GB1512029A - Formation of thin layer patterns on a substrate - Google Patents
Formation of thin layer patterns on a substrateInfo
- Publication number
- GB1512029A GB1512029A GB31185/75A GB3118575A GB1512029A GB 1512029 A GB1512029 A GB 1512029A GB 31185/75 A GB31185/75 A GB 31185/75A GB 3118575 A GB3118575 A GB 3118575A GB 1512029 A GB1512029 A GB 1512029A
- Authority
- GB
- United Kingdom
- Prior art keywords
- thin layer
- layer
- photolacquer
- substrate
- areas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
- H05K3/046—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer
- H05K3/048—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer using a lift-off resist pattern or a release layer pattern
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/428—Stripping or agents therefor using ultrasonic means only
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physical Vapour Deposition (AREA)
- Magnetic Heads (AREA)
- ing And Chemical Polishing (AREA)
- Electrodes Of Semiconductors (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19742436568 DE2436568C3 (de) | 1974-07-30 | Verfahren zur Strukturierung dünner Schichten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1512029A true GB1512029A (en) | 1978-05-24 |
Family
ID=5921886
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB31185/75A Expired GB1512029A (en) | 1974-07-30 | 1975-07-25 | Formation of thin layer patterns on a substrate |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5140770A (enExample) |
| CA (1) | CA1046648A (enExample) |
| FR (1) | FR2280717A1 (enExample) |
| GB (1) | GB1512029A (enExample) |
| NL (1) | NL7508955A (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52107199U (enExample) * | 1977-02-17 | 1977-08-15 | ||
| JPH0459523A (ja) * | 1990-06-29 | 1992-02-26 | Toa Tsushin Kogyo Kk | 積層片の縦型供給樋 |
| DE102004034418B4 (de) * | 2004-07-15 | 2009-06-25 | Schott Ag | Verfahren zur Herstellung struktuierter optischer Filterschichten auf Substraten |
-
1975
- 1975-07-24 CA CA232,152A patent/CA1046648A/en not_active Expired
- 1975-07-25 GB GB31185/75A patent/GB1512029A/en not_active Expired
- 1975-07-26 JP JP50090728A patent/JPS5140770A/ja active Pending
- 1975-07-28 NL NL7508955A patent/NL7508955A/xx not_active Application Discontinuation
- 1975-07-29 FR FR7523629A patent/FR2280717A1/fr active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| NL7508955A (nl) | 1976-02-03 |
| FR2280717A1 (fr) | 1976-02-27 |
| CA1046648A (en) | 1979-01-16 |
| JPS5140770A (enExample) | 1976-04-05 |
| DE2436568B2 (de) | 1977-07-07 |
| FR2280717B1 (enExample) | 1980-06-27 |
| DE2436568A1 (de) | 1976-02-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4119483A (en) | Method of structuring thin layers | |
| US3443944A (en) | Method of depositing conductive patterns on a substrate | |
| US3708403A (en) | Self-aligning electroplating mask | |
| JPS5656636A (en) | Processing method of fine pattern | |
| US4424271A (en) | Deposition process | |
| GB1512029A (en) | Formation of thin layer patterns on a substrate | |
| ATE46791T1 (de) | Verfahren zum selektiven auffuellen von in isolationsschichten geaetzten kontaktloechern mit metallisch leitenden materialien bei der herstellung von hoechstintegrierten halbleiterschaltungen sowie eine vorrichtung zur durchfuehrung des verfahrens. | |
| US3919066A (en) | Method of manufacturing etched patterns | |
| US3592707A (en) | Precision masking using silicon nitride and silicon oxide | |
| JPS52119172A (en) | Forming method of fine pattern | |
| US4199379A (en) | Method for producing metal patterns on silicon wafers for thermomigration | |
| JPS6235361A (ja) | フオトマスク材料 | |
| JPS5864616A (ja) | 薄膜磁気ヘツドの製造方法 | |
| JPS6436024A (en) | Formation of wiring of semiconductor device | |
| JPS5519873A (en) | Forming method of metallic layer pattern for semiconductor | |
| JPS5493970A (en) | Patttern forming method of multi-layer metallic thin film | |
| JPS5735860A (en) | Preparation of photomask | |
| JP3441108B2 (ja) | 模様を有する装飾品及びその模様形成方法 | |
| JPS55107781A (en) | Etching method for metal film | |
| JPS5636120A (en) | Manufacture of magnetic bubble device | |
| JPS5585668A (en) | Adhering layer forming method | |
| JPS61250168A (ja) | 薄膜製造方法 | |
| CH636238B (de) | Verfahren zur herstellung von uhrteilen. | |
| JPS61214430A (ja) | 半導体装置の製法 | |
| JPS5620164A (en) | Formation of metallic film pattern |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |