GB1512856A - Plasma etching device and process - Google Patents

Plasma etching device and process

Info

Publication number
GB1512856A
GB1512856A GB3403775A GB3403775A GB1512856A GB 1512856 A GB1512856 A GB 1512856A GB 3403775 A GB3403775 A GB 3403775A GB 3403775 A GB3403775 A GB 3403775A GB 1512856 A GB1512856 A GB 1512856A
Authority
GB
United Kingdom
Prior art keywords
plasma
objects
masks
etching
etching device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3403775A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Plasma Corp
INT PLASMA CORP
Original Assignee
International Plasma Corp
INT PLASMA CORP
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US498100A external-priority patent/US3879597A/en
Application filed by International Plasma Corp, INT PLASMA CORP filed Critical International Plasma Corp
Publication of GB1512856A publication Critical patent/GB1512856A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
    • H01J65/044—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by a separate microwave unit
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/08—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed by electric discharge, e.g. by spark erosion

Abstract

1512856 Etching INTERNATIONAL PLASMA CORP 15 Aug 1975 [16 Aug 1974 18 April 1975] 34037/75 Heading B6J A plasma etching device comprises a perforated screen 7 (e.g. of aluminium) between a zone 9 where the plasma is generated and a zone 6 wherein the objects to be etched are placed. The screen is stated to prevent damage to the photoresist masks on the objects. After etching the masks may be removed by heating the objects (by infra-red heaters 10) whereupon oxygen in the plasma attacks the masks. The gas for producing the plasma may be introduced at inlet 4 and the apparatus may be evacuated through outlet 5. The gas may be a fluorocarbon containing oxygen. The chamber 1 is preferably of quartz. Electrodes 3 connected to an R.F. source generate the plasma.
GB3403775A 1974-08-16 1975-08-15 Plasma etching device and process Expired GB1512856A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US498100A US3879597A (en) 1974-08-16 1974-08-16 Plasma etching device and process
US56949375A 1975-04-18 1975-04-18

Publications (1)

Publication Number Publication Date
GB1512856A true GB1512856A (en) 1978-06-01

Family

ID=27052715

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3403775A Expired GB1512856A (en) 1974-08-16 1975-08-15 Plasma etching device and process

Country Status (2)

Country Link
DE (1) DE2536871A1 (en)
GB (1) GB1512856A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD150318A3 (en) * 1980-02-08 1981-08-26 Rainer Moeller METHOD AND TUBE REACTOR FOR PLASMA-CHEMICAL STEAM PHASE DEPOSITION AND PLASMA METHOD
DE3041551A1 (en) * 1980-11-04 1982-06-09 Siemens AG, 1000 Berlin und 8000 München ELECTRODES FOR PLASMA EQUIPMENT
AT386316B (en) * 1985-11-11 1988-08-10 Voest Alpine Ag Plasma reactor for etching printed circuit boards (printed equipment cards)
CH686254A5 (en) * 1992-07-27 1996-02-15 Balzers Hochvakuum Method for adjusting the processing rate distribution and caustic or plasma CVD system for its execution.

Also Published As

Publication number Publication date
DE2536871A1 (en) 1976-02-26

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Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years

Effective date: 19950814