GB1500607A - Photopolymerizable resin composition - Google Patents

Photopolymerizable resin composition

Info

Publication number
GB1500607A
GB1500607A GB2286075A GB2286075A GB1500607A GB 1500607 A GB1500607 A GB 1500607A GB 2286075 A GB2286075 A GB 2286075A GB 2286075 A GB2286075 A GB 2286075A GB 1500607 A GB1500607 A GB 1500607A
Authority
GB
United Kingdom
Prior art keywords
component
acid component
weight
parts
initiator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2286075A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of GB1500607A publication Critical patent/GB1500607A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/66—Polyesters containing oxygen in the form of ether groups
    • C08G63/668—Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/676—Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C08F299/0407—Processes of polymerisation
    • C08F299/0421—Polymerisation initiated by wave energy or particle radiation
    • C08F299/0428—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F299/0435—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyesters Or Polycarbonates (AREA)
GB2286075A 1974-06-06 1975-05-23 Photopolymerizable resin composition Expired GB1500607A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6469874A JPS5242084B2 (enrdf_load_html_response) 1974-06-06 1974-06-06

Publications (1)

Publication Number Publication Date
GB1500607A true GB1500607A (en) 1978-02-08

Family

ID=13265618

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2286075A Expired GB1500607A (en) 1974-06-06 1975-05-23 Photopolymerizable resin composition

Country Status (8)

Country Link
JP (1) JPS5242084B2 (enrdf_load_html_response)
CA (1) CA1059683A (enrdf_load_html_response)
DE (1) DE2525297A1 (enrdf_load_html_response)
FR (1) FR2273827A1 (enrdf_load_html_response)
GB (1) GB1500607A (enrdf_load_html_response)
IT (1) IT1036182B (enrdf_load_html_response)
NL (1) NL7506773A (enrdf_load_html_response)
SU (1) SU917712A3 (enrdf_load_html_response)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0896259A3 (de) * 1997-08-04 1999-07-28 HSM Holographic Systems München GmbH Verfahren und Vorrichtung zur Erzeugung einer Oberflächenstruktur, insbesondere einer holographischen Oberflächenstruktur, auf einem Substrat
AU741157B2 (en) * 1997-09-04 2001-11-22 Signet Armorlite, Inc. Production of photopolymerized polyester high index ophthalmic lenses
US10272492B2 (en) 2016-04-14 2019-04-30 Desktop Metal, Inc. Multi-part removable support structures

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5176381A (ja) * 1974-12-27 1976-07-01 Toyo Boseki Taishokuseifuhowahoriesuterujushi
CA1069638A (en) * 1976-05-14 1980-01-08 Earl E. Parker Low smoke density fire-retardant unsaturated aliphatic polyester resins containing alumina hydrate
JPS58182631A (ja) * 1982-04-20 1983-10-25 Nippon Synthetic Chem Ind Co Ltd:The 画像形成用組成物

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0896259A3 (de) * 1997-08-04 1999-07-28 HSM Holographic Systems München GmbH Verfahren und Vorrichtung zur Erzeugung einer Oberflächenstruktur, insbesondere einer holographischen Oberflächenstruktur, auf einem Substrat
AU741157B2 (en) * 1997-09-04 2001-11-22 Signet Armorlite, Inc. Production of photopolymerized polyester high index ophthalmic lenses
US10272492B2 (en) 2016-04-14 2019-04-30 Desktop Metal, Inc. Multi-part removable support structures

Also Published As

Publication number Publication date
JPS50155303A (enrdf_load_html_response) 1975-12-15
IT1036182B (it) 1979-10-30
SU917712A3 (ru) 1982-03-30
FR2273827B1 (enrdf_load_html_response) 1979-01-05
NL7506773A (nl) 1975-12-09
DE2525297A1 (de) 1975-12-18
CA1059683A (en) 1979-07-31
JPS5242084B2 (enrdf_load_html_response) 1977-10-22
FR2273827A1 (fr) 1976-01-02

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee