JPS494156B1 - - Google Patents

Info

Publication number
JPS494156B1
JPS494156B1 JP44015284A JP1528469A JPS494156B1 JP S494156 B1 JPS494156 B1 JP S494156B1 JP 44015284 A JP44015284 A JP 44015284A JP 1528469 A JP1528469 A JP 1528469A JP S494156 B1 JPS494156 B1 JP S494156B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP44015284A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS494156B1 publication Critical patent/JPS494156B1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP44015284A 1968-02-29 1969-02-28 Pending JPS494156B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US70937668A 1968-02-29 1968-02-29

Publications (1)

Publication Number Publication Date
JPS494156B1 true JPS494156B1 (ja) 1974-01-30

Family

ID=24849612

Family Applications (1)

Application Number Title Priority Date Filing Date
JP44015284A Pending JPS494156B1 (ja) 1968-02-29 1969-02-28

Country Status (13)

Country Link
US (1) US3524426A (ja)
JP (1) JPS494156B1 (ja)
AT (1) AT286738B (ja)
BE (1) BE729026A (ja)
CH (1) CH501064A (ja)
DE (1) DE1911198A1 (ja)
FR (1) FR2002902A1 (ja)
GB (1) GB1250544A (ja)
IE (1) IE33433B1 (ja)
LU (1) LU58110A1 (ja)
NL (1) NL6903181A (ja)
NO (1) NO123939B (ja)
SE (1) SE347024B (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5130965A (ja) * 1974-09-09 1976-03-16 Matsushita Electric Ind Co Ltd Atsumakushusekikairo no seizohoho
JPS5769797A (en) * 1980-10-17 1982-04-28 Matsushita Electric Ind Co Ltd Method of producing hybrid thick film integrated circuit
JPS57193249U (ja) * 1981-06-03 1982-12-07
JPS5851594A (ja) * 1981-09-22 1983-03-26 日本電気株式会社 厚膜混成ｉｃ基板
JPS5885378U (ja) * 1981-12-04 1983-06-09 ソニー株式会社 プリント配線基板
JPS61164076U (ja) * 1986-03-20 1986-10-11

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3649339A (en) * 1969-09-05 1972-03-14 Eugene C Smith Apparatus and method for securing a high vacuum for particle coating process
US3648654A (en) * 1970-03-16 1972-03-14 Bell Telephone Labor Inc Vertical liquid phase crystal growth apparatus
US3641973A (en) * 1970-11-25 1972-02-15 Air Reduction Vacuum coating apparatus
US3915118A (en) * 1973-09-17 1975-10-28 Etec Corp Specimen coating device for an SEM
US3921572A (en) * 1974-02-25 1975-11-25 Ibm Vacuum coating apparatus
US4173944A (en) * 1977-05-20 1979-11-13 Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh Silverplated vapor deposition chamber
US4179530A (en) * 1977-05-20 1979-12-18 Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh Process for the deposition of pure semiconductor material
EP0008807A1 (de) * 1978-09-13 1980-03-19 Elektroschmelzwerk Kempten GmbH Vorrichtung und Verfahren zum diskontinuierlichen oder kontinuierlichen thermischen Bedampfen von Formteilen oder Bandmaterial
DE2940064A1 (de) * 1979-10-03 1981-04-16 Leybold-Heraeus GmbH, 5000 Köln Vakuumaufdampfanlage mir einer ventilkammer, einer bedampfungskammer und einer verdampferkammer
US4478174A (en) * 1983-02-25 1984-10-23 Canadian Patents & Development Limited Vacuum coating vessel with movable shutter plate
CN101512036B (zh) * 2006-09-11 2011-11-02 株式会社爱发科 真空蒸气处理装置
KR101066033B1 (ko) * 2009-07-28 2011-09-20 엘아이지에이디피 주식회사 화학기상 증착장치 및 기판 처리장치
CN106947944A (zh) * 2017-05-23 2017-07-14 京东方科技集团股份有限公司 一种蒸镀坩埚、蒸镀源、蒸镀装置及蒸镀方法
CN115176084A (zh) * 2020-02-28 2022-10-11 伊利诺斯工具制品有限公司 活塞监测组件

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5130965A (ja) * 1974-09-09 1976-03-16 Matsushita Electric Ind Co Ltd Atsumakushusekikairo no seizohoho
JPS5769797A (en) * 1980-10-17 1982-04-28 Matsushita Electric Ind Co Ltd Method of producing hybrid thick film integrated circuit
JPS57193249U (ja) * 1981-06-03 1982-12-07
JPS5851594A (ja) * 1981-09-22 1983-03-26 日本電気株式会社 厚膜混成ｉｃ基板
JPS5885378U (ja) * 1981-12-04 1983-06-09 ソニー株式会社 プリント配線基板
JPS61164076U (ja) * 1986-03-20 1986-10-11

Also Published As

Publication number Publication date
LU58110A1 (ja) 1969-06-03
BE729026A (ja) 1969-08-01
DE1911198A1 (de) 1969-09-18
FR2002902A1 (ja) 1969-10-31
SE347024B (ja) 1972-07-24
CH501064A (de) 1970-12-31
NL6903181A (ja) 1969-09-02
IE33433B1 (en) 1974-06-26
IE33433L (en) 1969-08-29
NO123939B (ja) 1972-02-07
US3524426A (en) 1970-08-18
GB1250544A (ja) 1971-10-20
AT286738B (de) 1970-12-28

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