GB1441781A - Electric circuit fabrication - Google Patents
Electric circuit fabricationInfo
- Publication number
- GB1441781A GB1441781A GB5028773A GB5028773A GB1441781A GB 1441781 A GB1441781 A GB 1441781A GB 5028773 A GB5028773 A GB 5028773A GB 5028773 A GB5028773 A GB 5028773A GB 1441781 A GB1441781 A GB 1441781A
- Authority
- GB
- United Kingdom
- Prior art keywords
- layer
- resist
- portions
- substrate
- exposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000010410 layer Substances 0.000 abstract 14
- 239000000758 substrate Substances 0.000 abstract 4
- 229910052737 gold Inorganic materials 0.000 abstract 3
- 239000010931 gold Substances 0.000 abstract 3
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 229910052802 copper Inorganic materials 0.000 abstract 2
- 239000010949 copper Substances 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract 2
- 239000000696 magnetic material Substances 0.000 abstract 2
- 239000002184 metal Substances 0.000 abstract 2
- 229910052751 metal Inorganic materials 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 238000007747 plating Methods 0.000 abstract 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 239000000919 ceramic Substances 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 238000009826 distribution Methods 0.000 abstract 1
- 238000009713 electroplating Methods 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 239000011229 interlayer Substances 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 230000000873 masking effect Effects 0.000 abstract 1
- 229910052758 niobium Inorganic materials 0.000 abstract 1
- 229910000889 permalloy Inorganic materials 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 238000009987 spinning Methods 0.000 abstract 1
- 239000002344 surface layer Substances 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 229910052721 tungsten Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/108—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
- H01L2924/097—Glass-ceramics, e.g. devitrified glass
- H01L2924/09701—Low temperature co-fired ceramic [LTCC]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0756—Uses of liquids, e.g. rinsing, coating, dissolving
- H05K2203/0759—Forming a polymer layer by liquid coating, e.g. a non-metallic protective coating or an organic bonding layer
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Magnetic Heads (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Electroplating Methods And Accessories (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US31100672A | 1972-11-30 | 1972-11-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1441781A true GB1441781A (en) | 1976-07-07 |
Family
ID=23204973
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB5028773A Expired GB1441781A (en) | 1972-11-30 | 1973-10-29 | Electric circuit fabrication |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS5733703B2 (tr) |
FR (1) | FR2209216B1 (tr) |
GB (1) | GB1441781A (tr) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2213325A (en) * | 1987-12-04 | 1989-08-09 | Marconi Electronic Devices | A method of forming electrical conductors on an insulating substrate |
US5407530A (en) * | 1992-11-18 | 1995-04-18 | Mitsumi Electric Co., Ltd. | Method of preparing fine conductive pattern |
WO2022184038A1 (zh) * | 2021-03-02 | 2022-09-09 | 苏州太阳井新能源有限公司 | 一种光伏电池电极的制作方法及光伏电池 |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL7704186A (nl) * | 1977-04-18 | 1978-10-20 | Philips Nv | Werkwijze voor het galvanisch versterken van een geleidend basispatroon en inrichting ver- kregen met behulp van de werkwijze. |
JPS5580819A (en) * | 1978-12-14 | 1980-06-18 | Mitsubishi Electric Corp | Manufacture of thin film magnetic head |
JPS5691494A (en) * | 1979-12-25 | 1981-07-24 | Nippon Electric Co | Method of forming conductor pattern |
JPS5766523A (en) * | 1980-10-13 | 1982-04-22 | Hitachi Ltd | Thin-film magnetic head |
IE51854B1 (en) * | 1980-12-03 | 1987-04-15 | Memorex Corp | Method of fabricating a metallic pattern on a substrate |
JPS57164413A (en) * | 1981-03-31 | 1982-10-09 | Fujitsu Ltd | Manufacture of thin film magnetic head |
JPS5819716A (ja) * | 1981-07-27 | 1983-02-04 | Hitachi Ltd | 薄膜磁気ヘツドおよびその製造方法 |
US4375390A (en) * | 1982-03-15 | 1983-03-01 | Anderson Nathaniel C | Thin film techniques for fabricating narrow track ferrite heads |
JPH05235173A (ja) * | 1992-02-24 | 1993-09-10 | Nec Corp | 半導体装置及びその製造方法 |
JPH0644531A (ja) * | 1993-02-24 | 1994-02-18 | Hitachi Ltd | 薄膜磁気ヘッド |
JPH07273118A (ja) * | 1994-03-28 | 1995-10-20 | Toshiba Corp | 配線、電極の形成方法 |
CN114501833B (zh) * | 2020-10-23 | 2024-05-14 | 深南电路股份有限公司 | 线路板上阻焊层的加工方法 |
CN114173510B (zh) * | 2021-12-08 | 2022-12-13 | 上海交通大学 | 一种具有空气隔热层的微型多层隔热结构及其制备和应用 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3154450A (en) * | 1960-01-27 | 1964-10-27 | Bendix Corp | Method of making mesas for diodes by etching |
US3474021A (en) * | 1966-01-12 | 1969-10-21 | Ibm | Method of forming openings using sequential sputtering and chemical etching |
US3507756A (en) * | 1967-08-04 | 1970-04-21 | Bell Telephone Labor Inc | Method of fabricating semiconductor device contact |
-
1973
- 1973-10-23 FR FR7338736A patent/FR2209216B1/fr not_active Expired
- 1973-10-26 JP JP12004673A patent/JPS5733703B2/ja not_active Expired
- 1973-10-29 GB GB5028773A patent/GB1441781A/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2213325A (en) * | 1987-12-04 | 1989-08-09 | Marconi Electronic Devices | A method of forming electrical conductors on an insulating substrate |
GB2213325B (en) * | 1987-12-04 | 1992-01-02 | Marconi Electronic Devices | A method of forming electrical conductors |
US5407530A (en) * | 1992-11-18 | 1995-04-18 | Mitsumi Electric Co., Ltd. | Method of preparing fine conductive pattern |
WO2022184038A1 (zh) * | 2021-03-02 | 2022-09-09 | 苏州太阳井新能源有限公司 | 一种光伏电池电极的制作方法及光伏电池 |
Also Published As
Publication number | Publication date |
---|---|
JPS5733703B2 (tr) | 1982-07-19 |
FR2209216B1 (tr) | 1977-09-30 |
FR2209216A1 (tr) | 1974-06-28 |
JPS4983868A (tr) | 1974-08-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |