GB1562966A - Manufacture of fumed silica - Google Patents
Manufacture of fumed silica Download PDFInfo
- Publication number
- GB1562966A GB1562966A GB17325/77A GB1732577A GB1562966A GB 1562966 A GB1562966 A GB 1562966A GB 17325/77 A GB17325/77 A GB 17325/77A GB 1732577 A GB1732577 A GB 1732577A GB 1562966 A GB1562966 A GB 1562966A
- Authority
- GB
- United Kingdom
- Prior art keywords
- organosilane
- gas
- oxygen
- amount
- fumed silica
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 22
- 229910021485 fumed silica Inorganic materials 0.000 title claims description 18
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000007789 gas Substances 0.000 claims description 40
- 150000001282 organosilanes Chemical class 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 30
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 22
- 239000001301 oxygen Substances 0.000 claims description 22
- 229910052760 oxygen Inorganic materials 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 17
- 239000007788 liquid Substances 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 15
- 238000002485 combustion reaction Methods 0.000 claims description 12
- 239000005055 methyl trichlorosilane Substances 0.000 claims description 12
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 claims description 12
- 238000001704 evaporation Methods 0.000 claims description 9
- 230000008020 evaporation Effects 0.000 claims description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 6
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 6
- 238000009835 boiling Methods 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 4
- 239000002245 particle Substances 0.000 claims description 4
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical compound C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 claims description 3
- 239000001294 propane Substances 0.000 claims description 3
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical group C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 claims description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- 229910000077 silane Inorganic materials 0.000 claims 1
- 239000003570 air Substances 0.000 description 9
- 238000006460 hydrolysis reaction Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000007062 hydrolysis Effects 0.000 description 4
- 150000003377 silicon compounds Chemical class 0.000 description 4
- 238000002156 mixing Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 238000004438 BET method Methods 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 1
- 239000003034 coal gas Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000005048 methyldichlorosilane Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000012763 reinforcing filler Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2620737A DE2620737C2 (de) | 1976-05-11 | 1976-05-11 | Verfahren zum Herstellen von hochdispersem Siliciumdioxid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1562966A true GB1562966A (en) | 1980-03-19 |
Family
ID=5977606
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB17325/77A Expired GB1562966A (en) | 1976-05-11 | 1977-04-26 | Manufacture of fumed silica |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4108964A (enExample) |
| JP (1) | JPS52148500A (enExample) |
| BE (1) | BE854392A (enExample) |
| DE (1) | DE2620737C2 (enExample) |
| FR (1) | FR2351052A1 (enExample) |
| GB (1) | GB1562966A (enExample) |
| NL (1) | NL7704373A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2168967A (en) * | 1984-11-19 | 1986-07-02 | Ube Industries | Process for producing metal oxide particles having a very small and uniform size |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2909815C2 (de) * | 1979-03-13 | 1984-11-22 | Wacker-Chemie GmbH, 8000 München | Verfahren zur Herstellung von hochdispersem Siliciumdioxid |
| US4292290A (en) * | 1980-04-16 | 1981-09-29 | Cabot Corporation | Process for the production of finely-divided metal and metalloid oxides |
| DE3050746C2 (de) | 1980-04-25 | 1985-03-14 | Degussa Ag, 6000 Frankfurt | Verfahren zur pyrogenen Herstellung von Kieselsäure |
| DE3016010C2 (de) * | 1980-04-25 | 1985-01-10 | Degussa Ag, 6000 Frankfurt | Verfahren zur pyrogenen Herstellung von Kieselsäure |
| DE3223454A1 (de) * | 1982-06-23 | 1983-12-29 | Wacker-Chemie GmbH, 8000 München | Verfahren zur herstellung von pyrogenerzeugter kieselsaeure mit verstaerkter verdickungswirkung |
| US4801437A (en) * | 1985-12-04 | 1989-01-31 | Japan Oxygen Co., Ltd. | Process for treating combustible exhaust gases containing silane and the like |
| US4778500A (en) * | 1987-08-11 | 1988-10-18 | Research Foundation Of The City University Of New York | Laser initiated chain reactions for producing a sintered product |
| US5123836A (en) * | 1988-07-29 | 1992-06-23 | Chiyoda Corporation | Method for the combustion treatment of toxic gas-containing waste gas |
| DE4240741A1 (de) * | 1992-12-03 | 1994-06-09 | Wacker Chemie Gmbh | Verfahren zur Hydrophobierung von pyrogen hergestelltem Siliciumdioxid |
| US5340560A (en) * | 1993-04-30 | 1994-08-23 | General Electric Company | Method for making fumed silica having a reduced aggregate size and product |
