IE33433B1 - Apparatus for coating by thermal evaporation - Google Patents
Apparatus for coating by thermal evaporationInfo
- Publication number
- IE33433B1 IE33433B1 IE237/69A IE23769A IE33433B1 IE 33433 B1 IE33433 B1 IE 33433B1 IE 237/69 A IE237/69 A IE 237/69A IE 23769 A IE23769 A IE 23769A IE 33433 B1 IE33433 B1 IE 33433B1
- Authority
- IE
- Ireland
- Prior art keywords
- chamber
- coating
- valve
- shield
- vacuum
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
1,250,544. Vapour deposition apparatus. LIBBEY-OWENS-FORD CO. Feb. 25, 1969 [Feb. 29, 1968], No. 9900/69. Heading C7F. Apparatus for coating sheets by vacuum deposition comprises an evaporation chamber A for containing a source of material to be evaporated 123, first evacuating means for establishing a vacuum in said chamber, means for evaporating said material, a coating chamber B adjacent said evaporation chamber, means in said coating chamber for supporting a sheet to be coated, second evacuating means 239 for creating a vacuum in said coating chamber B, a valve compartment located between said evaporation chamber and said coating chamber, a plate valve D mounted in said compartment for movement from a closed position between said evaporation and coating chambers where it separates and hermetically seals said chambers from one another to an open position placing said chambers in intercommunication, a shield 400 mounted in said evaporation chamber, and means for moving said shield into said valve compartment, said shield forming a conduit through said valve compartment and shielding said plate valve from evaporated material passing therethrough. The substrate sheet may be glass and the coating material may be Al, Cr, TiO 2 or MgF 2 . With the lid 206 in an open position Fig. 1 (not shown) plate valve D, horizontally slidable between chambers A and B, is placed in the closed position, and using a combination of pumps, chamber A is pumped down to operating pressure, about 4.5 x 10<SP>-6</SP> microns of mercury. The sheet of glass to be coated is placed on a rotating support in chamber B, and the lid 206 is closed and chamber B evacuated via conduit 239. This automatically energizes a glow discharge unit 265 Fig.12 (not shown), to clean the glass sheet, and the glow-discharge cleaning ends when the air-content of B will no longer sustain a discharge. Then, plate valve D is automatically retracted and cylindrical shield 400 which prevents accumulation of coating material on valve D is raised by piston 404 to a position such that it forms a conduit between chambers A and B. Evaporation source E, comprising an electron beam generator 435 and focusing magnets 437, 437, is activated after lifting of crucible lid 136, so that material in crucible 123 is evaporated, to coat the substrate. The coating thickness is monitored by a light beam L from source 445 which directs a beam through the substrate sheet and window 452 in lid 206 toward a meter 446, Fig. 3 and when a suitable coating thickness has been deposited on the substrate, the shutter 136 is put over crucible 123, the shield 400 is lowered, valve D is closed, and the pressure in chamber B is raised to atmospheric, and the lid opened for removal of the coated sheet. A shield 114 is provided in the chamber A to protect the light source and vacuum system 111, and means for replenishing the supply of coating material in the crucible without breaking the vacuum in chamber A, including a moveable cart 461 of material, is provided. The aim of the apparatus is to provide a coating process wherein the vacuum in the evaporation chamber need not be broken whilst the substrate is removed and replaced and the crucible re-loaded. The apparatus is described in detail, as are automatic control circuits therefor.
[GB1250544A]
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US70937668A | 1968-02-29 | 1968-02-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
IE33433L IE33433L (en) | 1969-08-29 |
IE33433B1 true IE33433B1 (en) | 1974-06-26 |
Family
ID=24849612
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IE237/69A IE33433B1 (en) | 1968-02-29 | 1969-02-24 | Apparatus for coating by thermal evaporation |
Country Status (13)
Country | Link |
---|---|
US (1) | US3524426A (en) |
JP (1) | JPS494156B1 (en) |
AT (1) | AT286738B (en) |
BE (1) | BE729026A (en) |
CH (1) | CH501064A (en) |
DE (1) | DE1911198A1 (en) |
FR (1) | FR2002902A1 (en) |
GB (1) | GB1250544A (en) |
IE (1) | IE33433B1 (en) |
LU (1) | LU58110A1 (en) |
NL (1) | NL6903181A (en) |
NO (1) | NO123939B (en) |
SE (1) | SE347024B (en) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3649339A (en) * | 1969-09-05 | 1972-03-14 | Eugene C Smith | Apparatus and method for securing a high vacuum for particle coating process |
US3648654A (en) * | 1970-03-16 | 1972-03-14 | Bell Telephone Labor Inc | Vertical liquid phase crystal growth apparatus |
US3641973A (en) * | 1970-11-25 | 1972-02-15 | Air Reduction | Vacuum coating apparatus |
US3915118A (en) * | 1973-09-17 | 1975-10-28 | Etec Corp | Specimen coating device for an SEM |
US3921572A (en) * | 1974-02-25 | 1975-11-25 | Ibm | Vacuum coating apparatus |
JPS5130965A (en) * | 1974-09-09 | 1976-03-16 | Matsushita Electric Ind Co Ltd | ATSUMAKUSHUSEKIKAIRO NO SEIZOHOHO |
US4179530A (en) * | 1977-05-20 | 1979-12-18 | Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh | Process for the deposition of pure semiconductor material |
US4173944A (en) * | 1977-05-20 | 1979-11-13 | Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh | Silverplated vapor deposition chamber |
EP0008807A1 (en) * | 1978-09-13 | 1980-03-19 | Elektroschmelzwerk Kempten GmbH | Apparatus and method for the discontinuous or continuous coating of articles or strips by vacuum evaporation |
DE2940064A1 (en) * | 1979-10-03 | 1981-04-16 | Leybold-Heraeus GmbH, 5000 Köln | VACUUM EVAPORATION SYSTEM WITH A VALVE CHAMBER, A STEAMING CHAMBER AND AN EVAPORATOR CHAMBER |
JPS5769797A (en) * | 1980-10-17 | 1982-04-28 | Matsushita Electric Ind Co Ltd | Method of producing hybrid thick film integrated circuit |
JPS57193249U (en) * | 1981-06-03 | 1982-12-07 | ||
JPS5851594A (en) * | 1981-09-22 | 1983-03-26 | 日本電気株式会社 | Thick film hybrid ic board |
JPS5885378U (en) * | 1981-12-04 | 1983-06-09 | ソニー株式会社 | printed wiring board |
US4478174A (en) * | 1983-02-25 | 1984-10-23 | Canadian Patents & Development Limited | Vacuum coating vessel with movable shutter plate |
JPS61164076U (en) * | 1986-03-20 | 1986-10-11 | ||
WO2008032668A1 (en) * | 2006-09-11 | 2008-03-20 | Ulvac, Inc. | Vacuum evaporation processing equipment |
KR101066033B1 (en) * | 2009-07-28 | 2011-09-20 | 엘아이지에이디피 주식회사 | Apparatus for Chemical Vapor Deposition and Apparatus for processing substrate |
CN106947944A (en) * | 2017-05-23 | 2017-07-14 | 京东方科技集团股份有限公司 | One kind evaporation crucible, vapor deposition source, evaporation coating device and evaporation coating method |
WO2021174032A1 (en) * | 2020-02-28 | 2021-09-02 | Illinois Tool Works Inc. | Piston monitoring assembly |
-
1968
- 1968-02-29 US US709376A patent/US3524426A/en not_active Expired - Lifetime
-
1969
- 1969-02-24 IE IE237/69A patent/IE33433B1/en unknown
- 1969-02-25 GB GB1250544D patent/GB1250544A/en not_active Expired
- 1969-02-26 SE SE02595/69A patent/SE347024B/xx unknown
- 1969-02-27 FR FR6905207A patent/FR2002902A1/fr not_active Withdrawn
- 1969-02-27 LU LU58110D patent/LU58110A1/xx unknown
- 1969-02-27 BE BE729026D patent/BE729026A/xx unknown
- 1969-02-27 NO NO0830/69A patent/NO123939B/no unknown
- 1969-02-28 JP JP44015284A patent/JPS494156B1/ja active Pending
- 1969-02-28 NL NL6903181A patent/NL6903181A/xx unknown
- 1969-02-28 CH CH306769A patent/CH501064A/en not_active IP Right Cessation
- 1969-02-28 AT AT205669A patent/AT286738B/en not_active IP Right Cessation
- 1969-02-28 DE DE19691911198 patent/DE1911198A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
AT286738B (en) | 1970-12-28 |
IE33433L (en) | 1969-08-29 |
GB1250544A (en) | 1971-10-20 |
NO123939B (en) | 1972-02-07 |
JPS494156B1 (en) | 1974-01-30 |
CH501064A (en) | 1970-12-31 |
SE347024B (en) | 1972-07-24 |
LU58110A1 (en) | 1969-06-03 |
US3524426A (en) | 1970-08-18 |
FR2002902A1 (en) | 1969-10-31 |
DE1911198A1 (en) | 1969-09-18 |
BE729026A (en) | 1969-08-01 |
NL6903181A (en) | 1969-09-02 |
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