2018653B1 (de) * 2006-05-16 2014-08-06 Oerlikon Trading AG, Trübbach Arcquelle und magnetanordnung
US8443519B2 (en) * 2006-09-15 2013-05-21 The Gillette Company Blade supports for use in shaving systems
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JP2012112040A (ja) * 2010-11-05 2012-06-14 Shin-Etsu Chemical Co Ltd スパッタ装置用磁気回路
US10304665B2 (en) 2011-09-07 2019-05-28 Nano-Product Engineering, LLC Reactors for plasma-assisted processes and associated methods
JP5689051B2 (ja) * 2011-11-25 2015-03-25 株式会社神戸製鋼所 イオンボンバードメント装置
US10665437B2 (en) 2015-02-10 2020-05-26 Hamilton Sundstrand Corporation System and method for enhanced ion pump lifespan
WO2019081053A1 (en) * 2017-10-03 2019-05-02 Oerlikon Surface Solutions Ag, Pfäffikon ARC SOURCE
DE102020124269A1 (de) * 2020-09-17 2022-03-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Vorrichtung und Verfahren zum Abscheiden harter Kohlenstoffschichten

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Also Published As

Publication number Publication date
DE3528677C2 (enExample) 1990-05-17
NL193563B (nl) 1999-10-01
JPH072988B2 (ja) 1995-01-18
CA1278773C (en) 1991-01-08
DE3528677A1 (de) 1986-02-20
FR2568896A1 (fr) 1986-02-14
NL193563C (nl) 2000-02-02
FR2568896B1 (fr) 1993-08-13
GB2163458A (en) 1986-02-26
JPS6187865A (ja) 1986-05-06
GB8520079D0 (en) 1985-09-18
US4724058A (en) 1988-02-09
BE903045A (nl) 1985-12-02
NL8502229A (nl) 1986-03-03

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20020809