AU6478074A - Novel polymers, process for their preparation and relief images produced therefrom - Google Patents

Novel polymers, process for their preparation and relief images produced therefrom

Info

Publication number
AU6478074A
AU6478074A AU64780/74A AU6478074A AU6478074A AU 6478074 A AU6478074 A AU 6478074A AU 64780/74 A AU64780/74 A AU 64780/74A AU 6478074 A AU6478074 A AU 6478074A AU 6478074 A AU6478074 A AU 6478074A
Authority
AU
Australia
Prior art keywords
preparation
produced therefrom
images produced
novel polymers
relief images
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU64780/74A
Other versions
AU490735B2 (en
Inventor
ALFRED TARDIEU and ALBERTS. DEUTSCH WILLIAM ROWE
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Application granted granted Critical
Publication of AU490735B2 publication Critical patent/AU490735B2/en
Publication of AU6478074A publication Critical patent/AU6478074A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0952—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer comprising silver halide or silver salt based image forming systems, e.g. for camera speed exposure
AU64780/74A 1973-02-01 1974-01-23 Novel polymers, process for their preparation and relief images produced therefrom Expired AU490735B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US32855073A 1973-02-01 1973-02-01
US32867873A 1973-02-01 1973-02-01
USUS328678,3 1973-02-01

Publications (2)

Publication Number Publication Date
AU490735B2 AU490735B2 (en) 1975-07-24
AU6478074A true AU6478074A (en) 1975-07-24

Family

ID=

Also Published As

Publication number Publication date
IT1008170B (en) 1976-11-10
JPS575804B2 (en) 1982-02-02
GB1464942A (en) 1977-02-16
JPS5829801B2 (en) 1983-06-24
BR7400704D0 (en) 1974-09-10
FR2288757A1 (en) 1976-05-21
JPS50114455A (en) 1975-09-08
DE2404239A1 (en) 1974-08-08
NL7401438A (en) 1974-08-05
FR2288757B1 (en) 1978-06-16
JPS5052195A (en) 1975-05-09

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