GB1250544A - - Google Patents

Info

Publication number
GB1250544A
GB1250544A GB1250544DA GB1250544A GB 1250544 A GB1250544 A GB 1250544A GB 1250544D A GB1250544D A GB 1250544DA GB 1250544 A GB1250544 A GB 1250544A
Authority
GB
United Kingdom
Prior art keywords
chamber
coating
valve
shield
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1250544A publication Critical patent/GB1250544A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB1250544D 1968-02-29 1969-02-25 Expired GB1250544A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US70937668A 1968-02-29 1968-02-29

Publications (1)

Publication Number Publication Date
GB1250544A true GB1250544A (de) 1971-10-20

Family

ID=24849612

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1250544D Expired GB1250544A (de) 1968-02-29 1969-02-25

Country Status (13)

Country Link
US (1) US3524426A (de)
JP (1) JPS494156B1 (de)
AT (1) AT286738B (de)
BE (1) BE729026A (de)
CH (1) CH501064A (de)
DE (1) DE1911198A1 (de)
FR (1) FR2002902A1 (de)
GB (1) GB1250544A (de)
IE (1) IE33433B1 (de)
LU (1) LU58110A1 (de)
NL (1) NL6903181A (de)
NO (1) NO123939B (de)
SE (1) SE347024B (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021174032A1 (en) * 2020-02-28 2021-09-02 Illinois Tool Works Inc. Piston monitoring assembly

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3649339A (en) * 1969-09-05 1972-03-14 Eugene C Smith Apparatus and method for securing a high vacuum for particle coating process
US3648654A (en) * 1970-03-16 1972-03-14 Bell Telephone Labor Inc Vertical liquid phase crystal growth apparatus
US3641973A (en) * 1970-11-25 1972-02-15 Air Reduction Vacuum coating apparatus
US3915118A (en) * 1973-09-17 1975-10-28 Etec Corp Specimen coating device for an SEM
US3921572A (en) * 1974-02-25 1975-11-25 Ibm Vacuum coating apparatus
JPS5130965A (ja) * 1974-09-09 1976-03-16 Matsushita Electric Ind Co Ltd Atsumakushusekikairo no seizohoho
US4173944A (en) * 1977-05-20 1979-11-13 Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh Silverplated vapor deposition chamber
US4179530A (en) * 1977-05-20 1979-12-18 Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh Process for the deposition of pure semiconductor material
EP0008807A1 (de) * 1978-09-13 1980-03-19 Elektroschmelzwerk Kempten GmbH Vorrichtung und Verfahren zum diskontinuierlichen oder kontinuierlichen thermischen Bedampfen von Formteilen oder Bandmaterial
DE2940064A1 (de) * 1979-10-03 1981-04-16 Leybold-Heraeus GmbH, 5000 Köln Vakuumaufdampfanlage mir einer ventilkammer, einer bedampfungskammer und einer verdampferkammer
JPS5769797A (en) * 1980-10-17 1982-04-28 Matsushita Electric Ind Co Ltd Method of producing hybrid thick film integrated circuit
JPS57193249U (de) * 1981-06-03 1982-12-07
JPS5851594A (ja) * 1981-09-22 1983-03-26 日本電気株式会社 厚膜混成ｉｃ基板
JPS5885378U (ja) * 1981-12-04 1983-06-09 ソニー株式会社 プリント配線基板
US4478174A (en) * 1983-02-25 1984-10-23 Canadian Patents & Development Limited Vacuum coating vessel with movable shutter plate
JPS61164076U (de) * 1986-03-20 1986-10-11
CN101512036B (zh) * 2006-09-11 2011-11-02 株式会社爱发科 真空蒸气处理装置
KR101066033B1 (ko) * 2009-07-28 2011-09-20 엘아이지에이디피 주식회사 화학기상 증착장치 및 기판 처리장치
CN106947944A (zh) * 2017-05-23 2017-07-14 京东方科技集团股份有限公司 一种蒸镀坩埚、蒸镀源、蒸镀装置及蒸镀方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021174032A1 (en) * 2020-02-28 2021-09-02 Illinois Tool Works Inc. Piston monitoring assembly
US12110886B2 (en) 2020-02-28 2024-10-08 Illinois Tool Works Inc. Piston monitoring assembly

Also Published As

Publication number Publication date
JPS494156B1 (de) 1974-01-30
LU58110A1 (de) 1969-06-03
BE729026A (de) 1969-08-01
DE1911198A1 (de) 1969-09-18
FR2002902A1 (de) 1969-10-31
SE347024B (de) 1972-07-24
CH501064A (de) 1970-12-31
NL6903181A (de) 1969-09-02
IE33433B1 (en) 1974-06-26
IE33433L (en) 1969-08-29
NO123939B (de) 1972-02-07
US3524426A (en) 1970-08-18
AT286738B (de) 1970-12-28

Similar Documents

Publication Publication Date Title
GB1250544A (de)
US4062319A (en) Vacuum treating apparatus
KR0182772B1 (ko) 스퍼터장치 및 타겟 교환장치 및 그 방법
US3945903A (en) Sputter-coating of glass sheets or other substrates
US3925182A (en) Method for continuous production of sputter-coated glass products
US3086882A (en) Method and apparatus for filming articles by vacuum deposition
US9970096B2 (en) Intaglio printing plate coating apparatus
GB1039691A (en) Vacuum coating and ion bombardment apparatus
JP2005048260A (ja) 反応性スパッタリング方法
US4051010A (en) Sputtering apparatus
US3691053A (en) Getter-sputtering apparatus
TW202130835A (zh) 成膜方法及成膜裝置
GB1471623A (en) Sputter etching
Pulker Film deposition methods
US4606929A (en) Method of ionized-plasma spraying and apparatus for performing same
US3288700A (en) Sputtering apparatus including a folded flexible conveyor
EP2182087A1 (de) Vakuumdampf-Beschichtungsvorrichtung zum Beschichten eines Substrats
US20030111342A1 (en) Sputter coating apparatus
JPH0570931A (ja) 真空蒸着装置および防着板
JPH0885872A (ja) 成膜装置
GB1263582A (en) Improvements in or relating to thin film deposition
JPH0426760A (ja) スパッタリング装置
KR950009992B1 (ko) 렌즈의 코팅방법
GB1201743A (en) Improvements in or relating to the deposition of a layer of solid material on a substrate by cathode sputtering
CA2175058C (en) Method and apparatus for thin film coating an article

Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees