GB1464942A - Polymers process for their preparation and their use in photo polymerizable compositions and elements for relief images - Google Patents

Polymers process for their preparation and their use in photo polymerizable compositions and elements for relief images

Info

Publication number
GB1464942A
GB1464942A GB308674A GB308674A GB1464942A GB 1464942 A GB1464942 A GB 1464942A GB 308674 A GB308674 A GB 308674A GB 308674 A GB308674 A GB 308674A GB 1464942 A GB1464942 A GB 1464942A
Authority
GB
United Kingdom
Prior art keywords
capping
polyisocyanate
polymers
organic
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB308674A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of GB1464942A publication Critical patent/GB1464942A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0952—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer comprising silver halide or silver salt based image forming systems, e.g. for camera speed exposure

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Architecture (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Structural Engineering (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
GB308674A 1973-02-01 1974-01-23 Polymers process for their preparation and their use in photo polymerizable compositions and elements for relief images Expired GB1464942A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US32855073A 1973-02-01 1973-02-01
US32867873A 1973-02-01 1973-02-01

Publications (1)

Publication Number Publication Date
GB1464942A true GB1464942A (en) 1977-02-16

Family

ID=26986423

Family Applications (1)

Application Number Title Priority Date Filing Date
GB308674A Expired GB1464942A (en) 1973-02-01 1974-01-23 Polymers process for their preparation and their use in photo polymerizable compositions and elements for relief images

Country Status (7)

Country Link
JP (2) JPS575804B2 (ko)
BR (1) BR7400704D0 (ko)
DE (1) DE2404239A1 (ko)
FR (1) FR2288757A1 (ko)
GB (1) GB1464942A (ko)
IT (1) IT1008170B (ko)
NL (1) NL7401438A (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5053317A (en) * 1988-12-06 1991-10-01 Hoechst Aktiengesellschaft Radiation-polymerizable mixture and copying material produced comprising polyurethane-polyurea polymer
US20100055613A1 (en) * 2008-08-29 2010-03-04 Norio Aoshima Negative-working lithographic printing plate precursor and method of lithographic printing using same

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5290304A (en) * 1976-01-24 1977-07-29 Asahi Chemical Ind Photoosensitive resin composition for making flexo graphic printing plate
CA1109715A (en) * 1976-05-14 1981-09-29 Frank J. Loprest Photographic element and photographic record prepared therefrom
US4108840A (en) * 1977-04-15 1978-08-22 Ppg Industries, Inc. Urea-urethane-acrylate radiation curable coating compositions and methods of making same
US4153776A (en) * 1978-03-28 1979-05-08 Ppg Industries, Inc. Amide-modified urethane acrylate radiation curable compounds and coating compositions and methods of making same
USRE30772E (en) 1978-03-28 1981-10-13 Ppg Industries, Inc. Amide-modified urethane acrylate radiation curable compounds and coating compositions and methods of making same
DE2822190A1 (de) * 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
DE2822189A1 (de) * 1978-05-20 1980-04-17 Hoechst Ag Photopolymerisierbares gemisch
US4425468A (en) 1981-12-31 1984-01-10 Ppg Industries, Inc. Polyurea-polyurethane acrylate polymer dispersions
US4555551A (en) * 1981-12-31 1985-11-26 Ppg Industries, Inc. Method of molding
GB8416230D0 (en) * 1984-06-26 1984-08-01 Btr Plc Polyurethanes
JPH0341770Y2 (ko) * 1986-08-12 1991-09-02
US4721751A (en) * 1987-03-26 1988-01-26 Ppg Industries, Inc. Polyurea-polyurethane acrylate dispersions
JPH01229025A (ja) * 1988-03-09 1989-09-12 Sanyo Chem Ind Ltd 重合体ポリオールおよび遮音性ポリウレタンフォームの製法
DE3927631A1 (de) * 1989-08-22 1991-02-28 Basf Ag Umsetzungsprodukt, verfahren zu dessen herstellung und damit herstellbares strahlungsempfindliches gemisch
DE3927628A1 (de) * 1989-08-22 1991-02-28 Basf Ag Strahlungsempfindliches gemisch
DE3927629A1 (de) * 1989-08-22 1991-02-28 Basf Ag Strahlungsempfindliches, positiv arbeitendes gemisch
JP2682211B2 (ja) * 1990-08-09 1997-11-26 東洋紡績株式会社 感光性樹脂組成物

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE592278A (ko) * 1959-06-26
FR1360082A (fr) * 1962-06-07 1964-04-30 Du Pont Fabrication d'élastomères linéaires segmentaires du type polyuréthanes
FR1546169A (fr) * 1966-12-02 1968-11-15 Glanzstoff Ag Procédé de préparation de polyuréthanes linéaires
GB1251232A (ko) * 1967-10-12 1971-10-27
DE2102382B2 (de) * 1970-01-19 1973-02-01 Dainippon Ink and Chemicals, Ine , Tokio Photopolymerisierbare, polyurethanformmassen einschliesslich ueberzugsmassen und klebemittel
CA920296A (en) * 1970-01-29 1973-01-30 J. Trecker David Acrylates and coating compositions thereof
JPS5217630B2 (ko) * 1972-05-31 1977-05-17
JPS5037701A (ko) * 1973-08-10 1975-04-08

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5053317A (en) * 1988-12-06 1991-10-01 Hoechst Aktiengesellschaft Radiation-polymerizable mixture and copying material produced comprising polyurethane-polyurea polymer
US20100055613A1 (en) * 2008-08-29 2010-03-04 Norio Aoshima Negative-working lithographic printing plate precursor and method of lithographic printing using same
US8399172B2 (en) * 2008-08-29 2013-03-19 Fujifilm Corporation Negative-working lithographic printing plate precursor and method of lithographic printing using same

Also Published As

Publication number Publication date
JPS50114455A (ko) 1975-09-08
NL7401438A (ko) 1974-08-05
FR2288757B1 (ko) 1978-06-16
JPS5829801B2 (ja) 1983-06-24
FR2288757A1 (fr) 1976-05-21
IT1008170B (it) 1976-11-10
DE2404239A1 (de) 1974-08-08
BR7400704D0 (pt) 1974-09-10
JPS575804B2 (ko) 1982-02-02
AU6478074A (en) 1975-07-24
JPS5052195A (ko) 1975-05-09

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee