NL7508955A - Werkwijze voor het struktureren van dunne lagen. - Google Patents
Werkwijze voor het struktureren van dunne lagen.Info
- Publication number
- NL7508955A NL7508955A NL7508955A NL7508955A NL7508955A NL 7508955 A NL7508955 A NL 7508955A NL 7508955 A NL7508955 A NL 7508955A NL 7508955 A NL7508955 A NL 7508955A NL 7508955 A NL7508955 A NL 7508955A
- Authority
- NL
- Netherlands
- Prior art keywords
- thin layers
- structuring thin
- structuring
- layers
- thin
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
- H05K3/046—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer
- H05K3/048—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer using a lift-off resist pattern or a release layer pattern
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/428—Stripping or agents therefor using ultrasonic means only
-
- H10P95/00—
-
- H10W74/40—
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physical Vapour Deposition (AREA)
- Magnetic Heads (AREA)
- ing And Chemical Polishing (AREA)
- Electrodes Of Semiconductors (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19742436568 DE2436568C3 (de) | 1974-07-30 | Verfahren zur Strukturierung dünner Schichten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7508955A true NL7508955A (nl) | 1976-02-03 |
Family
ID=5921886
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7508955A NL7508955A (nl) | 1974-07-30 | 1975-07-28 | Werkwijze voor het struktureren van dunne lagen. |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5140770A (enExample) |
| CA (1) | CA1046648A (enExample) |
| FR (1) | FR2280717A1 (enExample) |
| GB (1) | GB1512029A (enExample) |
| NL (1) | NL7508955A (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52107199U (enExample) * | 1977-02-17 | 1977-08-15 | ||
| JPH0459523A (ja) * | 1990-06-29 | 1992-02-26 | Toa Tsushin Kogyo Kk | 積層片の縦型供給樋 |
| DE102004034418B4 (de) * | 2004-07-15 | 2009-06-25 | Schott Ag | Verfahren zur Herstellung struktuierter optischer Filterschichten auf Substraten |
-
1975
- 1975-07-24 CA CA232,152A patent/CA1046648A/en not_active Expired
- 1975-07-25 GB GB31185/75A patent/GB1512029A/en not_active Expired
- 1975-07-26 JP JP50090728A patent/JPS5140770A/ja active Pending
- 1975-07-28 NL NL7508955A patent/NL7508955A/xx not_active Application Discontinuation
- 1975-07-29 FR FR7523629A patent/FR2280717A1/fr active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| DE2436568A1 (de) | 1976-02-12 |
| FR2280717A1 (fr) | 1976-02-27 |
| DE2436568B2 (de) | 1977-07-07 |
| GB1512029A (en) | 1978-05-24 |
| CA1046648A (en) | 1979-01-16 |
| JPS5140770A (enExample) | 1976-04-05 |
| FR2280717B1 (enExample) | 1980-06-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| BV | The patent application has lapsed |