| DE4419234A1 (de) * | 1994-06-01 | 1995-12-07 | Wacker Chemie Gmbh | Verfahren zur Silylierung von anorganischen Oxiden |
| JP3480083B2 (ja) * | 1994-10-11 | 2003-12-15 | 信越化学工業株式会社 | 微細シリカの製造方法 |
| DE19530339A1 (de) * | 1995-08-18 | 1997-02-20 | Degussa | Pyrogene Kieselsäure, Verfahren zu ihrer Herstellung und Verwendung |
| US5876683A (en) * | 1995-11-02 | 1999-03-02 | Glumac; Nicholas | Combustion flame synthesis of nanophase materials |
| DE19605672C1 (de) * | 1996-02-15 | 1997-09-25 | Wacker Chemie Gmbh | Verfahren zur Herstellung von Siliciumdioxid |
| US6322765B1 (en) | 1996-02-15 | 2001-11-27 | Wacker-Chemie Gmbh | Process for preparing silicon dioxide |
| US5945211A (en) | 1996-02-22 | 1999-08-31 | Mitsui Mining And Smelting Co., Ltd. | Composite material carrying zinc oxide fine particles adhered thereto and method for preparing same |
| DE19756840A1 (de) * | 1997-01-23 | 1998-07-30 | Degussa | Pyrogene Oxide und Verfahren zu ihrer Herstellung |
| US6224834B1 (en) | 1998-04-16 | 2001-05-01 | International Business Machines Corporation | Silane oxidation exhaust trap |
| JP3750728B2 (ja) | 2000-12-05 | 2006-03-01 | 信越化学工業株式会社 | 微細シリカの製造方法 |
| DE10258857A1 (de) | 2002-12-17 | 2004-07-08 | Degussa Ag | Pyrogen hergestelltes Siliciumdioxid und Dispersion hiervon |
| DE102006009953A1 (de) | 2006-03-03 | 2007-09-06 | Wacker Chemie Ag | Verfahren zur Wiederverwertung von hochsiedenden Verbindungen innerhalb eines Chlorsilanverbundes |
| US7910081B2 (en) * | 2006-04-28 | 2011-03-22 | Cabot Corporation | Process for the production of fumed silica |
| DE102006030002A1 (de) * | 2006-06-29 | 2008-01-03 | Wacker Chemie Ag | Herstellung pyrogener Metalloxide in temperierten Reaktionskammern |
| DE102007024963A1 (de) | 2007-05-30 | 2008-12-04 | Wacker Polymer Systems Gmbh & Co. Kg | Verfahren zur Herstellung von dämmenden Beschichtungen |
| RU2378194C2 (ru) * | 2008-02-06 | 2010-01-10 | Федеральное государственное унитарное предприятие "Государственный ордена Трудового Красного Знамени научно-исследовательский институт химии и технологии элементоорганических соединений" (ФГУП ГНИИХТЭОС) | Реактор синтеза диоксида кремния и способ его получения пламенным гидролизом |
| DE102011004744A1 (de) | 2011-02-25 | 2012-08-30 | Wacker Chemie Ag | Vorrichtung und Verfahren zur Bestimmung einer Gaskonzentration in einem strömenden Gasgemisch |
| DE102011084048A1 (de) | 2011-10-05 | 2013-04-11 | Wacker Chemie Ag | Polymerpulver enthaltende Baustofftrockenformulierungen |
| CN109312106A (zh) | 2016-04-26 | 2019-02-05 | 道达尔研究技术弗吕公司 | 包括纳米颗粒的聚烯烃组合物 |
| CN106241821B (zh) * | 2016-07-21 | 2018-07-03 | 宜昌南玻硅材料有限公司 | 一种纳米级气相法白炭黑原料的混合装置及方法 |
| WO2018068839A1 (de) | 2016-10-12 | 2018-04-19 | Wacker Chemie Ag | Hydrophobierende additive |
| KR102284997B1 (ko) | 2017-07-13 | 2021-08-05 | 와커 헤미 아게 | 고 분산된 이산화규소의 제조 방법 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA706807A (en) * | 1965-03-30 | L. Flemmert Gosta | Method of recovering silicon dioxide | |
| DE900339C (de) * | 1951-07-05 | 1953-12-21 | Degussa | Verfahren und Vorrichtung zur Herstellung von kolloidaler Kieselsaeure in Aerogelform |
| US2990249A (en) * | 1958-10-09 | 1961-06-27 | Degussa | Process of preparing finely divided oxides by hydrolysis |
| DE1567490C3 (de) * | 1966-08-05 | 1973-12-13 | Elektroschmelzwerk Kempten Gmbh, 8000 Muenchen | Verfahren zur Herstellung von feinverteiltem Sihciumdioxyd |
| US3661519A (en) * | 1970-07-01 | 1972-05-09 | Cities Service Co | Hydrolysis of silicon tetrafluoride |
| US3772427A (en) * | 1971-06-14 | 1973-11-13 | Gen Electric | Combustion process for producing high surface area silica |
| BE790704A (fr) * | 1971-10-28 | 1973-02-15 | Degussa | Procede pour la fabrication d'oxydes finement |
| JP3304111B2 (ja) * | 1991-11-19 | 2002-07-22 | オリンパス光学工業株式会社 | 屈折率分布型光学素子の屈折率分布測定装置及び性能評価方法 |
-
1976
- 1976-05-11 DE DE2620737A patent/DE2620737C2/de not_active Expired
-
1977
- 1977-04-11 JP JP4048377A patent/JPS52148500A/ja active Granted
- 1977-04-21 NL NL7704373A patent/NL7704373A/xx not_active Application Discontinuation
- 1977-04-25 US US05/790,502 patent/US4108964A/en not_active Expired - Lifetime
- 1977-04-26 GB GB17325/77A patent/GB1562966A/en not_active Expired
- 1977-05-09 BE BE177377A patent/BE854392A/xx not_active IP Right Cessation
- 1977-05-10 FR FR7714272A patent/FR2351052A1/fr active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2168967A (en) * | 1984-11-19 | 1986-07-02 | Ube Industries | Process for producing metal oxide particles having a very small and uniform size |
| US4721610A (en) * | 1984-11-19 | 1988-01-26 | Ube Industries, Ltd. | Process for producing metal oxide particles having a very small and uniform size |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2620737C2 (de) | 1982-07-29 |
| FR2351052B1 (enExample) | 1980-03-07 |
| BE854392A (fr) | 1977-11-09 |
| FR2351052A1 (fr) | 1977-12-09 |
| JPS5638526B2 (enExample) | 1981-09-07 |
| DE2620737A1 (de) | 1977-12-01 |
| NL7704373A (nl) | 1977-11-15 |
| US4108964A (en) | 1978-08-22 |
| JPS52148500A (en) | 1977-12-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |