GB1421459A - Methods of manufacturing monograin layer devices - Google Patents

Methods of manufacturing monograin layer devices

Info

Publication number
GB1421459A
GB1421459A GB772473A GB772473A GB1421459A GB 1421459 A GB1421459 A GB 1421459A GB 772473 A GB772473 A GB 772473A GB 772473 A GB772473 A GB 772473A GB 1421459 A GB1421459 A GB 1421459A
Authority
GB
United Kingdom
Prior art keywords
grains
exposed
surface layers
cores
polyurethane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB772473A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Electronics UK Ltd
Original Assignee
Philips Electronic and Associated Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electronic and Associated Industries Ltd filed Critical Philips Electronic and Associated Industries Ltd
Publication of GB1421459A publication Critical patent/GB1421459A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0384Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including other non-monocrystalline materials, e.g. semiconductor particles embedded in an insulating material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/12Photocathodes-Cs coated and solar cell

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Led Devices (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Light Receiving Elements (AREA)
  • Photovoltaic Devices (AREA)
  • Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)

Abstract

1421459 Semi-conductor devices PHILIPS ELECTRONIC & ASSOCIATED INDUSTRIES Ltd 16 Feb 1973 [19 Feb 1972] 7724/73 Heading H1K A semi-conductor device, e.g. a solar cell or injection luminescent light source is made by first forming a monolayer of semi-conductor grains surface layers of which form PN junctions with the cores, the grains being embedded in a binder layer over part of its thickness but projecting from one face of it. After depositing a first electrode layer on the exposed parts of the grains parts of the surface layers and cores are removed, insulation selectively provided to cover the exposed parts of the surface layers but leaving parts of the cores exposed, and a second electrode layer deposited to contact these exposed parts. The grains, which are typically of gallium phosphide and of 50 Á diameter with 5 Á N type surface layers, may be formed into a monolayer by attaching to a glass plate with a thin layer of rubber glue, covering with polyurethane and then stripping the latter with the grains from the substrate and glue and increasing the exposed area of the grains by dissolving away some of the polyurethane. Then the first electrode layer of gold is vapour deposited and covered with a thick layer of polyurethane and the resulting surface ground down until the cores of the grains are exposed. In one method insulation is then selectively deposited over the exposed gold and surface layers with the PN junctions reverse biased either by electrophoresis from an aqueous solution of synthetic resin containing carboxyl and/or hydroxyl group, e.g. epoxy, alkyl or acrylate resin, and ammonia, or an organic aminemelamine based resin (if the surface layers are P type) or by electrochemical polymerization from a mixture of orthoisopropyl phenol and triethylamine in a 10 : 1 mol. ratio. In the first case the layer is cured by baking. Alternatively after the grinding process the polyurethane is exposed to ethyl acetate vapour which causes it to swell so as just to cover the junctions where it remains on evaporation of the acetate. Finally the second electrode is deposited on the resulting surface. Provision of the first electrode on the other side of the monolayer and the use of zinc selenide, gallium arsenide phosphide and gallium aluminium arsenide grains are also suggested.
GB772473A 1972-02-19 1973-02-16 Methods of manufacturing monograin layer devices Expired GB1421459A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7202215A NL7202215A (en) 1972-02-19 1972-02-19

Publications (1)

Publication Number Publication Date
GB1421459A true GB1421459A (en) 1976-01-21

Family

ID=19815410

Family Applications (1)

Application Number Title Priority Date Filing Date
GB772473A Expired GB1421459A (en) 1972-02-19 1973-02-16 Methods of manufacturing monograin layer devices

Country Status (7)

Country Link
US (1) US3847758A (en)
JP (1) JPS5117877B2 (en)
CA (1) CA978665A (en)
FR (1) FR2172359B1 (en)
GB (1) GB1421459A (en)
IT (1) IT977808B (en)
NL (1) NL7202215A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4173494A (en) * 1977-02-14 1979-11-06 Jack S. Kilby Glass support light energy converter
US4806495A (en) * 1984-09-04 1989-02-21 Texas Instruments Incorporated Method of making solar array with aluminum foil matrix
US4917752A (en) * 1984-09-04 1990-04-17 Texas Instruments Incorporated Method of forming contacts on semiconductor members
US6762359B2 (en) * 2001-01-15 2004-07-13 Fuji Machine Mfg. Co., Ltd. Photovoltaic panel and method of producing same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2904613A (en) * 1957-08-26 1959-09-15 Hoffman Electronics Corp Large area solar energy converter and method for making the same
US3040416A (en) * 1959-05-13 1962-06-26 Hoffman Electronics Corp Method of making a large area solar cell panel
US3038952A (en) * 1959-05-20 1962-06-12 Hoffman Electronics Corp Method of making a solar cell panel
US3575823A (en) * 1968-07-26 1971-04-20 Bell Telephone Labor Inc Method of making a silicon target for image storage tube
NL6813918A (en) * 1968-09-27 1970-04-01

Also Published As

Publication number Publication date
IT977808B (en) 1974-09-20
JPS5117877B2 (en) 1976-06-05
DE2306059A1 (en) 1973-08-23
US3847758A (en) 1974-11-12
DE2306059B2 (en) 1976-05-20
CA978665A (en) 1975-11-25
JPS4896090A (en) 1973-12-08
FR2172359A1 (en) 1973-09-28
NL7202215A (en) 1973-08-21
FR2172359B1 (en) 1977-12-30

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee