JPS52148500A - Process for preparing silicon dioxide - Google Patents

Process for preparing silicon dioxide

Info

Publication number
JPS52148500A
JPS52148500A JP4048377A JP4048377A JPS52148500A JP S52148500 A JPS52148500 A JP S52148500A JP 4048377 A JP4048377 A JP 4048377A JP 4048377 A JP4048377 A JP 4048377A JP S52148500 A JPS52148500 A JP S52148500A
Authority
JP
Japan
Prior art keywords
silicon dioxide
preparing silicon
preparing
dioxide
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4048377A
Other languages
English (en)
Other versions
JPS5638526B2 (ja
Inventor
Kurateru Giyuntaa
Miyuuruhofuaa Erunsuto
Shiyurainaa Furantsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wacker Chemie AG
Original Assignee
Wacker Chemie AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wacker Chemie AG filed Critical Wacker Chemie AG
Publication of JPS52148500A publication Critical patent/JPS52148500A/ja
Publication of JPS5638526B2 publication Critical patent/JPS5638526B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
JP4048377A 1976-05-11 1977-04-11 Process for preparing silicon dioxide Granted JPS52148500A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2620737A DE2620737C2 (de) 1976-05-11 1976-05-11 Verfahren zum Herstellen von hochdispersem Siliciumdioxid

Publications (2)

Publication Number Publication Date
JPS52148500A true JPS52148500A (en) 1977-12-09
JPS5638526B2 JPS5638526B2 (ja) 1981-09-07

Family

ID=5977606

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4048377A Granted JPS52148500A (en) 1976-05-11 1977-04-11 Process for preparing silicon dioxide

Country Status (7)

Country Link
US (1) US4108964A (ja)
JP (1) JPS52148500A (ja)
BE (1) BE854392A (ja)
DE (1) DE2620737C2 (ja)
FR (1) FR2351052A1 (ja)
GB (1) GB1562966A (ja)
NL (1) NL7704373A (ja)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2909815C2 (de) * 1979-03-13 1984-11-22 Wacker-Chemie GmbH, 8000 München Verfahren zur Herstellung von hochdispersem Siliciumdioxid
US4292290A (en) * 1980-04-16 1981-09-29 Cabot Corporation Process for the production of finely-divided metal and metalloid oxides
DE3016010C2 (de) * 1980-04-25 1985-01-10 Degussa Ag, 6000 Frankfurt Verfahren zur pyrogenen Herstellung von Kieselsäure
DE3050746C2 (de) 1980-04-25 1985-03-14 Degussa Ag, 6000 Frankfurt Verfahren zur pyrogenen Herstellung von Kieselsäure
DE3223454A1 (de) * 1982-06-23 1983-12-29 Wacker-Chemie GmbH, 8000 München Verfahren zur herstellung von pyrogenerzeugter kieselsaeure mit verstaerkter verdickungswirkung
JPS61122106A (ja) * 1984-11-19 1986-06-10 Ube Ind Ltd 微粉末状マグネシウム酸化物の製造方法
US4801437A (en) * 1985-12-04 1989-01-31 Japan Oxygen Co., Ltd. Process for treating combustible exhaust gases containing silane and the like
US4778500A (en) * 1987-08-11 1988-10-18 Research Foundation Of The City University Of New York Laser initiated chain reactions for producing a sintered product
US5123836A (en) * 1988-07-29 1992-06-23 Chiyoda Corporation Method for the combustion treatment of toxic gas-containing waste gas
DE4240741A1 (de) * 1992-12-03 1994-06-09 Wacker Chemie Gmbh Verfahren zur Hydrophobierung von pyrogen hergestelltem Siliciumdioxid
US5340560A (en) * 1993-04-30 1994-08-23 General Electric Company Method for making fumed silica having a reduced aggregate size and product
DE4419234A1 (de) * 1994-06-01 1995-12-07 Wacker Chemie Gmbh Verfahren zur Silylierung von anorganischen Oxiden
JP3480083B2 (ja) * 1994-10-11 2003-12-15 信越化学工業株式会社 微細シリカの製造方法
DE19530339A1 (de) * 1995-08-18 1997-02-20 Degussa Pyrogene Kieselsäure, Verfahren zu ihrer Herstellung und Verwendung
US5876683A (en) * 1995-11-02 1999-03-02 Glumac; Nicholas Combustion flame synthesis of nanophase materials
DE19605672C1 (de) * 1996-02-15 1997-09-25 Wacker Chemie Gmbh Verfahren zur Herstellung von Siliciumdioxid
US6322765B1 (en) 1996-02-15 2001-11-27 Wacker-Chemie Gmbh Process for preparing silicon dioxide
US5945211A (en) 1996-02-22 1999-08-31 Mitsui Mining And Smelting Co., Ltd. Composite material carrying zinc oxide fine particles adhered thereto and method for preparing same
DE19756840A1 (de) * 1997-01-23 1998-07-30 Degussa Pyrogene Oxide und Verfahren zu ihrer Herstellung
US6224834B1 (en) 1998-04-16 2001-05-01 International Business Machines Corporation Silane oxidation exhaust trap
JP3750728B2 (ja) 2000-12-05 2006-03-01 信越化学工業株式会社 微細シリカの製造方法
DE10258857A1 (de) 2002-12-17 2004-07-08 Degussa Ag Pyrogen hergestelltes Siliciumdioxid und Dispersion hiervon
DE102006009953A1 (de) 2006-03-03 2007-09-06 Wacker Chemie Ag Verfahren zur Wiederverwertung von hochsiedenden Verbindungen innerhalb eines Chlorsilanverbundes
US7910081B2 (en) * 2006-04-28 2011-03-22 Cabot Corporation Process for the production of fumed silica
DE102006030002A1 (de) * 2006-06-29 2008-01-03 Wacker Chemie Ag Herstellung pyrogener Metalloxide in temperierten Reaktionskammern
DE102007024963A1 (de) 2007-05-30 2008-12-04 Wacker Polymer Systems Gmbh & Co. Kg Verfahren zur Herstellung von dämmenden Beschichtungen
DE102011004744A1 (de) 2011-02-25 2012-08-30 Wacker Chemie Ag Vorrichtung und Verfahren zur Bestimmung einer Gaskonzentration in einem strömenden Gasgemisch
DE102011084048A1 (de) 2011-10-05 2013-04-11 Wacker Chemie Ag Polymerpulver enthaltende Baustofftrockenformulierungen
CN109312106A (zh) 2016-04-26 2019-02-05 道达尔研究技术弗吕公司 包括纳米颗粒的聚烯烃组合物
CN106241821B (zh) * 2016-07-21 2018-07-03 宜昌南玻硅材料有限公司 一种纳米级气相法白炭黑原料的混合装置及方法
WO2018068839A1 (de) 2016-10-12 2018-04-19 Wacker Chemie Ag Hydrophobierende additive
EP3580173B1 (de) 2017-07-13 2021-10-20 Wacker Chemie AG Verfahren zur herstellung von hochdispersem siliciumdioxid

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA706807A (en) * 1965-03-30 L. Flemmert Gosta Method of recovering silicon dioxide
DE900339C (de) * 1951-07-05 1953-12-21 Degussa Verfahren und Vorrichtung zur Herstellung von kolloidaler Kieselsaeure in Aerogelform
US2990249A (en) * 1958-10-09 1961-06-27 Degussa Process of preparing finely divided oxides by hydrolysis
DE1567490C3 (de) * 1966-08-05 1973-12-13 Elektroschmelzwerk Kempten Gmbh, 8000 Muenchen Verfahren zur Herstellung von feinverteiltem Sihciumdioxyd
US3661519A (en) * 1970-07-01 1972-05-09 Cities Service Co Hydrolysis of silicon tetrafluoride
US3772427A (en) * 1971-06-14 1973-11-13 Gen Electric Combustion process for producing high surface area silica
BE790704A (fr) * 1971-10-28 1973-02-15 Degussa Procede pour la fabrication d'oxydes finement
JP3304111B2 (ja) * 1991-11-19 2002-07-22 オリンパス光学工業株式会社 屈折率分布型光学素子の屈折率分布測定装置及び性能評価方法

Also Published As

Publication number Publication date
US4108964A (en) 1978-08-22
FR2351052A1 (fr) 1977-12-09
FR2351052B1 (ja) 1980-03-07
NL7704373A (nl) 1977-11-15
GB1562966A (en) 1980-03-19
JPS5638526B2 (ja) 1981-09-07
DE2620737C2 (de) 1982-07-29
DE2620737A1 (de) 1977-12-01
BE854392A (fr) 1977-11-09

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